Abstract: A component for a projection exposure apparatus for semiconductor lithography, comprises an optical element and an actuator, which are force-fittingly connected to each other. The actuator at least locally deforms the optical element. The actuator can be configured to minimize the loss in rigidity at the peripheries delimiting the actuator on the imaging quality. A method for designing a component of projection exposure apparatus is provided.

Abstract: An optical element comprises a substrate and an optical surface formed on the substrate. At least one fluid-tight sealed chamber is embedded in the substrate and has a rheological fluid introduced therein for deforming the optical surface. An optical arrangement, such as an EUV lithography system, comprises at least one optical element as described above and a field generating device for generating an electromagnetic field. The electromagnetic field can be a time-varying electromagnetic field. The electromagnetic field can be a magnetic field. The electromagnetic field passes through the at least one chamber which contains the rheological fluid. A method for producing an optical element designed as described above is also provided.