Patents by Inventor Isao Doi

Isao Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200040294
    Abstract: There are provided a device and a method for more appropriate evaluation of a chemical substance. The device for the evaluation of the chemical substance includes a first compartment, and a second compartment that communicates with the first compartment and is separated from the first compartment by a partition wall.
    Type: Application
    Filed: January 18, 2018
    Publication date: February 6, 2020
    Inventors: TAMIHIDE MATSUNAGA, Takahiro IWAO, Satoshi KONDO, Atsushi DOI, Isao SAITO
  • Publication number: 20180328239
    Abstract: A communicating hole, which communicates between a clearance space and the outside of a cover member, is formed in the cover member, and a seal cap is fitted to and retained in a distal-end opening of the communicating hole. The seal cap includes a cap main body having a ventilation through hole formed in an internal axial direction and an outer peripheral wall configured to engage with the communicating hole, a supporting portion fitted, from the outside, into a recessed groove formed in an outside end face of the cap main body, and a ventilation filter located on a bottom face of the recessed groove and retained and sandwiched between the cap main body and the supporting portion. Therefore, an internal pressure rise in the clearance space between the cover member and an electric motor can be effectively suppressed, and thus improved mountability and retainability can be obtained.
    Type: Application
    Filed: November 27, 2015
    Publication date: November 15, 2018
    Applicant: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Ryo TADOKORO, Isao DOI, Hiroyuki NEMOTO, Seiichi SUE
  • Patent number: 9874116
    Abstract: A valve timing control device for an internal combustion engine includes: a driving rotation member, a driven rotation member, a speed reduction mechanism, a circumferential clearance of the each of the rolling member being formed within an angle range of 0.01° to 0.4° in a circumferential direction from a reference line extending from a rotation axis of the driving rotation member in a radial direction, in a space constituted by the eccentric rotation member, the internal teeth constituting section, and the one of the holding holes.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: January 23, 2018
    Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Atsushi Yamanaka, Isao Doi, Seiji Tsuruta
  • Patent number: 9683465
    Abstract: A valve-timing control apparatus varies a relative phase between a cam shaft and a crankshaft by energizing an electric motor through a power-feeding brush provided to be in contact with a slip ring. The valve-timing control apparatus includes a retaining member slidably retaining the power-feeding brush; a connector provided in the retaining member and connected to a power source; a pigtail harness including one end portion connected with the power-feeding brush, and another end portion connected with a terminal of the connector through a fixing portion; and a guide portion provided in the retaining member and including an outer circumferential surface formed in an arc-shape. The pigtail harness bends along the outer circumferential surface of the guide portion. The another end portion extends substantially in a linear arrangement from the fixing portion to a bending portion at which the pigtail harness bends along the outer circumferential surface.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: June 20, 2017
    Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Ryo Tadokoro, Seiichi Sue, Shinichi Kawada, Hiroyuki Nemoto, Isao Doi
  • Publication number: 20160348543
    Abstract: A valve timing control device for an internal combustion engine includes: a driving rotation member, a driven rotation member, a speed reduction mechanism, a circumferential clearance of the each of the rolling member being formed within an angle range of 0.01° to 0.4° in a circumferential direction from a reference line extending from a rotation axis of the driving rotation member in a radial direction, in a space constituted by the eccentric rotation member, the internal teeth constituting section, and the one of the holding holes.
    Type: Application
    Filed: March 10, 2015
    Publication date: December 1, 2016
    Applicant: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Atsushi YAMANAKA, Isao DOI, Seiji TSURUTA
  • Publication number: 20150345346
    Abstract: A valve-timing control apparatus varies a relative phase between a cam shaft and a crankshaft by energizing an electric motor through a power-feeding brush provided to be in contact with a slip ring. The valve-timing control apparatus includes a retaining member slidably retaining the power-feeding brush; a connector provided in the retaining member and connected to a power source; a pigtail harness including one end portion connected with the power-feeding brush, and another end portion connected with a terminal of the connector through a fixing portion; and a guide portion provided in the retaining member and including an outer circumferential surface formed in an arc-shape. The pigtail harness bends along the outer circumferential surface of the guide portion. The another end portion extends substantially in a linear arrangement from the fixing portion to a bending portion at which the pigtail harness bends along the outer circumferential surface.
    Type: Application
    Filed: May 29, 2015
    Publication date: December 3, 2015
    Applicant: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Ryo TADOKORO, Seiichi Sue, Shinichi Kawada, Hiroyuki Nemoto, Isao Doi
  • Patent number: 9115611
    Abstract: A variable valve operating apparatus including an electric motor including a motor housing with a permanent magnet, and a speed reducing mechanism having a casing, the motor housing and the casing of the speed reducing mechanism being coupled to each other by a plurality of bolts, wherein the motor housing includes a convex portion formed in a portion of the motor housing which is opposed to one axial end of the permanent magnet, the convex portion having a threaded hole into which a tip end portion of each bolt is screwed, and a projection formed on an axial end surface of the convex portion in alignment with the threaded hole in an axial direction of the threaded hole, and wherein the axial end surface of the convex portion is located further spaced from the one axial end of the permanent magnet than the projection.
    Type: Grant
    Filed: June 2, 2014
    Date of Patent: August 25, 2015
    Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Atsushi Yamanaka, Ryo Tadokoro, Hiroyuki Nemoto, Isao Doi
  • Publication number: 20140373795
    Abstract: A variable valve operating apparatus including an electric motor including a motor housing with a permanent magnet, and a speed reducing mechanism having a casing, the motor housing and the casing of the speed reducing mechanism being coupled to each other by a plurality of bolts, wherein the motor housing includes a convex portion formed in a portion of the motor housing which is opposed to one axial end of the permanent magnet, the convex portion having a threaded hole into which a tip end portion of each bolt is screwed, and a projection formed on an axial end surface of the convex portion in alignment with the threaded hole in an axial direction of the threaded hole, and wherein the axial end surface of the convex portion is located further spaced from the one axial end of the permanent magnet than the projection.
    Type: Application
    Filed: June 2, 2014
    Publication date: December 25, 2014
    Applicant: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Atsushi YAMANAKA, Ryo TADOKORO, Hiroyuki NEMOTO, Isao DOI
  • Patent number: 8881399
    Abstract: A manufacturing method of nozzle plate for liquid ejection head includes, providing a substrate having a first base material of Si and a second base material, of which the etching rate in Si anisotropic dry etching is lower then that of Si, provided on one side of the first base material, forming a film as a second etching mask on the surface of the second base material, forming a second etching mask pattern having a small-diameter opening shape in the second etching mask film, etching until the etching part is extended through the second base material, forming a film as a first etching mask film on the surface of the first base material, forming a first etching mask pattern having a large-diameter opening shape in the first etching mask film, and Si anisotropic dry etching until the etched part is extended through the first base material.
    Type: Grant
    Filed: August 17, 2007
    Date of Patent: November 11, 2014
    Assignee: Konica Minolta Holdings, Inc.
    Inventors: Atsuro Yanata, Isao Doi
  • Patent number: 8162439
    Abstract: Provided is a method for manufacturing a nozzle plate which has a through hole having an ejection port. In the method, the through hole, which has one opening as an ejection port for ejecting the liquid, is arranged on a Si substrate by an anisotropic etching method wherein etching and side wall protection film formation are alternately repeated to the Si substrate and the following steps are performed in the following order; forming a film to be an etching mask on a surface of the Si substrate whereupon the ejection port is to be formed, forming the etching mask pattern having an opening for forming the thorough hole by performing photolithography and etching to a film to be the etching mask, and performing the etching by the anisotropic etching method by satisfying the conditional expression.
    Type: Grant
    Filed: June 3, 2008
    Date of Patent: April 24, 2012
    Assignee: Konica Minolta Holdings, Inc.
    Inventors: Isao Doi, Tomoko Miyaura, Hiroshi Oshitani
  • Publication number: 20100134560
    Abstract: Provided is a method for manufacturing a nozzle plate which has a through hole having an ejection port. In the method, the through hole, which has one opening as an ejection port for ejecting the liquid, is arranged on a Si substrate by an anisotropic etching method wherein etching and side wall protection film formation are alternately repeated to the Si substrate and the following steps are performed in the following order; forming a film to be an etching mask on a surface of the Si substrate whereupon the ejection port is to be formed, forming the etching mask pattern having an opening for forming the thorough hole by performing photolithography and etching to a film to be the etching mask, and performing the etching by the anisotropic etching method by satisfying the conditional expression.
    Type: Application
    Filed: June 3, 2008
    Publication date: June 3, 2010
    Inventors: Isao Doi, Tomoko Miyaura, Hiroshi Oshitani
  • Patent number: 7665829
    Abstract: Liquid ejecting apparatus 20 for ejecting electrically charged droplets of the liquid solution onto base member K, which includes liquid ejecting head 26 to eject the droplets from top end 21a of nozzle 21, with the inner diameter equal to or less than 100 ?m, liquid solution supplying section 29 to supply the liquid solution into nozzle 21, and ejection voltage applying section 25 to apply the ejection voltage onto the liquid solution in nozzle 21. In liquid ejecting apparatus 20, nozzle 21 projects toward the droplet ejecting direction from nozzle plane 26e on nozzle plate 26c facing base member K, whereby the projecting length of nozzle 21 is equal to or less than 30 ?m.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: February 23, 2010
    Assignee: Konica Minolta Holdings, Inc.
    Inventors: Nobuhiro Ueno, Isao Doi, Yasuo Nishi, Nobuhisa Ishida
  • Publication number: 20090195605
    Abstract: A manufacturing method of nozzle plate for liquid ejection head includes, providing a substrate having a first base material of Si and a second base material, of which the etching rate in Si anisotropic dry etching is lower then that of Si, provided on one side of the first base material, forming a film as a second etching mask on the surface of the second base material, forming a second etching mask pattern having a small-diameter opening shape in the second etching mask film, etching until the etching part is extended through the second base material, forming a film as a first etching mask film on the surface of the first base material, forming a first etching mask pattern having a large-diameter opening shape in the first etching mask film, and Si anisotropic dry etching until the etched part is extended through the first base material.
    Type: Application
    Filed: August 17, 2007
    Publication date: August 6, 2009
    Inventors: Atsuro Yanata, Isao Doi
  • Publication number: 20070200898
    Abstract: Liquid ejecting apparatus 20 for ejecting electrically charged droplets of the liquid solution onto base member K, which includes liquid ejecting head 26 to eject the droplets from top end 21a of nozzle 21, with the inner diameter equal to or less than 100 ?m, liquid solution supplying section 29 to supply the liquid solution into nozzle 21, and ejection voltage applying section 25 to apply the ejection voltage onto the liquid solution in nozzle 21. In liquid ejecting apparatus 20, nozzle 21 projects toward the droplet ejecting direction from nozzle plane 26e on nozzle plate 26c facing base member K, whereby the projecting length of nozzle 21 is equal to or less than 30 ?m.
    Type: Application
    Filed: July 20, 2005
    Publication date: August 30, 2007
    Applicant: KONICA MINOLTA HOLDINGS, INC.
    Inventors: Nobuhiro Ueno, Isao Doi, Yasuo Nishi, Nobuhisa Ishida
  • Patent number: 6661555
    Abstract: A light shutter device including a group of light shutter elements 31a, 31b 31c and 31d formed on a light shutter chip 30 made of PLZT has a construction in which an electrode gap is set wider in a element in which an electric field acts more strongly to equalize half wavelength voltages of elements almost to the same level since electric fields acting on the elements are different in strength from each other even under a prescribed voltage applied between a common electrode 32 and each of individual electrodes 33. An electrode gap of an element 31c having a weaker electric field is comparatively set narrower, whereas an electrode gap of an element 31d having a stronger electric field is set comparatively wider. Moreover, a shape of electrodes of each element are altered so as to make half wavelength voltages of elements almost equal.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: December 9, 2003
    Assignee: Minolta Co., Ltd.
    Inventors: Tomohiko Masuda, Ken Matsubara, Isao Doi, Yasuyuki Hiromoto
  • Publication number: 20020186446
    Abstract: In order to attain a light shutter device capable of individually suppressing variations in quantity of transmitted light among light shutter elements regardless of differences in position of a light shutter element and pattern of electrodes around a light shutter element on a substrate, a light shutter device including a group of light shutter elements 31a, 31b, 31c and 31d formed on a light shutter chip 30 made of PLZT has a construction in which an electrode gap is set wider in a element in which an electric field acts more strongly to equalize half wavelength voltages of elements almost to the same level since electric fields acting on the elements are different in strength from each other even under a prescribed voltage applied between a common electrode 32 and each of individual electrodes 33.
    Type: Application
    Filed: June 11, 2002
    Publication date: December 12, 2002
    Applicant: Minolta Co., Ltd.
    Inventors: Tomohiko Masuda, Ken Matsubara, Isao Doi, Yasuyuki Hiromoto
  • Patent number: 6441941
    Abstract: A light shutter device which has a plurality of light transmitting portions (light shutter elements) on a planar PLZT substrate. By applying voltages between a common electrode and individual electrodes to apply electric fields to the light shutter elements, the light shutter elements transmit and shut light individually. Suppose each of the individual electrodes faces the common electrode at a distance L and has a dimension W in a direction perpendicular to the direction of electric field, W/L>2. Suppose each of the individual electrodes has a dimension D in the direction of electric field, preferably D/L>0.5. Further, the individual electrodes are so placed that the distance between a side of one light shutter element which extends in a direction perpendicular to the direction of electric field and each of the individual electrodes which drive the other light shutter elements is not less than 5L.
    Type: Grant
    Filed: December 5, 2000
    Date of Patent: August 27, 2002
    Assignee: Minolta Co., Ltd.
    Inventors: Isao Doi, Itaru Saito, Tomohiko Masuda, Tsukasa Yagi, Ken Matsubara, Yuji Kamoda
  • Patent number: 6347894
    Abstract: A light shutter device which, on a planar PLZT substrate, has a plurality of light transmitting portions (light shutter elements) which are disposed in two groups separated by a common electrode, and individual electrodes provided for the respective elements. Adjacent light shutter elements in each of the groups are arranged in mutually different lines so as to inhibit crosstalk.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: February 19, 2002
    Assignee: Minolta Co., Ltd.
    Inventors: Tsukasa Yagi, Isao Doi, Yuji Kamoda
  • Publication number: 20010043262
    Abstract: Disclosed is an optical writing device comprising a plurality of writing light shutter elements and at least one of monitoring light shutter element. Both the writing and monitoring light shutter elements are driven by being alternatively impressed a forward electric field and a reverse electric field with a predetermined impression ratio of the forward and reverse electric fields during optical writing operation. After the optical writing operation, the monitoring light shutter element is driven by being impressed the forward electric field with varying the amount of the electric field, whereby a half-wavelength voltage of the monitoring light shutter element is determined. For the next optical writing operation, the impression ratio is updated based on the determined half-wavelength voltage.
    Type: Application
    Filed: September 10, 1999
    Publication date: November 22, 2001
    Inventors: TSUKASA YAGI, ISAO DOI, KEN MATSUBARA
  • Publication number: 20010004295
    Abstract: A light shutter device which has a plurality of light transmitting portions (light shutter elements) on a planar PLZT substrate. By applying voltages between a common electrode and individual electrodes to apply electric fields to the light shutter elements, the light shutter elements transmit and shut light individually. Suppose each of the individual electrodes faces the common electrode at a distance L and has a dimension W in a direction perpendicular to the direction of electric field, W/L>2. Suppose each of the individual electrodes has a dimension D in the direction of electric field, preferably D/L> 0.5. Further, the individual electrodes are so placed that the distance between a side of one light shutter element which extends in a direction perpendicular to the direction of electric field and each of the individual electrodes which drive the other light shutter elements is not less than 5L.
    Type: Application
    Filed: December 5, 2000
    Publication date: June 21, 2001
    Applicant: MINOLTA CO., LTD.
    Inventors: Isao Doi, Itaru Saito, Tomohiko Masuda, Tsukasa Yagi, Ken Matsubara, Yuji Kamoda