Patents by Inventor Isao Nakatani

Isao Nakatani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9017578
    Abstract: The problems can be solved by using a method for producing a metal nanoparticle colloid, which comprises the steps of S1: mixing, into a nonpolar hydrocarbon oil having a vapor pressure of 10?3 Torr or less at room temperature, organic molecules having both a hydrophilic group and a lipophilic group and having in the end of the hydrophilic group an N, S, P, or O atom or having at the hydrophilic group a functional group of an NH2 group, an NH group, an SH group, a PO group, or an OH group to prepare a base liquid, and S2: placing the base liquid in a rotatable vacuum drum and charging a non-magnetic metal material in a crucible provided in the vacuum drum, and depositing the vapor of the non-magnetic metal material on the base liquid which adheres to the inner wall of the vacuum drum and rotates together with the rotating drum under conditions such that the inside of the vacuum drum is under a reduced pressure and the vacuum drum is rotated, and a task of the present invention is to provide a method for produ
    Type: Grant
    Filed: May 31, 2011
    Date of Patent: April 28, 2015
    Assignee: National Institute For Materials Science
    Inventor: Isao Nakatani
  • Publication number: 20130265735
    Abstract: Disclosed is a metal nanoparticle paste that uses the low-temperature sintering characteristics of metal nanoparticles to easily obtain a metal bond with excellent conductivity and mechanical strength, and which can form a wiring pattern with excellent conductivity. The metal nanoparticle paste is characterized by containing (A) metal nanoparticles, (B) a protective film that coats the surface of the metal nanoparticles, (C) a carboxylic acid, and (D) a dispersion medium.
    Type: Application
    Filed: June 2, 2011
    Publication date: October 10, 2013
    Inventors: Isao Nakatani, Masato Hirose, Keita Harashima, Satoru Kurita, Tatsuya Kiyota
  • Patent number: 8524094
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Grant
    Filed: July 16, 2008
    Date of Patent: September 3, 2013
    Assignees: National Institute for Materials Science, Japan Science and Technology Corporation, Anelva Corporation
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Publication number: 20130126798
    Abstract: The problems can be solved by using a method for producing a metal nanoparticle colloid, which comprises the steps of S1: mixing, into a nonpolar hydrocarbon oil having a vapor pressure of 10?3 Torr or less at room temperature, organic molecules having both a hydrophilic group and a lipophilic group and having in the end of the hydrophilic group an N, S, P, or O atom or having at the hydrophilic group a functional group of an NH2 group, an NH group, an SH group, a PO group, or an OH group to prepare a base liquid, and S2: placing the base liquid in a rotatable vacuum drum and charging a non-magnetic metal material in a crucible provided in the vacuum drum, and depositing the vapor of the non-magnetic metal material on the base liquid which adheres to the inner wall of the vacuum drum and rotates together with the rotating drum under conditions such that the inside of the vacuum drum is under a reduced pressure and the vacuum drum is rotated, and a task of the present invention is to provide a method for produ
    Type: Application
    Filed: May 31, 2011
    Publication date: May 23, 2013
    Inventor: Isao Nakatani
  • Patent number: 8287617
    Abstract: A method for producing an alloy fine particle colloid by heating and evaporating a raw material binary alloy which is in a solid state in an ambient temperature and pressure environment in a reduced-pressure environment, cooling a generated vapor for condensation and solidification and collecting a formed alloy fine particle in a liquid medium, wherein (1) when an atomic fraction of a component element in the raw material alloy is defined as X, a component ratio of each of the elements of the raw material alloy is regulated such that a fraction of a vapor pressure of the component element to the total vapor pressure of the raw material alloy falls within the range of from (X?0.1) to (X+0.1); and (2) the raw material binary alloy is an alloy species which forms a homogeneous alloy phase in an alloy ingot. Thus, an alloy fine particle colloid is rationally and efficiently produced.
    Type: Grant
    Filed: April 25, 2007
    Date of Patent: October 16, 2012
    Assignee: National Institute for Materials Science
    Inventor: Isao Nakatani
  • Patent number: 7780876
    Abstract: A colloidal solution of fine particles of metal or alloy having an average grain size of 10 nm or more is provided which is heat treated to cause coloration, or a metal colloidal pigment having inherent color, a conductive paste material or a conductive ink for printed substrate electronic parts or the like based on a colloid prepared by dispersing fine metal particles at high concentration in a liquid is provided.
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: August 24, 2010
    Assignee: National Institute for Materials Science
    Inventor: Isao Nakatani
  • Publication number: 20090151512
    Abstract: A method for producing an alloy fine particle colloid by heating and evaporating a raw material binary alloy which is in a solid state in an ambient temperature and pressure environment in a reduced-pressure environment, cooling a generated vapor for condensation and solidification and collecting a formed alloy fine particle in a liquid medium, wherein (1) when an atomic fraction of a component element in the raw material alloy is defined as X, a component ratio of each of the elements of the raw material alloy is regulated such that a fraction of a vapor pressure of the component element to the total vapor pressure of the raw material alloy falls within the range of from (X?0.1) to (X+0.1); and (2) the raw material binary alloy is an alloy species which forms a homogeneous alloy phase in an alloy ingot. Thus, an alloy fine particle colloid is rationally and efficiently produced.
    Type: Application
    Filed: April 25, 2007
    Publication date: June 18, 2009
    Inventor: Isao Nakatani
  • Publication number: 20080277377
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Application
    Filed: July 16, 2008
    Publication date: November 13, 2008
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Publication number: 20080277629
    Abstract: A colloidal solution of fine particles of metal or alloy having an average grain size of 10 nm or more is provided which is heat treated to cause coloration, or a metal colloidal pigment having inherent color, a conductive paste material or a conductive ink for printed substrate electronic parts or the like based on a colloid prepared by dispersing fine metal particles at high concentration in a liquid is provided.
    Type: Application
    Filed: April 18, 2005
    Publication date: November 13, 2008
    Inventor: Isao Nakatani
  • Publication number: 20070119811
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Application
    Filed: November 20, 2006
    Publication date: May 31, 2007
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Patent number: 6878635
    Abstract: A metallic thin film of copper, silver, gold, or one alloy selected from alloys containing as a main component at least one of these metals is etched by plasma of an etching gas containing at least nitrogen oxide while being reacted with the plasma, whereby making it possible to fine-process electrically conductive materials, heat-transfer materials and electric-contact materials made of copper, silver, gold or an alloy containing as a main component at least one of these metals.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: April 12, 2005
    Assignees: National Institute for Materials Science, Japan Science and Technology Corporation
    Inventor: Isao Nakatani
  • Patent number: 6669807
    Abstract: An apparatus for reactive-ion etching including a reaction vessel and metallic parts disposed in the reaction vessel, the whole or a part of which includes at least one metallic material selected from the group consisting of titanium, aluminum, and an alloy including at least one of them as a main component.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: December 30, 2003
    Assignees: National Research Institute for Metals, Japan Science and Technology Corporation
    Inventor: Isao Nakatani
  • Publication number: 20020158546
    Abstract: A rotating body in which a number of electrons injected from one rotation surface is the same as a number of electrons ejected from another rotation surface, and in which a degree of spin polarization of electrons injected from one rotation surface is different from a degree of spin polarization of electrons ejected from another rotation surface is used as a rotor, thus making possible a micro motor with a small amount of loss and that has a simple structure.
    Type: Application
    Filed: January 10, 2002
    Publication date: October 31, 2002
    Inventor: Isao Nakatani
  • Publication number: 20020079054
    Abstract: The invention provides a method for reactive-ion etching a magnetic material with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, the method comprising a step, in which a multilayered film comprising a magnetic material thin film having thereon a resist film formed on a substrate is exposed to an electron beam and then developed, to form a pattern on the resist film, a step, in which a mask material is vacuum deposited, a step, in which the resist is dissolved, to form a mask, and a step, in which a part of the magnetic material thin film that is not covered with the mask is removed by reactive ion etching with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, to form a pattern on the magnetic material thin film, and thus obtaining the magnetic material thin film finely worked.
    Type: Application
    Filed: January 31, 2002
    Publication date: June 27, 2002
    Inventor: Isao Nakatani
  • Patent number: 6391216
    Abstract: The invention provides a method for reactive-ion etching a magnetic material with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, the method comprising a step, in which a multilayered film comprising a magnetic material thin film having thereon a resist film formed on a substrate is exposed to an electron beam and then developed, to form a pattern on the resist film, a step, in which a mask material is vacuum deposited, a step, in which the resist is dissolved, to form a mask, and a step, in which a part of the magnetic material thin film that is not covered with the mask is removed by reactive ion etching with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, to form a pattern on the magnetic material thin film, and thus obtaining the magnetic material thin film finely worked.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: May 21, 2002
    Assignees: National Research Institute for Metals, Japan Science and Technology Corporation
    Inventor: Isao Nakatani
  • Publication number: 20020038681
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Application
    Filed: July 24, 2001
    Publication date: April 4, 2002
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Patent number: 5476063
    Abstract: A seed crystal is connected with a polycrystal at one end of the polycrystal, the connected crystal material is melted under a zero-gravity or microgravity environment without any container, and a single crystal is grown.
    Type: Grant
    Filed: August 4, 1994
    Date of Patent: December 19, 1995
    Assignees: National Research Institute for Metals, National Space Development Agency of Japan
    Inventors: Isao Nakatani, Satoshi Takahashi, Isao Nishida, Kiyoshi Ozawa
  • Patent number: 5180512
    Abstract: A method of manufacturing a fine-particle colloid or a magnetic fluid of a metal nitride through reaction between a metal carbonyl and a nitride-bearing compound, a two-step reaction is performed, comprising a first-step reaction of synthesizing a nitrogen-bearing metal carbonyl which is a precursor substance and a second-step reaction of synthesizing metal nitride from said precursor substance. A step of eliminating unreacted metal carbonyl is provided between the two-step reaction. By repeatedly causing the series of reactions, a fine-particle colloid or a magnetic fluid of the metal nitride is manufactured. For the magnetic fluid, the solvent may be replaced in response to a particular purpose of use of application after production.
    Type: Grant
    Filed: April 12, 1991
    Date of Patent: January 19, 1993
    Assignee: National Research Institute for Metals
    Inventors: Isao Nakatani, Kiyosho Ozawa, Masayuki Hijikata, Tsutomu Takahashi
  • Patent number: 5137652
    Abstract: A compound containing nitrogen is introduced into a solvent in which a metal carbonyl and a surface active agent are dissolved, and the solution is heated to generate a particle colloid or a magnetic fluid of a metal nitride. A particle colloid of a metal nitride with an even grain size, a good dispersibilitgy and a good fluidity, and a magnetic fluid thereof with an excellent properties are obtained with convenience and at high efficiency.
    Type: Grant
    Filed: December 18, 1990
    Date of Patent: August 11, 1992
    Assignee: National Research Institute For Metals
    Inventors: Isao Nakatani, Masayuki Hijikata, Tsutomu Takahashi, Kiyoshi Ozawa, Takao Furubayashi, Hiroaki Hanaoka
  • Patent number: 5055280
    Abstract: A process for producing fibers of a transition metal boride, which comprises reacting a mixture of a vapor of an evaporable boron compound an a vapor of an evaporable transition metal compound in the presence of a catalyst composed of at least one metal selected from the group consisting of Pt, Pd, Cu, Au and Ni.
    Type: Grant
    Filed: September 16, 1988
    Date of Patent: October 8, 1991
    Assignee: National Research Institute For Metals
    Inventors: Isao Nakatani, Kiyoshi Ozawa