Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media for speech recognition. One method includes obtaining an input acoustic sequence, the input acoustic sequence representing one or more utterances; processing the input acoustic sequence using a speech recognition model to generate a transcription of the input acoustic sequence, wherein the speech recognition model comprises a domain-specific language model; and providing the generated transcription of the input acoustic sequence as input to a domain-specific predictive model to generate structured text content that is derived from the transcription of the input acoustic sequence.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media for speech recognition. One method includes obtaining an input acoustic sequence, the input acoustic sequence representing one or more utterances; processing the input acoustic sequence using a speech recognition model to generate a transcription of the input acoustic sequence, wherein the speech recognition model comprises a domain-specific language model; and providing the generated transcription of the input acoustic sequence as input to a domain-specific predictive model to generate structured text content that is derived from the transcription of the input acoustic sequence.

Abstract: An example system includes an input engine to determine an aspect ratio of each of a plurality of video signals input to the system. The system includes an arrangement engine to determine positions in a display area for the plurality of video signals based on the aspect ratio of each video signal. The system includes a display engine to output screen content corresponding to the plurality of video signals at the determined positions.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media for speech recognition. One method includes obtaining an input acoustic sequence, the input acoustic sequence representing one or more utterances; processing the input acoustic sequence using a speech recognition model to generate a transcription of the input acoustic sequence, wherein the speech recognition model comprises a domain-specific language model; and providing the generated transcription of the input acoustic sequence as input to a domain-specific predictive model to generate structured text content that is derived from the transcription of the input acoustic sequence.

Abstract: An example system includes an input engine to determine an aspect ratio of each of a plurality of video signals input to the system. The system includes an arrangement engine to determine positions in a display area for the plurality of video signals based on the aspect ratio of each video signal. The system includes a display engine to output screen content corresponding to the plurality of video signals at the determined positions.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media for speech recognition. One method includes obtaining an input acoustic sequence, the input acoustic sequence representing one or more utterances; processing the input acoustic sequence using a speech recognition model to generate a transcription of the input acoustic sequence, wherein the speech recognition model comprises a domain-specific language model; and providing the generated transcription of the input acoustic sequence as input to a domain-specific predictive model to generate structured text content that is derived from the transcription of the input acoustic sequence.

Abstract: A display is disclosed. The display includes a screen, a backlight to illuminate the screen, and an image retention reducer. The image retention reducer includes a driver to apply an image retention reduction pattern to the screen while the backlight is deactivated.

Abstract: An example system includes a video processing engine. The video processing engine is to combine a plurality of images from a plurality of distinct devices to produce a combined image. The system also includes a display output to display the combined image. The system includes a hub to provide first input data from an input device to a first of the plurality of distinct devices. When combining images, the video processing engine is to emphasize an image from a second of the plurality of distinct devices based on the hub receiving a first type of input. The hub is to provide second input data to the second of the plurality of distinct devices based on the hub receiving a second type of input.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media for speech recognition. One method includes obtaining an input acoustic sequence, the input acoustic sequence representing one or more utterances; processing the input acoustic sequence using a speech recognition model to generate a transcription of the input acoustic sequence, wherein the speech recognition model comprises a domain-specific language model; and providing the generated transcription of the input acoustic sequence as input to a domain-specific predictive model to generate structured text content that is derived from the transcription of the input acoustic sequence.

Abstract: An RF coil assembly provides a source to generate a plasma inductively in a process chamber. The RF coil assembly includes an RF coil disposed about a perimeter of the processing chamber and a frame disposed about a perimeter of the processing chamber. The frame is adapted to support the RF coil in position. An interface material is disposed between and in thermal contact with the frame and a sidewall of the processing chamber. The interface material has a thermal conductivity of 4.0 W/mK or greater.

Abstract: A substrate processing system has a housing that defines a process chamber, a gas-delivery system, a high-density plasma generating system, a substrate holder, and a controller. The housing includes a sidewall and a dome positioned above the sidewall. The dome has physically separated and noncontiguous pieces. The gas-delivery system introduces e a gas into the process chamber through side nozzles positioned between two of the physically separated and noncontiguous pieces of the dome. The high-density plasma generating system is operatively coupled with the process chamber. The substrate holder is disposed within the process chamber and supports a substrate during substrate processing. The controller controls the gas-delivery system and the high-density plasma generating system.

Abstract: Method of removing damaged silicon carbide crystalline structure from the surface of a silicon carbide component. The method comprises at least two liquid chemical treatment processes, where one treatment converts silicon carbide to silicon oxide, and another treatment removes silicon oxide. The liquid chemical treatments are typically carried out at a temperature below about 100° C. The time period required to carry out the method is generally less than about 100 hours.

Abstract: Embodiments of the present invention provide a substrate support assembly having a protective layer that enhances plasma resistance. In one embodiment, a substrate support assembly includes an electrostatic chuck having an upper substrate support surface, and a protective layer disposed on the electrostatic chuck, wherein the protective layer is fabricated by a ceramic material containing a rare earth metal.

Abstract: A substrate processing system has a housing that defines a process chamber, a gas-delivery system, a high-density plasma generating system, a substrate holder, and a controller. The housing includes a sidewall and a dome positioned above the sidewall. The dome has physically separated and noncontiguous pieces. The gas-delivery system introduces e a gas into the process chamber through side nozzles positioned between two of the physically separated and noncontiguous pieces of the dome. The high-density plasma generating system is operatively coupled with the process chamber. The substrate holder is disposed within the process chamber and supports a substrate during substrate processing. The controller controls the gas-delivery system and the high-density plasma generating system.

Abstract: An RF coil assembly provides a source to generate a plasma inductively in a process chamber. The RF coil assembly includes an RF coil disposed about a perimeter of the processing chamber and a frame disposed about a perimeter of the processing chamber. The frame is adapted to support the RF coil in position. An interface material is disposed between and in thermal contact with the frame and a sidewall of the processing chamber. The interface material has a thermal conductivity of 4.0 W/mK or greater.

Abstract: A substrate processing system is provided. A housing defines a processing chamber. A plasma-generating system is operatively coupled to the processing chamber. A substrate support member is disposed within the processing chamber and configured to hold a substrate during substrate processing. A ceramic insert is disposed over the substrate support member such that the ceramic insert is disposed between the substrate support member and the substrate during substrate processing. A gas-delivery system is configured to introduce gases into the processing chamber. A controller controls the plasma-generating system and the gas-delivery system.

Abstract: A substrate processing system is provided with a housing defining a process chamber. A substrate holder is disposed within the process chamber and configured to support a substrate during substrate processing. A gas delivery system is configured to introduce a gas into the process chamber. A pressure-control system is provided for maintaining a selected pressure within the process chamber. A high-density-plasma generating system is operatively coupled with the process chamber and includes a coil for inductively coupling energy into a plasma formed within the process chamber. It also includes magneto-dielectric material proximate the coil for concentrating a magnetic field generated by the coil. A controller is also provided for controlling the gas-delivery system, the pressure-control system, and the high-density-plasma generating system.

Abstract: Embodiments of the present invention are directed to reducing clogging of nozzles and to reducing flow variance through the nozzles in a semiconductor processing chamber. In one embodiment, a method of introducing a gas into a semiconductor processing chamber comprises providing a nozzle having a proximal portion connected to a chamber wall or a gas distribution ring of the semiconductor processing chamber and a distal portion oriented inwardly away from the chamber wall into an interior of the semiconductor processing chamber. The nozzle includes a proximal end coupled with a gas supply. The nozzle includes a nozzle opening at a distal end. The nozzle includes a nozzle passage extending from the proximal end to the distal end.