Abstract: An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of a polar amine solvent, about 22.5 to 15% by weight of a basic amine, especially hydroxylamine, a corrosion inhibitor and water. The stripping composition is effective for stripping photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures.

Abstract: The invention provides a method for purification of hydroxylamine so as to have a substantial reduction of cations and anions. The method involves passing a solution of hydroxylamine through at least one strong acid ion exchange bed which has been pretreated with dilute hydrochloric acid and then through at least one strong base anion exchange resin bed which has been pretreated or regenerated with a non-metal amino or hydroxide base solution.

Abstract: Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Abstract: An aqueous and basic stripping and cleaning composition is provided which contains a hydroxylamine, ammonium fluoride, water and optionally DMSO. The pH of the composition is greater than about 8. Also provided is a method of stripping and cleaning utilizing the compositions of the invention.

Abstract: Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Abstract: An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than about 4 but less than 7. Also provided is a method of stripping and cleaning utilizing the compositions of the invention. Optionally, the composition may contain a phosphate buffer.

Abstract: The invention teaches an aqueous stripping composition that is essentially free of any hydroxylamine compounds. The composition consists essentially of an aqueous mixture of monoethanolamine and preferably includes an inhibitor. The composition is particularly useful for cleaning substrates containing organic residues.

Abstract: A stripping and cleaning composition is provided which contains a polyhydric alcohol, fluoboric acid, a fluorine containing compound and a polar solvent. The pH of the composition is less than 5. Also provided is a method of stripping and cleaning utilizing the compositions of the invention.

Abstract: The invention teaches an aqueous stripping composition that is essentially free of any hydroxylamine compounds. The composition is an aqueous mixture of an alkanolamine, tetraalkylammonium hydroxide, and an inhibitor. The composition is particularly useful for cleaning substrates containing organic residues.

Abstract: Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Abstract: A non-aqueous photoresist stripping composition for effectively preventing the redeposition of alkali metal ions, particularly sodium and potassium ions, on a substrate during the stripping operation is disclosed. The stripping composition comprises:(a) an organic polar solvent;(b) an organic aliphatic or aromatic amine, or an organic amino alcohol; and(c) either polyethylene glycol or polypropylene glycol in an amount to provide a caging effect. The composition also preferably includes a biodegradable organic solvent.

Abstract: Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Abstract: An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of monoethanolamine, about 22.5 to 15% by weight of hydroxylamine and water. The stripping composition is effective to strip photoresists, residues from plasma process generated, organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.

Abstract: Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Abstract: An improved pellicle for use in projection printing comprises a pellicle in which the transparent film is formed from a specific polyvinyl butyral resin from a casting composition which is a mixture of the specific polyvinyl butyral resin and dimethylformamide.

Abstract: An alkaline positive and negative resist stripping composition having low volatility and operable at temperatures less than about 90.degree. C. which comprises,A. about 10 to 30% by weight of tetrahydrofurfuryl alcohol;B. about 5 to 30% by weight of a polyhydric alcohol;C. about 10 to 30% by weight of the reaction product of one mole of furfuryl alcohol with about 1 to 20 moles of an alkylene oxide,D. about 1 to 30% by weight of a water soluble Bronstead base type of hydroxide compound, andE. the remainder being water.The composition comprising a ratio of organic materials to inorganic materials to about 0.25:1 to 3:1.

Abstract: An improved pellicle for use in projection printing comprises a pellicle in which the transparent film is formed from a specific polyvinyl butyral resin from a casting composition which is a mixture of the specific polyvinyl butyral resin and dimethylformamide.

Abstract: A non-aqueous biodegradable negative photoresist stripping composition having low toxicity and is operable at temperatures at 85.degree. C. or less which comprises about 85% by weight of an aromatic hydrocarbon solvent of the formula selected from the group consisting of: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each is a member selected from the group consisting of methyl, ethyl n-propyl and isopropyl, and an organic sulfonic acid of the formula:R.sub.3 --SO.sub.3 Hwherein R.sub.3 is a member selected from the group consisting of phenyl, tolyl, dodecylbenzene and naphthyl, the ratio of the aromatic solvent to organic solvent acid being about 60 to 96% by weight to about 4 to 40% by weight.

Abstract: Stripping compositions for removing paints, varnishes, enamels, photoresists and the like, from substrates comprising compositions of(a) an amide compound of the formula: ##STR1## and mixtures thereof wherein R is a member selected from the group consisting of methyl, ethyl and propyl; R.sub.1 is a member selected from the group consisting of hydrogen, methyl, ethyl and propyl, and R.sub.2 is a member selected from the group consisting of methyl, ethyl and propyl, and(b) an amine compound of the formula:R.sub.3 --NH--(CH.sub.2).sub.m --OHand mixtures thereof, wherein R.sub.3 is a member selected from the group consisting of hydrogen, methyl, ethyl and propyl, and m is an integer of 1-4.

Abstract: Stripping compositions for removing paints, varnishes, enamels and the like, from substrates comprising compositions of (a) an amide compound of the formula: ##STR1## and mixtures thereof, wherein R is selected from the group consisting of hydrogen, methyl, ethyl, propyl and phenyl; R.sub.1 and R.sub.2 are selected from the group consisting of hydrogen and methyl; and mixtures of said amide compounds; and (b) a carbonate compound of the formula: ##STR2## and mixtures thereof, wherein R.sub.3 and R.sub.4 are selected from the group consisting of methyl, ethyl or R.sub.3 and R.sub.4 together form a divalent ethylene, propylene or butylene group of a cyclic carbonate.