Abstract: A thin film magnetic recording head having a multilayer structure in which plural thin films are laminated and being a perpendicular recording type that applies a magnetic field perpendicularly to a magnetic recording medium and performs recording, includes a main magnetic pole exposed on an air bearing surface facing the magnetic recording medium and guiding a magnetic flux toward the magnetic recording medium, a thin film positioned beneath the main magnetic pole from a perspective of a lamination direction and configuring a sensor or a heater configured to determine a distance from the magnetic recording medium of the thin film magnetic recording head, and a light-absorbing portion positioned between the main magnetic pole and the thin film.

Abstract: A thin film magnetic recording head having a multilayer structure in which plural thin films are laminated and being a perpendicular recording type that applies a magnetic field perpendicularly to a magnetic recording medium and performs recording, includes a main magnetic pole exposed on an air bearing surface facing the magnetic recording medium and guiding a magnetic flux toward the magnetic recording medium, a thin film positioned beneath the main magnetic pole from a perspective of a lamination direction and configuring a sensor or a heater configured to determine a distance from the magnetic recording medium of the thin film magnetic recording head, and a light-absorbing portion positioned between the main magnetic pole and the thin film.

Abstract: A magnetic head slider includes a magnetic recording part and/or a reproducing part. The magnetic head slider includes a resistance film having temperature dependence of electrical resistance, the resistance film being positioned in the vicinity of an air bearing surface or on the air bearing surface, separately from the magnetic recording part and the reproducing part. The magnetic head slider further includes a first protective film with a smaller milling rate than the resistance film, the first protective film contacting a lower surface of the resistance film in a lamination direction of the magnetic head slider and on the air bearing surface, and/or a second protective film with a smaller milling rate than the resistance film, the second protective film contacting an upper surface of the resistance film in the lamination direction of the magnetic head slider and on the air bearing surface.

Abstract: A main magnetic pole includes a first part extending from a medium facing surface to a point at a predetermined distance from the medium facing surface, and a second part other than the first part. An accommodation part for accommodating the main magnetic pole includes: a first layer having a groove; a second layer lying between the first layer and the main magnetic pole in the first layer's groove; and a third layer interposed in part between the second layer and the main magnetic pole in the first layer's groove. The second layer is formed of a metal material different from a material used to form the first layer. The third layer is formed of an inorganic insulating material. The second and third layers lie between the first layer and the first part. The second layer lies between the bottom of the first layer's groove and the second part, but the third layer does not. The distance between the bottom of the first layer's groove and the second part is smaller than that between the bottom and the first part.

Abstract: A testing method of a wafer provided with a plurality of thin-film magnetic heads is provided. Each of the plurality of thin-film magnetic heads includes a main pole layer, a first test pad formed on the wafer and electrically connected with an extended top end section of the main pole layer and a second test pad formed on the wafer and electrically connected with a back end section of the main pole layer. The testing method includes a step of measuring an electrical resistance between the first test pad and the second test pad, a step of judging whether the measured electrical resistance is within a set range, and a step of discriminating that the thin-film magnetic head is a non-defective product when the measured electrical resistance is within the set range.

Abstract: A main magnetic pole includes a first part extending from a medium facing surface to a point at a predetermined distance from the medium facing surface, and a second part other than the first part. An accommodation part for accommodating the main magnetic pole includes: a first layer having a groove; a second layer lying between the first layer and the main magnetic pole in the first layer's groove; and a third layer interposed in part between the second layer and the main magnetic pole in the first layer's groove. The second layer is formed of a metal material different from a material used to form the first layer. The third layer is formed of an inorganic insulating material. The second and third layers lie between the first layer and the first part. The second layer lies between the bottom of the first layer's groove and the second part, but the third layer does not. The distance between the bottom of the first layer's groove and the second part is smaller than that between the bottom and the first part.

Abstract: A testing method of a wafer provided with a plurality of thin-film magnetic heads is provided. Each of the plurality of thin-film magnetic heads includes a main pole layer, a first test pad formed on the wafer and electrically connected with an extended top end section of the main pole layer and a second test pad formed on the wafer and electrically connected with a back end section of the main pole layer. The testing method includes a step of measuring an electrical resistance between the first test pad and the second test pad, a step of judging whether the measured electrical resistance is within a set range, and a step of discriminating that the thin-film magnetic head is a non-defective product when the measured electrical resistance is within the set range.