Patents by Inventor Isao Nakatani
Isao Nakatani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9017578Abstract: The problems can be solved by using a method for producing a metal nanoparticle colloid, which comprises the steps of S1: mixing, into a nonpolar hydrocarbon oil having a vapor pressure of 10?3 Torr or less at room temperature, organic molecules having both a hydrophilic group and a lipophilic group and having in the end of the hydrophilic group an N, S, P, or O atom or having at the hydrophilic group a functional group of an NH2 group, an NH group, an SH group, a PO group, or an OH group to prepare a base liquid, and S2: placing the base liquid in a rotatable vacuum drum and charging a non-magnetic metal material in a crucible provided in the vacuum drum, and depositing the vapor of the non-magnetic metal material on the base liquid which adheres to the inner wall of the vacuum drum and rotates together with the rotating drum under conditions such that the inside of the vacuum drum is under a reduced pressure and the vacuum drum is rotated, and a task of the present invention is to provide a method for produType: GrantFiled: May 31, 2011Date of Patent: April 28, 2015Assignee: National Institute For Materials ScienceInventor: Isao Nakatani
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Publication number: 20130265735Abstract: Disclosed is a metal nanoparticle paste that uses the low-temperature sintering characteristics of metal nanoparticles to easily obtain a metal bond with excellent conductivity and mechanical strength, and which can form a wiring pattern with excellent conductivity. The metal nanoparticle paste is characterized by containing (A) metal nanoparticles, (B) a protective film that coats the surface of the metal nanoparticles, (C) a carboxylic acid, and (D) a dispersion medium.Type: ApplicationFiled: June 2, 2011Publication date: October 10, 2013Inventors: Isao Nakatani, Masato Hirose, Keita Harashima, Satoru Kurita, Tatsuya Kiyota
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Patent number: 8524094Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.Type: GrantFiled: July 16, 2008Date of Patent: September 3, 2013Assignees: National Institute for Materials Science, Japan Science and Technology Corporation, Anelva CorporationInventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
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Publication number: 20130126798Abstract: The problems can be solved by using a method for producing a metal nanoparticle colloid, which comprises the steps of S1: mixing, into a nonpolar hydrocarbon oil having a vapor pressure of 10?3 Torr or less at room temperature, organic molecules having both a hydrophilic group and a lipophilic group and having in the end of the hydrophilic group an N, S, P, or O atom or having at the hydrophilic group a functional group of an NH2 group, an NH group, an SH group, a PO group, or an OH group to prepare a base liquid, and S2: placing the base liquid in a rotatable vacuum drum and charging a non-magnetic metal material in a crucible provided in the vacuum drum, and depositing the vapor of the non-magnetic metal material on the base liquid which adheres to the inner wall of the vacuum drum and rotates together with the rotating drum under conditions such that the inside of the vacuum drum is under a reduced pressure and the vacuum drum is rotated, and a task of the present invention is to provide a method for produType: ApplicationFiled: May 31, 2011Publication date: May 23, 2013Inventor: Isao Nakatani
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Patent number: 8287617Abstract: A method for producing an alloy fine particle colloid by heating and evaporating a raw material binary alloy which is in a solid state in an ambient temperature and pressure environment in a reduced-pressure environment, cooling a generated vapor for condensation and solidification and collecting a formed alloy fine particle in a liquid medium, wherein (1) when an atomic fraction of a component element in the raw material alloy is defined as X, a component ratio of each of the elements of the raw material alloy is regulated such that a fraction of a vapor pressure of the component element to the total vapor pressure of the raw material alloy falls within the range of from (X?0.1) to (X+0.1); and (2) the raw material binary alloy is an alloy species which forms a homogeneous alloy phase in an alloy ingot. Thus, an alloy fine particle colloid is rationally and efficiently produced.Type: GrantFiled: April 25, 2007Date of Patent: October 16, 2012Assignee: National Institute for Materials ScienceInventor: Isao Nakatani
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Patent number: 7780876Abstract: A colloidal solution of fine particles of metal or alloy having an average grain size of 10 nm or more is provided which is heat treated to cause coloration, or a metal colloidal pigment having inherent color, a conductive paste material or a conductive ink for printed substrate electronic parts or the like based on a colloid prepared by dispersing fine metal particles at high concentration in a liquid is provided.Type: GrantFiled: April 18, 2005Date of Patent: August 24, 2010Assignee: National Institute for Materials ScienceInventor: Isao Nakatani
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Publication number: 20090151512Abstract: A method for producing an alloy fine particle colloid by heating and evaporating a raw material binary alloy which is in a solid state in an ambient temperature and pressure environment in a reduced-pressure environment, cooling a generated vapor for condensation and solidification and collecting a formed alloy fine particle in a liquid medium, wherein (1) when an atomic fraction of a component element in the raw material alloy is defined as X, a component ratio of each of the elements of the raw material alloy is regulated such that a fraction of a vapor pressure of the component element to the total vapor pressure of the raw material alloy falls within the range of from (X?0.1) to (X+0.1); and (2) the raw material binary alloy is an alloy species which forms a homogeneous alloy phase in an alloy ingot. Thus, an alloy fine particle colloid is rationally and efficiently produced.Type: ApplicationFiled: April 25, 2007Publication date: June 18, 2009Inventor: Isao Nakatani
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Publication number: 20080277377Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.Type: ApplicationFiled: July 16, 2008Publication date: November 13, 2008Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
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Publication number: 20080277629Abstract: A colloidal solution of fine particles of metal or alloy having an average grain size of 10 nm or more is provided which is heat treated to cause coloration, or a metal colloidal pigment having inherent color, a conductive paste material or a conductive ink for printed substrate electronic parts or the like based on a colloid prepared by dispersing fine metal particles at high concentration in a liquid is provided.Type: ApplicationFiled: April 18, 2005Publication date: November 13, 2008Inventor: Isao Nakatani
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Publication number: 20070119811Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.Type: ApplicationFiled: November 20, 2006Publication date: May 31, 2007Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
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Patent number: 6878635Abstract: A metallic thin film of copper, silver, gold, or one alloy selected from alloys containing as a main component at least one of these metals is etched by plasma of an etching gas containing at least nitrogen oxide while being reacted with the plasma, whereby making it possible to fine-process electrically conductive materials, heat-transfer materials and electric-contact materials made of copper, silver, gold or an alloy containing as a main component at least one of these metals.Type: GrantFiled: December 2, 1999Date of Patent: April 12, 2005Assignees: National Institute for Materials Science, Japan Science and Technology CorporationInventor: Isao Nakatani
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Patent number: 6669807Abstract: An apparatus for reactive-ion etching including a reaction vessel and metallic parts disposed in the reaction vessel, the whole or a part of which includes at least one metallic material selected from the group consisting of titanium, aluminum, and an alloy including at least one of them as a main component.Type: GrantFiled: January 31, 2002Date of Patent: December 30, 2003Assignees: National Research Institute for Metals, Japan Science and Technology CorporationInventor: Isao Nakatani
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Publication number: 20020158546Abstract: A rotating body in which a number of electrons injected from one rotation surface is the same as a number of electrons ejected from another rotation surface, and in which a degree of spin polarization of electrons injected from one rotation surface is different from a degree of spin polarization of electrons ejected from another rotation surface is used as a rotor, thus making possible a micro motor with a small amount of loss and that has a simple structure.Type: ApplicationFiled: January 10, 2002Publication date: October 31, 2002Inventor: Isao Nakatani
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Publication number: 20020079054Abstract: The invention provides a method for reactive-ion etching a magnetic material with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, the method comprising a step, in which a multilayered film comprising a magnetic material thin film having thereon a resist film formed on a substrate is exposed to an electron beam and then developed, to form a pattern on the resist film, a step, in which a mask material is vacuum deposited, a step, in which the resist is dissolved, to form a mask, and a step, in which a part of the magnetic material thin film that is not covered with the mask is removed by reactive ion etching with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, to form a pattern on the magnetic material thin film, and thus obtaining the magnetic material thin film finely worked.Type: ApplicationFiled: January 31, 2002Publication date: June 27, 2002Inventor: Isao Nakatani
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Patent number: 6391216Abstract: The invention provides a method for reactive-ion etching a magnetic material with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, the method comprising a step, in which a multilayered film comprising a magnetic material thin film having thereon a resist film formed on a substrate is exposed to an electron beam and then developed, to form a pattern on the resist film, a step, in which a mask material is vacuum deposited, a step, in which the resist is dissolved, to form a mask, and a step, in which a part of the magnetic material thin film that is not covered with the mask is removed by reactive ion etching with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, to form a pattern on the magnetic material thin film, and thus obtaining the magnetic material thin film finely worked.Type: GrantFiled: September 21, 1998Date of Patent: May 21, 2002Assignees: National Research Institute for Metals, Japan Science and Technology CorporationInventor: Isao Nakatani
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Publication number: 20020038681Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.Type: ApplicationFiled: July 24, 2001Publication date: April 4, 2002Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
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Patent number: 5476063Abstract: A seed crystal is connected with a polycrystal at one end of the polycrystal, the connected crystal material is melted under a zero-gravity or microgravity environment without any container, and a single crystal is grown.Type: GrantFiled: August 4, 1994Date of Patent: December 19, 1995Assignees: National Research Institute for Metals, National Space Development Agency of JapanInventors: Isao Nakatani, Satoshi Takahashi, Isao Nishida, Kiyoshi Ozawa
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Patent number: 5180512Abstract: A method of manufacturing a fine-particle colloid or a magnetic fluid of a metal nitride through reaction between a metal carbonyl and a nitride-bearing compound, a two-step reaction is performed, comprising a first-step reaction of synthesizing a nitrogen-bearing metal carbonyl which is a precursor substance and a second-step reaction of synthesizing metal nitride from said precursor substance. A step of eliminating unreacted metal carbonyl is provided between the two-step reaction. By repeatedly causing the series of reactions, a fine-particle colloid or a magnetic fluid of the metal nitride is manufactured. For the magnetic fluid, the solvent may be replaced in response to a particular purpose of use of application after production.Type: GrantFiled: April 12, 1991Date of Patent: January 19, 1993Assignee: National Research Institute for MetalsInventors: Isao Nakatani, Kiyosho Ozawa, Masayuki Hijikata, Tsutomu Takahashi
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Patent number: 5137652Abstract: A compound containing nitrogen is introduced into a solvent in which a metal carbonyl and a surface active agent are dissolved, and the solution is heated to generate a particle colloid or a magnetic fluid of a metal nitride. A particle colloid of a metal nitride with an even grain size, a good dispersibilitgy and a good fluidity, and a magnetic fluid thereof with an excellent properties are obtained with convenience and at high efficiency.Type: GrantFiled: December 18, 1990Date of Patent: August 11, 1992Assignee: National Research Institute For MetalsInventors: Isao Nakatani, Masayuki Hijikata, Tsutomu Takahashi, Kiyoshi Ozawa, Takao Furubayashi, Hiroaki Hanaoka
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Patent number: 5055280Abstract: A process for producing fibers of a transition metal boride, which comprises reacting a mixture of a vapor of an evaporable boron compound an a vapor of an evaporable transition metal compound in the presence of a catalyst composed of at least one metal selected from the group consisting of Pt, Pd, Cu, Au and Ni.Type: GrantFiled: September 16, 1988Date of Patent: October 8, 1991Assignee: National Research Institute For MetalsInventors: Isao Nakatani, Kiyoshi Ozawa