Patents by Inventor Isamu Niki

Isamu Niki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8344403
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: January 1, 2013
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 8344402
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: January 1, 2013
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 8299486
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: October 30, 2012
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 8227280
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: July 24, 2012
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 8148744
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: April 3, 2012
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20100264446
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Application
    Filed: June 30, 2010
    Publication date: October 21, 2010
    Applicant: Nichia Corporation
    Inventors: Isamu NIKI, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20100266815
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Application
    Filed: June 30, 2010
    Publication date: October 21, 2010
    Applicant: Nichia Corporation
    Inventors: Isamu NIKI, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20100267181
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Application
    Filed: June 30, 2010
    Publication date: October 21, 2010
    Applicant: Nichia Corporation
    Inventors: Isamu NIKI, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20100264447
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Application
    Filed: June 30, 2010
    Publication date: October 21, 2010
    Applicant: Nichia Corporation
    Inventors: Isamu NIKI, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20100264445
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Application
    Filed: June 30, 2010
    Publication date: October 21, 2010
    Applicant: Nichia Corporation
    Inventors: Isamu NIKI, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 7804101
    Abstract: A semiconductor light emitting device including a substrate, an electrode and a light emitting region is provided. The substrate may have protruding portions formed in a repeating pattern on substantially an entire surface of the substrate while the rest of the surface may be substantially flat. The cross sections of the protruding portions taken along planes orthogonal to the surface of the substrate may be semi-circular in shape. The cross sections of the protruding portions may in alternative be convex in shape. A buffer layer and a GaN layer may be formed on the substrate.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: September 28, 2010
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 7745245
    Abstract: At least one recess and/or protruding portion is created on the surface portion of a substrate for scattering or diffracting light generated in a light emitting region. The recess and/or protruding portion has a shape that prevents crystal defects from occurring in semiconductor layers.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: June 29, 2010
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 7635875
    Abstract: At least one recess and/or protruding portion is created on the surface portion of a substrate for scattering or diffracting light generated in a light emitting region. The recess and/or protruding portion has a shape that prevents crystal defects from occurring in semiconductor layers.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: December 22, 2009
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20090042328
    Abstract: At least one recess and/or protruding portion is created on the surface portion of a substrate for scattering or diffracting light generated in a light emitting region. The recess and/or protruding portion has a shape that prevents crystal defects from occurring in semiconductor layers.
    Type: Application
    Filed: January 30, 2008
    Publication date: February 12, 2009
    Applicant: Nichia Corporation
    Inventors: Isamu NIKI, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20080303043
    Abstract: At least one recess and/or protruding portion is created on the surface portion of a substrate for scattering or diffracting light generated in a light emitting region. The recess and/or protruding portion has a shape that prevents crystal defects from occurring in semiconductor layers.
    Type: Application
    Filed: January 30, 2008
    Publication date: December 11, 2008
    Applicant: Nichia Corporation
    Inventors: Isamu NIKI, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Patent number: 7348600
    Abstract: The invention provides a nitride semiconductor light-emitting device comprising gallium nitride semiconductor layers formed on a heterogeneous substrate, wherein light emissions having different light emission wavelengths or different colors are given out of the same active layer. Recesses 106 are formed by etching in the first electrically conductive (n) type semiconductor layer 102 formed on a substrate with a buffer layer interposed between them. Each recess is exposed in plane orientations different from that of the major C plane. For instance, the plane orientation of the A plane is exposed. An active layer is grown and joined on the plane of this plane orientation, on the bottom of the recess and the C-plane upper surface of a non-recess portion. The second electrically conductive (p) type semiconductor layer is formed on the inner surface of the recess.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: March 25, 2008
    Assignees: Nichia Corporation, California Institute of Technology
    Inventors: Yukio Narukawa, Isamu Niki, Axel Scherer, Koichi Okamoto, Yoichi Kawakami, Mitsuru Funato, Shigeo Fujita
  • Publication number: 20050082544
    Abstract: The invention provides a nitride semiconductor light-emitting device comprising gallium nitride semiconductor layers formed on a heterogeneous substrate, wherein light emissions having different light emission wavelengths or different colors are given out of the same active layer. Recesses 106 are formed by etching in the first electrically conductive (n) type semiconductor layer 102 formed on a substrate with a buffer layer interposed between them. Each recess is exposed in plane orientations different from that of the major C plane. For instance, the plane orientation of the A plane is exposed. An active layer is grown and joined on the plane of this plane orientation, on the bottom of the recess and the C-plane upper surface of a non-recess portion. The second electrically conductive (p) type semiconductor layer is formed on the inner surface of the recess.
    Type: Application
    Filed: October 20, 2003
    Publication date: April 21, 2005
    Inventors: Yukio Narukawa, Isamu Niki, Axel Scherer, Koichi Okamoto, Yoichi Kawakami, Mitsuru Funato, Shigeo Fujita
  • Patent number: 6876009
    Abstract: The luminous efficiency of a nitride semiconductor device comprising a gallium nitride-based semiconductor layer formed on a dissimilar substrate is improved. An n-type layer formed on the substrate with a buffer layer interposed between them comprises a portion of recess-and-projection shape in section as viewed in the longitudinal direction. Active layers are formed on at least two side faces of the projection with the recess located between them. A p-type layer is formed within the recess. An insulating layer is formed on the top face of the projection, and on the bottom face of the recess. The n-type layer is provided with an n-electrode while the p-type layer is provided with a p-electrode contact layer. As viewed from the p-type layer formed within the recess in the gallium nitride-based semiconductor layer, the active layer and the n-type layer are located in an opposite relation to each other.
    Type: Grant
    Filed: December 9, 2002
    Date of Patent: April 5, 2005
    Assignee: Nichia Corporation
    Inventors: Yukio Narukawa, Isamu Niki, Axel Scherer, Koichi Okamoto, Yoichi Kawakami, Mitsuru Funato, Shigeo Fujita
  • Patent number: 6870191
    Abstract: A high external quantum efficiency is stably secured in a semiconductor light emitting device. At least one recess and/or protruding portion is created on the surface portion of a substrate for scattering or diffracting light generated in a light emitting region. The recess and/or protruding portion has a shape that prevents crystal defects from occurring in semiconductor layers.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: March 22, 2005
    Assignee: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji
  • Publication number: 20050001227
    Abstract: A high external quantum efficiency is stably secured in a semiconductor light emitting device. At least one recess and/or protruding portion is created on the surface portion of a substrate for scattering or diffracting light generated in a light emitting region. The recess and/or protruding portion has a shape that prevents crystal defects from occurring in semiconductor layers.
    Type: Application
    Filed: July 23, 2004
    Publication date: January 6, 2005
    Applicant: Nichia Corporation
    Inventors: Isamu Niki, Motokazu Yamada, Masahiko Sano, Shuji Shioji