Abstract: A method for coating one or more channels of a sample using a vapor deposition includes alternatingly supplying at least two gaseous precursor to one or more channels defined in a sample through at least one feed line that is connected to a first channel end of the one or more channels. An adjustable pressure gradient is generated and conducts the at least two gaseous precursors along a first flow direction (SR1) from the at least one feed line to a first discharge line through the one or more channels. The at least two gaseous precursor and reaction products are discharged from the one or more channels through a first discharge line that is connected to a second channel end of the one or more channels of the sample. Non-reacted precursors and reaction products are discharged through a second discharge line that is connected to the first channel end.

Abstract: This disclosure provides systems, methods, and apparatus related to optofluidic devices. In one aspect, an optofluidic device includes a substrate, a first nanostructure, a second nanostructure, and a cover. A channel having cross-sectional dimensions of less than about 100 nanometers is defined in a surface of the substrate. The first nanostructure is disposed on the substrate on a first side of the channel and proximate the channel. The second nanostructure is disposed on the substrate on a second side of the channel and proximate the channel. The first and the second nanostructures are disposed on a line that passes across the channel. The cover is disposed on the surface of the substrate.

Abstract: This disclosure provides systems, methods, and apparatus related to optofluidic devices. In one aspect, an optofluidic device includes a substrate, a first nanostructure, a second nanostructure, and a cover. A channel having cross-sectional dimensions of less than about 100 nanometers is defined in a surface of the substrate. The first nanostructure is disposed on the substrate on a first side of the channel and proximate the channel. The second nanostructure is disposed on the substrate on a second side of the channel and proximate the channel. The first and the second nanostructures are disposed on a line that passes across the channel. The cover is disposed on the surface of the substrate.