Patents by Inventor Isao Mita

Isao Mita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist composition and method for producing semiconductor device
    Patent number: 9304399
    Abstract: A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: April 5, 2016
    Assignee: SONY CORPORATION
    Inventors: Nobuyuki Matsuzawa, Isao Mita, Koji Arimitsu
  • RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
    Publication number: 20140273513
    Abstract: There is provided a resist composition including a crosslinking material configured to cause crosslinking in the presence of an acid, an inclusion compound, and a solvent.
    Type: Application
    Filed: March 11, 2014
    Publication date: September 18, 2014
    Applicant: Sony Corporation
    Inventors: Isao Mita, Nobuyuki Matsuzawa, Koji Arimitsu
  • RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
    Publication number: 20140248777
    Abstract: A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
    Type: Application
    Filed: May 16, 2014
    Publication date: September 4, 2014
    Applicant: Sony Corporation
    Inventors: Nobuyuki Matsuzawa, Isao Mita, Koji Arimitsu
  • Resist composition and method for producing semiconductor device
    Patent number: 8765353
    Abstract: A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: July 1, 2014
    Assignee: Sony Corporation
    Inventors: Koji Arimitsu, Nobuyuki Matsuzawa, Isao Mita
  • Method of modifying chemically amplified resist pattern, modifier for chemically amplified resist pattern, and resist pattern structure
    Patent number: 8697342
    Abstract: Disclose herein is a method of modifying a positive-type chemically amplified resist pattern, including the steps of, applying to a surface of a resist pattern, an aqueous solution of a modifier for the positive-type chemically amplified resist pattern, the aqueous solution containing a water-soluble cross-linking agent and a penetration accelerator, the cross-linking agent and the penetration accelerator being dissolved in water or a mixed solvent containing water as a main ingredient, so as to permit the cross-linking agent to penetrate the resist pattern, removing a surplus of the cross-linking agent, and irradiating the resist pattern.
    Type: Grant
    Filed: March 8, 2011
    Date of Patent: April 15, 2014
    Assignee: Sony Corporation
    Inventors: Ichiro Takemura, Isao Mita, Eriko Matsui, Nobuyuki Matsuzawa
  • RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
    Publication number: 20120077343
    Abstract: A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
    Type: Application
    Filed: September 21, 2011
    Publication date: March 29, 2012
    Applicant: SONY CORPORATION
    Inventors: Koji Arimitsu, Nobuyuki Matsuzawa, Isao Mita
  • Method of modifying chemically amplified resist pattern, modifier for chemically amplified resist pattern, and resist pattern structure
    Publication number: 20110244197
    Abstract: Disclose herein is a method of modifying a positive-type chemically amplified resist pattern, including the steps of, applying to a surface of a resist pattern, an aqueous solution of a modifier for the positive-type chemically amplified resist pattern, the aqueous solution containing a water-soluble cross-linking agent and a penetration accelerator, the cross-linking agent and the penetration accelerator being dissolved in water or a mixed solvent containing water as a main ingredient, so as to permit the cross-linking agent to penetrate the resist pattern, removing a surplus of the cross-linking agent, and irradiating the resist pattern.
    Type: Application
    Filed: March 8, 2011
    Publication date: October 6, 2011
    Applicant: Sony Corporation
    Inventors: Ichiro Takemura, Isao Mita, Eriko Matsui, Nobuyuki Matsuzawa