Patents by Inventor Isao Tanikawa
Isao Tanikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8597479Abstract: A magnetron sputtering system generates a high density plasma on a target by applying magnetic fields intersecting an electric field by using a plurality of magnets that are rotatably supported. The respective magnets are revolved and rotated so that the time variation of regions where a magnetic field (line of magnetic force) generated by the each magnet is orthogonal to an electric field is prevented from becoming monotonous. Further, the respective magnets are arranged to make the distances between the center of rotation and the center of revolution of the respective magnets different from each other, so that the regions where the magnetic field (line of magnetic force) generated by the each magnet is orthogonal to the electric field are dispersed in the radial direction of a target.Type: GrantFiled: February 8, 2005Date of Patent: December 3, 2013Assignee: Tohoku Seiki Industries, Ltd.Inventors: Keitaro Harada, Masayoshi Yokoo, Norikazu Kainuma, Yoshinobu Takano, Isao Tanikawa
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Patent number: 8591706Abstract: A sputtering system for depositing a thin film on the surface of a disc substrate in which high precision positioning of an inner mask and an outer mask is facilitated. The sputtering system has a mask member placed on the surface of the substrate mounted on a substrate holder to cover a partial region on the surface of the substrate. A thin film is deposited by sputtering in a region on the surface of the substrate not covered by the mask member. A section for carrying in and carrying out the substrate has mechanically holds and releases the substrate holder mounting the substrate, and mechanically holds and releases the mask member.Type: GrantFiled: March 28, 2006Date of Patent: November 26, 2013Assignee: Tohoku Seiki Industries, Ltd.Inventors: Masayoshi Yokoo, Isao Tanikawa, Norikazu Kainuma, Yoshinobu Takano
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Patent number: 7827850Abstract: This invention provides a chromatographic apparatus comprising an introduction part for a carrier gas as a main mobile phase medium, a sample injection part, a separation column comprising a stationary phase formed by coating a polymeric material, a part for housing the separation column, and a detector. The sample injection part is provided between the carrier gas introduction part and the inlet of the separation column. The chromatographic apparatus further comprises a solvent introduction means for adding a liquid solvent as a second mobile phase medium to a carrier gas and mixing them together, a mechanism for regulating the amount of the carrier gas introduced and the amount of the solvent added, and a mechanism for regulating the temperature of each flow passage. A plurality of clogging liquid stoppers, of which the liquid film thickness is equal to the inner diameter of a capillary column, are partly provided at predetermined intervals within the column in a longitudinal direction of the column.Type: GrantFiled: March 31, 2006Date of Patent: November 9, 2010Assignee: Tokyo Seikan Kaisha, Ltd.Inventor: Isao Tanikawa
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Publication number: 20100006422Abstract: A sputtering system for depositing a thin film on the surface of a disc substrate in which high precision positioning of an inner mask and an outer mask is facilitated. The sputtering system has a mask member placed on the surface of the substrate mounted on a substrate holder to cover a partial region on the surface of the substrate. A thin film is deposited by sputtering in a region on the surface of the substrate not covered by the mask member. A section for carrying in and carrying out the substrate has mechanically holds and releases the substrate holder mounting the substrate, and mechanically holds and releases the mask member.Type: ApplicationFiled: March 28, 2006Publication date: January 14, 2010Inventors: Masayoshi Yokoo, Isao Tanikawa, Norikazu Kainuma, Yoshinobu Takano
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Publication number: 20090249860Abstract: This invention provides a chromatographic apparatus comprising an introduction part for a carrier gas as a main mobile phase medium, a sample injection part, a separation column comprising a stationary phase formed by coating a polymeric material, a part for housing the separation column, and a detector. The sample injection part is provided between the carrier gas introduction part and the inlet of the separation column. The chromatographic apparatus further comprises a solvent introduction means for adding a liquid solvent as a second mobile phase medium to a carrier gas and mixing them together, a mechanism for regulating the amount of the carrier gas introduced and the amount of the solvent added, and a mechanism for regulating the temperature of each flow passage. A plurality of clogging liquid stoppers, of which the liquid film thickness is equal to the inner diameter of a capillary column, are partly provided at predetermined intervals within the column in a longitudinal direction of the column.Type: ApplicationFiled: March 31, 2006Publication date: October 8, 2009Applicant: Toyo Seikan Kaisha, Ltd.Inventor: Isao Tanikawa
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Publication number: 20090026073Abstract: A plurality of magnets are rotatably supported and when a ratio between revolution angle and rotation angle per unit time is set to 1:R, R is set to a value which is not less than 1 and not more than 5, and is not a common divisor of 360, so that the time variation of regions where a magnetic field (line of magnetic force) generated by the each magnet is orthogonal to an electric field is prevented from becoming monotonous. Further, the respective magnets are arranged to make the distances between the center of rotation and the center of revolution of the respective magnets different from each other, so that the regions where the magnetic field (line of magnetic force) generated by the each magnet is orthogonal to the electric field are dispersed in the radial direction of a target.Type: ApplicationFiled: February 8, 2005Publication date: January 29, 2009Inventors: Keitaro Harada, Masayoshi Yokoo, Norikazu Kainuma, Yoshinobu Takano, Isao Tanikawa
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Patent number: 6802926Abstract: A method of producing a semiconductor thin film is provided. While a semiconductor thin film formed on a substrate is supported on a curved surface of a support member having the curved surface, the support member is rotated, thereby peeling the semiconductor thin film away from the substrate. Also provided is a method of producing a semiconductor thin film having the step of peeling a semiconductor thin film formed on a substrate away from the substrate, wherein the peeling step is carried out after the substrate is secured on a substrate support member without an adhesive. According to these methods, it is possible to peel the semiconductor thin film away from the substrate without damage and to hold the substrate without contamination.Type: GrantFiled: March 21, 2001Date of Patent: October 12, 2004Assignee: Canon Kabushiki KaishaInventors: Masaki Mizutani, Isao Tanikawa, Katsumi Nakagawa, Tatsumi Shoji, Noritaka Ukiyo, Yukiko Iwasaki
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Publication number: 20010018949Abstract: Provided is a method of producing a semiconductor thin film wherein while a semiconductor thin film formed on a substrate is supported on a curved surface of a support member having the curved surface, the support member is rotated, thereby peeling the semiconductor thin film away from the substrate. Also provided is a method of producing a semiconductor thin film having the step of peeling a semiconductor thin film formed on a substrate away from the substrate, wherein the peeling step is carried out after the substrate is secured on a substrate support member without an adhesive. These provide the method of peeling the semiconductor thin film away from the substrate without damage and the method of holding the substrate without contamination.Type: ApplicationFiled: March 21, 2001Publication date: September 6, 2001Inventors: Masaki Mizutani, Isao Tanikawa, Katsumi Nakagawa, Tatsumi Shoji, Noritaka Ukiyo, Yukiko Iwasaki
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Patent number: 6258666Abstract: Provided is a method of producing a semiconductor thin film wherein while a semiconductor thin film formed on a substrate is supported on a curved surface of a support member having the curved surface, the support member is rotated, thereby peeling the semiconductor thin film away from the substrate. Also provided is a method of producing a semiconductor thin film having the step of peeling a semiconductor thin film formed on a substrate away from the substrate, wherein the peeling step is carried out after the substrate is secured on a substrate support member without an adhesive. These provide the method of peeling the semiconductor thin film away from the substrate without damage and the method of holding the substrate without contamination.Type: GrantFiled: June 15, 1999Date of Patent: July 10, 2001Assignee: Canon Kabushiki KaishaInventors: Masaki Mizutani, Isao Tanikawa, Katsumi Nakagawa, Tatsumi Shoji, Noritaka Ukiyo, Yukiko Iwasaki
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Patent number: 6231667Abstract: A liquid phase growth apparatus of a dipping system has a plurality of liquid phase growth chambers and liquid phase growth operations of semiconductors are carried out on a plurality of substrates in the growth chambers. Another liquid phase growth apparatus of the dipping system has a liquid phase growth chamber and an annealing chamber, and is constructed in such structure that liquid phase growth of a semiconductor on one substrate is carried out in the liquid phase growth chamber and that an annealing operation of another substrate different from the aforementioned substrate is carried out in the annealing chamber. Another liquid phase growth apparatus of the dipping system has a liquid phase growth chamber and an annealing chamber, and is constructed in such structure that a semiconductor material is dissolved into a solvent in the liquid phase growth chamber and that the annealing operation of a substrate is carried out in the annealing chamber.Type: GrantFiled: November 27, 1998Date of Patent: May 15, 2001Assignee: Canon Kabushiki KaishaInventors: Masaaki Iwane, Isao Tanikawa, Katsumi Nakagawa, Tatsumi Shoji, Shoji Nishida, Noritaka Ukiyo
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Patent number: 6133614Abstract: A method for manufacturing a semiconductor apparatus for detecting radiation provided with phosphor comprises the steps of forming a phosphor layer integrally with a meshed partition plate having partitions per pixel of the semiconductor apparatus for detecting radiation, and of separating the phosphor per pixel by removing the phosphor on the partitioning portion of the partition plate by the irradiation of laser beam in the form of grooves together with the surface layer of the partitioning portions in order to make the phosphor thick to obtain a higher sensitivity, and also to make pixel pitches finer to enhance resolution, thus obtaining exact images without creating any cross talks between pixels.Type: GrantFiled: August 27, 1996Date of Patent: October 17, 2000Assignee: Canon Kabushiki KaishaInventors: Tatsumi Shoji, Keiichi Kawasaki, Isao Tanikawa, Kazuaki Tashiro, Ichiro Tanaka, Tatsuya Yamazaki
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Patent number: 4992636Abstract: A container body is sealed by means of a lid made of a flexible sheet having an insulative property and an antenna made of an electrically conductive material which is laminated upon the lid. According to this construction, when the container body is exposed to microwaves within a microwave oven, microwave energy is concentrated at a position near the front end of the antenna and the microwave energy is converted into heat energy, whereby the lid is opened by means of the thus converted heat. The lid can thus be precisely partially melted so as to form an opening of a predeterminedly suitable size.Type: GrantFiled: June 5, 1989Date of Patent: February 12, 1991Assignee: Toyo Seikan Kaisha Ltd.Inventors: Tsunehisa Namiki, Ikuo Sugiyama, Tamio Fujiwara, Kazuhisa Ishibashi, Isao Tanikawa, Muneki Yamada, Kyuichi Shibasaki
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Patent number: 4904509Abstract: An injection-molded body comprising a layer of an olefin/vinyl alcohol copolymer having a very high molecular weight is obtained by melt-kneading a composition comprising (i) a high-molecular-weight olefin/vinyl alcohol copolymer having a melt flow rate of 0.4 to 6.0 g/10 min as determined at 190.degree. C. and a vinyl alcohol content of 40 to 80 mole % and (ii) a low-molecular-weight olefin/vinyl alcohol copolymer having a melt flow rate of 3.0 to 60 g/10 min as determined at 190.degree. C., which is higher by at least 0.5 g/10 min than that of the high-molecular-weight ethylene/vinyl alcohol copolymer (i), and a vinyl alcohol content of 45 to 85 mole % at a weight ratio of from 98/2 to 40/60, and injecting the melt-kneaded composition into a mold through an orifice.Type: GrantFiled: November 9, 1988Date of Patent: February 27, 1990Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Shigezo Nohara, Sadao Hirata, Junichi Matsuo, Masami Hirano, Isao Tanikawa
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Patent number: 4798697Abstract: An injection-molded body comprising a layer of an olefin/vinyl alcohol copolymer having a very high molecular weight is obtained by melt-kneading a composition comprising (i) a high-molecular-weight olefin/vinyl alcohol copolymer having a melt flow rate of 0.4 to 6.0 g/10 min as determined at 190.degree. C. and a vinyl alcohol content of 40 to 80 mole % and (ii) a low-molecular-weight olefin/vinyl alcohol copolymer having a melt flow rate of 3.0 to 60 g/10 min as determined at 190.degree. C., which is higher by at least 0.5 g/10 min than that of the high-molecular-weight ethylene/vinyl alcohol copolymer (i), and a vinyl alcohol content of 45 to 85 mole % at a weight ratio of from 98/2 to 40/60, and injecting the melt-kneaded composition into a mold through an orifice.Type: GrantFiled: March 31, 1987Date of Patent: January 17, 1989Assignee: Toyo Seikan KaishaInventors: Shigezo Nohara, Sadao Hirata, Junichi Matsuo, Masami Hirano, Isao Tanikawa
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Patent number: 4714580Abstract: Disclosed is a coated oriented plastic vessel formed by subjecting a parison, preform or sheet comprising a molecularly orientable thermoplastic resin substrate and a coating layer of a vinylidene chloride copolymer formed on at least one surface of said substrate to a draw-molding operation such as biaxial draw-blow-molding or draw-forming, wherein the coating layer of the vinylidene chloride copolymer has such a molecular orientation tht the sum of two-dimensional orientation coefficients (l+m) in the axial direction and circumferential direction is at least 0.03 as measured according to the polarized light fluorometry and the coating layer is not substantially peeled at the low-temperature burst test conducted at -5.degree. C.Type: GrantFiled: May 23, 1983Date of Patent: December 22, 1987Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Yoshitsugu Maruhashi, Isao Tanikawa, Sadao Hirata
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Patent number: 4699809Abstract: Disclosed is a process for the preparation of a coated oriented plastic container, which comprises coating an aqueous latex or organic solvent solution of a vinylidene chloride copolymer on at least one surface of a parison, preform or sheet for formation of container which is formed by hot molding of a molecularly orientable thermoplastic resin, drying the coated parison, preform or sheet to form a coating layer, and subjecting the formed coated structure to draw molding such as biaxial draw blow molding or draw forming, wherein the coating layer of the vinylidene chloride copolymer is crystallized at the step of forming the coating layer or the draw molding step.In the coated oriented plastic container prepared according to this process, the adhesion of the coating layer of the vinylidene chloride copolymer to the plastic container substrate is highly improved, and even under severe conditions, peeling of the coating layer is prevented.Type: GrantFiled: January 15, 1986Date of Patent: October 13, 1987Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Yoshitsugu Maruhashi, Isao Tanikawa, Sadao Hirata
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Patent number: 4486378Abstract: A plastic bottle has as a wall-forming component a layer of a copolymer consisting essentially of 99 to 70% by weight of vinylidene cloride and 1 to 40% by weight of at least one acrylic or methacrylic monomer and further including up to 100 parts by weight of at least one member selected from other ethylenically unsaturated monomers per 100 parts by weight of the total amount of the first two monomers, the copolymer having an oxygen permeability constant of less than 9.times.10.sup.-14 cc.multidot.cm/cm.sup.2 .multidot.sec.multidot.cmHg as measured at a temperature of 20.degree. C. and a relative humidity of 100% and a water vapor permeability constant of less than 3.times.10.sup.-3 g.multidot.cm/m.sup.2 .multidot.day as determined according to the method of JIS Z-0208.This plastic bottle is obtained by casting an aqueous latex or the like of the above-mentioned copolymer in a bottle mold and drying the cast latex. This aqueous latex may be formed as a coating layer on a preformed plastic bottle.Type: GrantFiled: April 12, 1984Date of Patent: December 4, 1984Assignee: Toyo Seikan Kaisha Ltd.Inventors: Sadao Hirata, Isao Tanikawa, Yoshitsugu Maruhashi
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Patent number: 4478889Abstract: Disclosed is a process for the preparation of a coated plastic container, which comprises coating an aqueous latex or organic solvent solution of a vinylidene chloride copolymer on at least one surface of a plastic container formed by hot molding of a thermoplastic resin, drying the coating and crystallizing the coating simultaneously with or subsequently to the drying step.In the coated plastic container prepared according to this process, the adhesion of the coating layer of the vinylidene chloride copolymer to the plastic container substrate is highly improved, and even under severe conditions, peeling of the coating layer is prevented. Moreover, the gas barrier property, strength and chemical resistance of the container are prominently improved.Type: GrantFiled: November 3, 1982Date of Patent: October 23, 1984Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Yoshitsugu Maruhashi, Isao Tanikawa, Sadao Hirata
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Patent number: 4463116Abstract: Disclosed is a vessel closure provided with an easily openable liner, said liner being composed of an olefin resin or olefin resin composition comprising as a lubricant two different lubricants having different functional characteristics whereby the quantity of the lubricant immigrating to the surface of the liner is effectively controlled within a certain range at temperatures of a broad range and the opening torque of the closure is controlled at a low level at storage temperatures of a broad range.Type: GrantFiled: November 4, 1982Date of Patent: July 31, 1984Assignee: Toyo Seikan Kaisha, Ltd.Inventors: Masayasu Koyama, Takashi Yazaki, Isao Tanikawa
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Patent number: 4393106Abstract: Disclosed is a laminated plastic container in the form of a bottle, the wall of which comprises a substrate formed of a melt-moldable plastic material, a coating layer formed on at least one surface of the substrate, said coating layer being composed of a copolymer consisting essentially of 99 to 70% by weight of vinylidene chloride and 1 to 30% by weight of at least one acrylic or methacrylic monomer and further including up to 100 parts by weight of at least one member selected from other ethylenically unsaturated monomers per 100 parts by weight of the total amount of said two monomers, said copolymer having an oxygen permeation coefficient of less than 9.times.10.sup.-14 cc.multidot.cm/cm.sup.2 .multidot.sec.multidot.cmHg as measured at a temperature of 20.degree. C. and a relative humidity of 100% and a water vapor permeability coefficient of less than 3.times.10.sup.-3 g.multidot.cm/m.sup.2 .multidot.Type: GrantFiled: October 28, 1981Date of Patent: July 12, 1983Assignee: Toyo Seikan Kaisha Ltd.Inventors: Yoshitsugu Maruhashi, Isao Tanikawa, Sadao Hirata, Jinichi Yazaki, Kozaburo Sakano