Patents by Inventor Irina Malajovich

Irina Malajovich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090179198
    Abstract: The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.
    Type: Application
    Filed: March 13, 2009
    Publication date: July 16, 2009
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Richard Kevin Bailey, Graciela Beatriz Blanchet, John W. Catron, JR., Reid John Chesterfield, Howard David Glicksman, Marc B. Goldfinger, Gary Delmar Jaycox, Lynda Kaye Johnson, Roupen Leon Keusseyan, Irina Malajovich, Hong Meng, Jeffrey Scott Meth, Geoffrey Nunes, Gerard O'Neil, Kenneth George Sharp, Feng Gao
  • Patent number: 7528448
    Abstract: The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.
    Type: Grant
    Filed: July 17, 2006
    Date of Patent: May 5, 2009
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Richard Kevin Bailey, Graciela Beatriz Blanchet, John W. Catron, Jr., Reid John Chesterfield, Howard David Glicksman, Marc B. Goldfinger, Gary Delmar Jaycox, Lynda Kaye Johnson, Roupen Leon Keusseyan, Irina Malajovich, Hong Meng, Jeffrey Scott Meth, Geoffrey Nunes, Gerard O'Neil, Kenneth George Sharp, Feng Gao
  • Publication number: 20090104572
    Abstract: Disclosed is a method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
    Type: Application
    Filed: October 23, 2007
    Publication date: April 23, 2009
    Inventors: FENG GAO, LYNDA KAYE JOHNSON, ROUPEN LEON KEUSSEYAN, DALEN E. KEYS, IRINA MALAJOVICH, RINALDO S. SCHIFFINO, FREDRICK CLAUS ZUMSTEG, JR.
  • Publication number: 20090104557
    Abstract: Disclosed is a method negative imaging method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
    Type: Application
    Filed: October 23, 2007
    Publication date: April 23, 2009
    Inventors: Feng Gao, Lynda Kaye Johnson, Roupen Leon Keusseyan, Irina Malajovich, Jeffrey Scott Meth, Kenneth George Sharp, Fredrick Claus Zumsteg, JR., Seema Agrawal
  • Publication number: 20080012006
    Abstract: The invention relates to thin film transistors comprising novel dielectric layers and novel electrodes comprising metal compositions that can be provided by a dry thermal transfer process.
    Type: Application
    Filed: July 17, 2006
    Publication date: January 17, 2008
    Inventors: Richard Kevin Bailey, Graciela Beatriz Blanchet, John W. Catron, Reid John Chesterfield, Feng Gao, Howard David Glicksman, Marc B. Goldfinger, Gary Delmar Jaycox, Lynda Kaye Johnson, Roupen Leon Keusseyan, Irina Malajovich, Hong Meng, Jeffrey Scott Meth, Gerard O'Neil, Kenneth George Sharp, Nancy G. Tassi, Geoffrey Nunes
  • Publication number: 20080014528
    Abstract: The invention provides metal compositions, including silver compositions, and thermal imaging donors prepared with the compositions. The donors are useful for thermal transfer patterning of a metal layers and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry fabrication of electronic devices. Also provided are patterned multilayer compositions comprising one or more base film(s), and one or more patterned metal layers, including EMI shields and touchpad sensors.
    Type: Application
    Filed: July 17, 2006
    Publication date: January 17, 2008
    Inventors: Richard Kevin Bailey, Graciela Beatriz Blanchet, Jonathan V. Caspar, John Catron, Reid John Chesterfield, Thomas C. Felder, Feng Gao, Lynda Kaye Johnson, Roupen Leon Keusseyan, Dalen E. Keys, Irina Malajovich, Jeffrey Scott Meth, Geoffrey Nunes, Gerard O'Neil, Rinaldo S. Schiffino, Nancy G. Tassi
  • Publication number: 20070004229
    Abstract: Low temperature, ambient pressure processes are desired for fabrication of transistors on flexible polymer substrates. Lamination of semiconductors is such a process. The semiconductor is deposited on a donor substrate. The donor is positioned over a receiver substrate, which may be patterned with additional transistor elements. The semiconductor is transferred from the donor to the receiver by lamination.
    Type: Application
    Filed: July 26, 2006
    Publication date: January 4, 2007
    Inventor: Irina Malajovich
  • Patent number: 7144791
    Abstract: The present invention is a process for transfer of a pattern of material from a donor substrate to a receiver substrate by lamination. The pattern of the transferred material is defined by an aperture in a mask interposed between the donor and receiver during lamination. The technique is compatible with flexible polymer receiver substrates and is useful in fabricating thin film transistors for flexible displays.
    Type: Grant
    Filed: September 24, 2004
    Date of Patent: December 5, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Jeffrey Scott Meth, Irina Malajovich
  • Patent number: 7105462
    Abstract: Low temperature, ambient pressure processes are desired for fabrication of transistors on flexible polymer substrates. Lamination of semiconductors is such a process. The semiconductor is deposited on a donor substrate. The donor is positioned over a receiver substrate, which may be patterned with additional transistor elements. The semiconductor is transferred from the donor to the receiver by lamination.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: September 12, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Irina Malajovich
  • Publication number: 20050142813
    Abstract: The present invention is a process for transfer of a pattern of material from a donor substrate to a receiver substrate by lamination. The pattern of the transferred material is defined by an aperture in a mask interposed between the donor and receiver during lamination. The technique is compatible with flexible polymer receiver substrates and is useful in fabricating thin film transistors for flexible displays.
    Type: Application
    Filed: September 24, 2004
    Publication date: June 30, 2005
    Inventors: Jeffrey Meth, Irina Malajovich
  • Publication number: 20050035374
    Abstract: Low temperature, ambient pressure processes are desired for fabrication of transistors on flexible polymer substrates. Lamination of semiconductors is such a process. The semiconductor is deposited on a donor substrate. The donor is positioned over a receiver substrate, which may be patterned with additional transistor elements. The semiconductor is transferred from the donor to the receiver by lamination.
    Type: Application
    Filed: July 21, 2004
    Publication date: February 17, 2005
    Inventor: Irina Malajovich