Patents by Inventor Irene Ho

Irene Ho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of lithography process with inserting scattering bars
    Patent number: 9805154
    Abstract: The present disclosure provides one embodiment of an IC method that includes receiving an IC design layout including a first main feature and inserting a first plurality of scattering bars in the IC design layout to form a first circular pattern of scattering bars around the first main feature. The first main feature is positioned at a center portion of the first circular pattern of scattering bars.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: October 31, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Irene Ho, Ai-Jen Hung, Hung-Chang Hsieh, Kuei-Liang Lu, Ya Hui Chang
  • Method of Lithography Process with Inserting Scattering Bars
    Publication number: 20160335385
    Abstract: The present disclosure provides one embodiment of an IC method that includes receiving an IC design layout including a first main feature and inserting a first plurality of scattering bars in the IC design layout to form a first circular pattern of scattering bars around the first main feature. The first main feature is positioned at a center portion of the first circular pattern of scattering bars.
    Type: Application
    Filed: May 15, 2015
    Publication date: November 17, 2016
    Inventors: Irene Ho, Ai-Jen Hung, Hung-Chang Hsieh, Kuei-Liang Lu, Ya Hui Chang