Patents by Inventor Irina Vakshtein

Irina Vakshtein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and System for Providing a Quality Metric for Improved Process Control
    Publication number: 20230051705
    Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.
    Type: Application
    Filed: June 27, 2022
    Publication date: February 16, 2023
    Inventors: Daniel Kandel, Guy Cohen, Dana Klein, Vladimir Levinski, Noam Sapiens, Alex Shulman, Vladimir Kamenetsky, Eran Amit, Irina Vakshtein
  • Method and system for providing a quality metric for improved process control
    Patent number: 11372340
    Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.
    Type: Grant
    Filed: April 4, 2012
    Date of Patent: June 28, 2022
    Assignee: KLA Corporation
    Inventors: Daniel Kandel, Guy Cohen, Dana Klein, Vladimir Levinski, Noam Sapiens, Alex Shulman, Vladimir Kamenetsky, Eran Amit, Irina Vakshtein
  • Pupil plane calibration for scatterometry overlay measurement
    Patent number: 9909982
    Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.
    Type: Grant
    Filed: April 3, 2014
    Date of Patent: March 6, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Barak Bringoltz, Irina Vakshtein, Ofir Aharon, Guy Ben Dov, Zeev Bomzon
  • PUPIL PLANE CALIBRATION FOR SCATTEROMETRY OVERLAY MEASUREMENT
    Publication number: 20140257734
    Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.
    Type: Application
    Filed: April 3, 2014
    Publication date: September 11, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Barak Bringoltz, Irina Vakshtein, Ofir Aharon, Guy Ben Dov, Zeev Bomzon
  • METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL
    Publication number: 20130035888
    Abstract: The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.
    Type: Application
    Filed: April 4, 2012
    Publication date: February 7, 2013
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Daniel Kandel, Guy Cohen, Dana Klein, Vladimir Levinski, Noam Sapiens, Alex Shulman, Vladimir Kamenetsky, Eran Amit, Irina Vakshtein