Abstract: A method of forming a resist pattern including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent by action of an acid; exposing the resist film; and patterning by a negative-tone development using a developing solution containing the organic solvent, wherein the base component (A) contains a resin component (A1) having a structural unit (a0) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid, and the developing solution contains a nitrile solvent.

Abstract: A technique which in a portable or laptop ultrasonic diagnosis apparatus, optimizes the position of a hinge mechanism for connecting a display section having a touch panel and a main body and the strength of the main body and also reduce the influence of noise between mutual sections, such as an ultrasonic image processing circuit board, a power source, a CPU board and the like, which are arranged inside the main body is disclosed. According to this technique, on a bottom surface of a bottom case 11 in the main body, a supporting section 12 for supporting a display section 20 is formed to stand upright and extend in a width direction, at a position that is dislocated to a front end F side from a rear end R of a main body 10. Also, a region A in which the ultrasonic image processing circuit board is arranged and regions B, C in which a power source unit and the CPU board are arranged, respectively, are partitioned by means of the supporting section 12.

Abstract: A method of forming a resist pattern including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent by action of an acid; exposing the resist film; and patterning by a negative-tone development using a developing solution containing the organic solvent, wherein the base component (A) contains a resin component (A1) having a structural unit (a0) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid, and the developing solution contains a nitrile solvent.

Abstract: A positive resist composition including: a base component; and a sensitizer which a polymeric compound having a core portion that includes a hydrocarbon group or a heterocycle of two or more valences and at least one arm portion bonded to the core portion and represented by formula (1), and a polymeric compound having a core portion including a polymer having a molecular weight of 500 to 20,000 and at least one arm portion bonded to the core portion and represented by formula (1); and either the base component includes a resin component that generates acid upon exposure and exhibits increased solubility in an alkali developing solution under action of acid, or the positive resist composition further contains an acid generator component including a compound that generates acid upon exposure: —(X)—Y??(1) in which X represents a divalent linking group having an acid dissociable group; and Y represents a polymer chain.

Abstract: A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.

Abstract: A positive resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under action of acid; and a sensitizer (G), wherein the sensitizer (G) is at least one compound selected from the group consisting of a polymeric compound (G1) having a core portion that includes a hydrocarbon group or a heterocycle of two or more valences and also at least one arm portion that is bonded to the core portion and is represented by general formula (1) shown below, and a polymeric compound (G2) having a core portion that includes a polymer having a molecular weight of 500 or more and 20,000 or less and also at least one arm portion that is bonded to the core portion and is represented by general formula (1) shown below; and either the base component (A) includes a resin component (A1) that generates acid upon exposure and also exhibits increased solubility in an alkali developing solution under action of acid, or the positive resist composition further contains an a

Abstract: A technique which in a portable or laptop ultrasonic diagnosis apparatus, optimizes the position of a hinge mechanism for connecting a display section having a touch panel and a main body and the strength of the main body and also reduce the influence of noise between mutual sections, such as an ultrasonic image processing circuit board, a power source, a CPU board and the like, which are arranged inside the main body is disclosed. According to this technique, on a bottom surface of a bottom case 11 in the main body, a supporting section 12 for supporting a display section 20 is formed to stand upright and extend in a width direction, at a position that is dislocated to a front end F side from a rear end R of a main body 10. Also, a region A in which the ultrasonic image processing circuit board is arranged and regions B, C in which a power source unit and the CPU board are arranged, respectively, are partitioned by means of the supporting section 12.

Abstract: A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.

Abstract: A composition for formation of an antireflection film having an excellent etching resistant characteristic and ability to prevent reflection of short-wavelength light (absorption ability of short-wavelength light) as well as excellent time dependent stability, and an antireflection film in which the same is used, are provided. A composition for formation of an antireflection film including a siloxane compound having a light-absorbing group and a crosslinking group, the siloxane compound being blocked with a capping group, is provided. By thus blocking the siloxane compound with a capping group, time dependent stability can be improved without deteriorating etching resistance, and ability to prevent reflection.

Abstract: A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent, a composition prepared by dissolving (A) an alkali soluble resin having a hydroxyl group in the side chain, (B) a photo acid generator and (C) a compound represented by the following general formula (I): H2C?CH—O—R1—O—CH?CH2??(I) ?wherein R1 represents an alkylene group having 1 to 10 carbon atoms or the like, in an organic solvent being used as the chemically amplified positive resist composition, the method further having a heat treatment step of heat-treating the substrate on which the resist pattern is formed at a temperature of 150 to 400° C. between the resist pattern forming step and the removing step.

Abstract: A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent, a composition prepared by dissolving (A) an alkali soluble resin having a hydroxyl group in the side chain, (B) a photo acid generator and (C) a compound represented by the following general formula (I): H2C?CH—O—R1O—CH?CH2??(I) wherein R1 represents an alkylene group having 1 to 10 carbon atoms or the like, in an organic solvent being used as the chemically amplified positive resist composition, the method further having a heat treatment step of heat-treating the substrate on which the resist pattern is formed at a temperature of 150 to 400° C. between the resist pattern forming step and the removing step.

Abstract: An injection mold for casting a semi-solidified Fe alloy includes a scalping gate for eliminating surface oxide film of a semi-solidified Fe alloy injected into the mold cavity from a pressure chamber. The scalping gate is arranged between the pressure chamber and a runner that is in communication with the mold cavity. The mold halves and the scalping gate are each formed of a copper alloy having a thermal conductivity of not less than 120 W/(m·K) and a hardness of not less than 180 HB. The mold halves and the scalping gate each have a cermet layer consisting essentially of at least one member selected from a group consisting of Co, Cu, Cr and Ni. The cermet layer is formed by electro-spark deposition, via an intermediate layer of Ni alloy, which is also formed by electro-spark deposition.

Abstract: A thixocast casting material is formed of an Fe—C—Si based alloy in which an angle endothermic section due to the melting of a eutectic crystal exists in a latent heat distribution curve and has a eutectic crystal amount Ec in a range of 10% by weight<Ec<50% by weight. This composition comprises 1.8% by weight≦C≦2.5% by weight of carbon, 1.4% by weight≦Si≦3% by weight if silicon and a balance of Fe including inevitable impurities.

Abstract: An injection mold for semi-solidified Fe alloy includes a scalping gate for eliminating surface oxide film of a semi-solidified Fe alloy injected into the mold cavity from a pressure chamber. The scalping gate is arranged between the pressure clamber and a runner that is in communication with the mold cavity. The mold halves and the scalping gate are each formed of a copper alloy having a thermal conductivity of not less than 120 W/(m·K) and a hardness of not less than 180 HB. The mold halves and the scalping gate each has a cermet layer consisting essentially of at least one member selected from a group consisting of Co, Cu, Cr and Ni. The cermet layer is formed by electro-spark deposition, via an intermediate layer of Ni alloy also formed by electro-spark deposition.

Abstract: A thixocast casting material is formed of an Fe--C--Si based alloy in which an angle endothermic section due to the melting of a eutectic crystal exists in a latent heat distribution curve and has a eutectic crystal amount Ec in a range of 10% by weight <Ec<50% by weight. This composition comprises 1.8% by weight .ltoreq.C.ltoreq.2.5% by weight of carbon, 1.4% by weight .ltoreq.Si.ltoreq.3% by weight of silicon and a balance of Fe including inevitable impurities.

Abstract: Low alloy steels for use in pressure vessel comprising on the weight % basis:C: from 0.05% to 0.30%,Si: less than 0.10%,Mn: from 0.3% to 1.5%,Ni: from inevitably incorporated content to 0.55%,Cr: from 1.5% to 5.5%,Mo: from 0.25% to 1.5%,V: in excess of 0.10% and less than 0.6%, andthe balance of iron and inevitably incorporated impurities.The steels are excellent in hardenability, the hot strength, toughness weldability and hydrogen attack and embrittlement resistance, as well as show excellent toughness after the use in the temper brittle temperature region.

Abstract: A high voltage power cable assembly for applying rectangular high voltage pulses to an X-ray tube of an X-ray diagnostic apparatus, including two conducting lines formed of a plurality of stranded or twisted wires covered with insulating layers, two conductors including a plurality of stranded or twisted wires arranged in opposition to a contact point of the conduct lines, the conductors having opposite ends connected to each other, a semi-conductive layer enclosing the conducting lines and the conductors, an insulating layer covering the semi-conductive layer, a shield layer covering the insulating layer, and a sheath wrapping the shield layer.

Abstract: A friction spinning apparatus comprises a combing roller (19) for opening and feeding fibers in a duct (16, 15) to a throat (Q) formed between the outer surfaces of a pair of perforated and smooth surface drums (10, 12) arranged in parallel to each other and rotating in the same direction. A yarn (Y) formed at the throat (Q), by frictional contact between the fed fibers and the surfaces caused by a suction force, is withdrawn along the throat (Q). The duct (15, 16) is arranged to feed the fibers in an air stream having a direction inclined to the yarn axis (YL) and has a nozzle (17) in the form of a double pipe in the midportion thereof. A compressed air is ejected from the annular slit (17a) between the inner and outer pipe of the nozzle (17) to drag the fibers out from the nozzle (17) to cause them to stretch, whereby the fibers can be conveyed on the throat (Q) in the stretched state.