Patents by Inventor Isaac Seetho

Isaac Seetho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System-independent characterization of materials using dual-energy computed tomography
    Patent number: 10466183
    Abstract: A system for characterizing the material of an object scanned via a dual-energy computed tomography scanner is provided. The system generates photoelectric and Compton sinograms based on a photoelectric-Compton decomposition of low-energy and high-energy sinograms generated from the scan and based on a scanner spectral response model. The system generates a Compton volume with Compton attenuation coefficients from the Compton sinogram and a photoelectric volume with photoelectric attenuation coefficients from the photoelectric sinogram. The system generates an estimated effective atomic number for a voxel and an estimated electron density for the voxel from the Compton attenuation coefficient and photoelectric coefficient for the voxel and scanner-specific parameters. The system then characterizes the material within the voxel based on the estimated effective atomic number and estimated electron density for the voxel.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: November 5, 2019
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Isaac Seetho, Maurice B. Aufderheide, Stephen G. Azevedo, William D. Brown, Kyle Champley, Daniel Schneberk, G. Patrick Roberson, Jeffrey S. Kallman, Harry E. Martz, Jr., Jerel A. Smith
  • SYSTEM-INDEPENDENT CHARACTERIZATION OF MATERIALS USING DUAL-ENERGY COMPUTED TOMOGRAPHY
    Publication number: 20180120241
    Abstract: A system for characterizing the material of an object scanned via a dual-energy computed tomography scanner is provided. The system generates photoelectric and Compton sinograms based on a photoelectric-Compton decomposition of low-energy and high-energy sinograms generated from the scan and based on a scanner spectral response model. The system generates a Compton volume with Compton attenuation coefficients from the Compton sinogram and a photoelectric volume with photoelectric attenuation coefficients from the photoelectric sinogram. The system generates an estimated effective atomic number for a voxel and an estimated electron density for the voxel from the Compton attenuation coefficient and photoelectric coefficient for the voxel and scanner-specific parameters. The system then characterizes the material within the voxel based on the estimated effective atomic number and estimated electron density for the voxel.
    Type: Application
    Filed: October 31, 2016
    Publication date: May 3, 2018
    Inventors: Isaac Seetho, Maurice B. Aufderheide, Stephen G. Azevedo, William D. Brown, Kyle Champley, Daniel Schneberk, G. Patrick Roberson, Jeffrey S. Kallman, Harry E. Martz, JR., Jerel A. Smith