Abstract: A process for preparing a polyurethane product, and polyurethane compositions and products of the process. The process includes preparing a catalyst composition comprising at least one tertiary amine salt, wherein the at least one tertiary amine salt is a contact product of at least one carboxylic acid and at least one tertiary amine, wherein the at least one tertiary amine is selected from the group consisting of N-hydroxyethylpiperidine and tris(dimethylaminomethyl)phenol; and reacting at least one isocyanate, at least one polyol and the catalyst composition to form a polyurethane product.

Abstract: A catalyst composition for making polyurethane foam, the catalyst composition including a compound having a general formula R1R2R3N, wherein each of R1, R2 and R3 are independently selected from the group consisting of: a compound according to formula (I): wherein n=1 to 5; and R4, R5 and R6 are each independently hydrogen, methyl, ethyl and propyl groups; hydrogen, a C1-C6 alkyl group compound, a C1-C6 cycloalkyl group compound, a C1-C6 alkenyl group compound, a C1-C6 alkynyl group compound, a C1-C6 aryl group compound, and a C1-C6 aralkyl group compound, each group being substituted or unsubstituted; wherein at least one of R1, R2 and R3 is a compound according to formula (I). A polyurethane composition and method for forming a polyurethane foam are also disclosed.

Abstract: A catalyst composition for making polyurethane foam, the catalyst composition including a compound having a general formula R1R2R3N, wherein each of R1, R2 and R3 are independently selected from the group consisting of: a compound according to formula (I): wherein n=1 to 5; and R4, R5 and R6 are each independently hydrogen, methyl, ethyl and propyl groups; hydrogen, a C1-C6 alkyl group compound, a C1-C6 cycloalkyl group compound, a C1-C6 alkenyl group compound, a C1-C6 alkynyl group compound, a C1-C6 aryl group compound, and a C1-C6 aralkyl group compound, each group being substituted or unsubstituted; wherein at least one of R1, R2 and R3 is a compound according to formula (I). A polyurethane composition and method for forming a polyurethane foam are also disclosed.

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a reaction chamber gaseous reagents comprising a porogenated precursor; optionally a structure former precursor selected from the group consisting an organosilane, an organosiloxane, and combinations thereof; and optionally a porogen precursor; applying an energy source to the gaseous reagents in the chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film at least a portion of the porogen to provide the porous film with pores and a dielectric constant less than 2.6.