Patents by Inventor Isao Tsuruma
Isao Tsuruma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7708914Abstract: The steps of producing a micro lens comprises the steps of forming a resin layer on a substrate in a desired pattern, causing the resin layer to absorb from its surroundings solvent which dissolves the resin so that the resin layer has fluidity and the surface of the resin layer becomes convex under the surface tension, and then drying the solvent.Type: GrantFiled: February 28, 2005Date of Patent: May 4, 2010Assignee: FUJIFILM CorporationInventor: Isao Tsuruma
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Patent number: 7477452Abstract: A micro lens array includes a plurality of convex micro lenses formed on a transparent substrate in an array. The micro lenses are convex toward a surface of the substrate in a position inward of the surface of the substrate and the top of the convex surface of the micro lenses is lower than the surface of the substrate.Type: GrantFiled: August 30, 2005Date of Patent: January 13, 2009Assignee: Fujifilm CorporationInventor: Isao Tsuruma
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Patent number: 7336880Abstract: A wavelength converting element is provided in which a fundamental wave with respect to an optical crystal substrate and a peak of a vertical transverse mode of a second harmonic are made to coincide, the converting efficiency is good, and a beam shape which enables good joining to a lens or an optical fiber is obtained. Given that an angle formed by a surface of the optical crystal substrate and a C axis of the optical crystal substrate is ?, a period at which inverted domains are formed is p, and a distance from a distal end of a comb-shaped electrode for forming the inverted domain to a central position of a waveguide is G, in the ion implantation, a concentration peak of the ion implantation is formed at a distance of substantially (G·tan ?+p/4) from the surface of the optical crystal substrate.Type: GrantFiled: June 2, 2005Date of Patent: February 26, 2008Assignee: FUJIFILM CorporationInventor: Isao Tsuruma
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Publication number: 20070146434Abstract: The liquid ejection head ejects a solution, in which charged particles are dispersed, toward a counter electrode. The head has a head substrate, a solution guide member formed on a surface of the head substrate so as to protrude and include a sharp-pointed portion having a sharply pointed tip end, with the sharp-pointed portion being which is formed by inclined surfaces and having a cross section that is reduced as a distance to the tip end is decreased, and a solution supply path having a solution outflow opening through which the solution flows out to the neighborhood of the sharp-pointed portion so as to form a solution flow around the inclined surfaces. The solution flow is formed around the tip end of the sharp-pointed portion in a direction going across the inclined surface and a part of the solution flow is guided to the tip end and is ejected as a droplet by means of an electrostatic force.Type: ApplicationFiled: March 7, 2007Publication date: June 28, 2007Inventors: Toshiaki FUKUNAGA, Isao Tsuruma
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Patent number: 7205097Abstract: The liquid ejection head ejects a solution, in which charged particles are dispersed, toward a counter electrode. The head has a head substrate, a solution guide member formed on a surface of the head substrate so as to protrude and include a sharp-pointed portion having a sharply pointed tip end, with the sharp-pointed portion being which is formed by inclined surfaces and having a cross section that is reduced as a distance to the tip end is decreased, and a solution supply path having a solution outflow opening through which the solution flows out to the neighborhood of the sharp-pointed portion so as to form a solution flow around the inclined surfaces. The solution flow is formed around the tip end of the sharp-pointed portion in a direction going across the inclined surface and a part of the solution flow is guided to the tip end and is ejected as a droplet by means of an electrostatic force.Type: GrantFiled: May 10, 2004Date of Patent: April 17, 2007Assignee: FujiFilm CorporationInventors: Toshiaki Fukunaga, Isao Tsuruma
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Patent number: 7192122Abstract: A liquid ejecting head of the invention has ink ejected with the electrostatic force, with a structure having a partition wall separating the flow channel into an inflow region and an outflow region. The wall passing by the positions of the ejecting orifices runs in a serpentine path to traverse the ink flow space in a direction perpendicular to the direction of the ink flow. The partition wall is produced by, first, applying a specified film thickness of photoresist on a substrate, second pressing a molding substrate onto a surface of the applied film of the photoresist to form a ridge-like projections which is to be a projecting solution guides, third forming the wall by etching the patterned photoresist film using a mask having a pattern of lines.Type: GrantFiled: September 28, 2004Date of Patent: March 20, 2007Assignee: Fuji Photo Film Co., Ltd.Inventor: Isao Tsuruma
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Publication number: 20060056034Abstract: A micro lens array includes a plurality of convex micro lenses formed on a transparent substrate in an array. The micro lenses are convex toward a surface of the substrate in a position inward of the surface of the substrate and the top of the convex surface of the micro lenses is lower than the surface of the substrate.Type: ApplicationFiled: August 30, 2005Publication date: March 16, 2006Inventor: Isao Tsuruma
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Publication number: 20050266321Abstract: A mask for exposure 1 having an aperture in a prescribed pattern formed on one surface and subjected to proximity field exposure in a state kept in contact with the surface of a wafer 2. The mask 1 is made of a transparent material such as glass or quartz glass. The mask 1 forms a circular shape with a thickness of 1 mm or less, preferably 0.1-0.5 mm.Type: ApplicationFiled: June 6, 2005Publication date: December 1, 2005Inventors: Isao Tsuruma, Masayuki Naya, Atsushi Mukai
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Publication number: 20050227153Abstract: A mask for exposure 1 having an aperture in a prescribed pattern formed on one surface and subjected to proximity field exposure in a state kept in contact with the surface of a wafer 2. The mask 1 is made of a transparent material such as glass or quartz glass. The mask 1 forms a circular shape with a thickness of 1 mm or less, preferably 0.1-0.5 mm.Type: ApplicationFiled: June 6, 2005Publication date: October 13, 2005Inventors: Isao Tsuruma, Masayuki Naya, Atsushi Mukai
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Publication number: 20050225838Abstract: A wavelength converting element is provided in which a fundamental wave with respect to an optical crystal substrate and a peak of a vertical transverse mode of a second harmonic are made to coincide, the converting efficiency is good, and a beam shape which enables good joining to a lens or an optical fiber is obtained. Given that an angle formed by a surface of the optical crystal substrate and a C axis of the optical crystal substrate is ?, a period at which inverted domains are formed is p, and a distance from a distal end of a comb-shaped electrode for forming the inverted domain to a central position of a waveguide is G, in the ion implantation, a concentration peak of the ion implantation is formed at a distance of substantially (G·tan ?+p/4) from the surface of the optical crystal substrate.Type: ApplicationFiled: June 2, 2005Publication date: October 13, 2005Inventor: Isao Tsuruma
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Publication number: 20050191784Abstract: The steps of producing a micro lens comprises the steps of forming a resin layer on a substrate in a desired pattern, causing the resin layer to absorb from its surroundings solvent which dissolves the resin so that the resin layer has fluidity and the surface of the resin layer becomes convex under the surface tension, and then drying the solvent.Type: ApplicationFiled: February 28, 2005Publication date: September 1, 2005Inventor: Isao Tsuruma
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Patent number: 6919169Abstract: The present invention provides a method of producing a liquid ejection head having a solution guide member protruding on a head substrate. The solution guide member has a sharp-pointed portion protruding from a liquid surface of a flowing solution in which charged particles are dispersed. The solution guide member guides the solution to the sharp-pointed portion such that the solution is ejected from the sharp-pointed portion by an electrostatic force. The method comprises the steps of forming a photosensitive resin layer on the head substrate; molding a convex portion having the sharp-pointed portion on a surface of the formed photosensitive resin layer by pressing a mold member against the surface of the photosensitive resin layer; and exposing a region of the molded convex portion; and developing the exposed photosensitive resin layer to produce the solution guide member provided on the head substrate.Type: GrantFiled: April 23, 2004Date of Patent: July 19, 2005Assignee: Fuji Photo Film Co., Ltd.Inventor: Isao Tsuruma
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Patent number: 6917463Abstract: A wavelength converting element is provided in which a fundamental wave with respect to an optical crystal substrate and a peak of a vertical transverse mode of a second harmonic are made to coincide, the converting efficiency is good, and a beam shape which enables good joining to a lens or an optical fiber is obtained. Given that an angle formed by a surface of the optical crystal substrate and a C axis of the optical crystal substrate is ?, a period at which inverted domains are formed is p, and a distance from a distal end of a comb-shaped electrode for forming the inverted domain to a central position of a waveguide is G, in the ion implantation, a concentration peak of the ion implantation is formed at a distance of substantially (G·tan?+p/4) from the surface of the optical crystal substrate.Type: GrantFiled: October 23, 2001Date of Patent: July 12, 2005Assignee: Fuji Photo Film Co., Ltd.Inventor: Isao Tsuruma
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Publication number: 20050068372Abstract: A liquid ejecting head of the invention has ink ejected with the electrostatic force, with a structure having a partition wall separating the flow channel into an inflow region and an outflow region. The wall passing by the positions of the ejecting orifices runs in a serpentine path to traverse the ink flow space in a direction perpendicular to the direction of the ink flow. The partition wall is produced by, first, applying a specified film thickness of photoresist on a substrate, second pressing a molding substrate onto a surface of the applied film of the photoresist to form a ridge-like projections which is to be a projecting solution guides, third forming the wall by etching the patterned photoresist film using a mask having a pattern of lines.Type: ApplicationFiled: September 28, 2004Publication date: March 31, 2005Inventor: Isao Tsuruma
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Publication number: 20050024439Abstract: The liquid ejection head ejects a solution, in which charged particles are dispersed, toward a counter electrode. The head has a head substrate, a solution guide member formed on a surface of the head substrate so as to protrude and include a sharp-pointed portion having a sharply pointed tip end, with the sharp-pointed portion being which is formed by inclined surfaces and having a cross section that is reduced as a distance to the tip end is decreased, and a solution supply path having a solution outflow opening through which the solution flows out to the neighborhood of the sharp-pointed portion so as to form a solution flow around the inclined surfaces. The solution flow is formed around the tip end of the sharp-pointed portion in a direction going across the inclined surface and a part of the solution flow is guided to the tip end and is ejected as a droplet by means of an electrostatic force.Type: ApplicationFiled: May 10, 2004Publication date: February 3, 2005Inventors: Toshiaki Fukunaga, Isao Tsuruma
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Publication number: 20040212661Abstract: The present invention provides a method of producing a liquid ejection head having a solution guide member protruding on a head substrate. The solution guide member has a sharp-pointed portion protruding from a liquid surface of a flowing solution in which charged particles are dispersed. The solution guide member guides the solution to the sharp-pointed portion such that the solution is ejected from the sharp-pointed portion by an electrostatic force. The method comprises the steps of forming a photosensitive resin layer on the head substrate; molding a convex portion having the sharp-pointed portion on a surface of the formed photosensitive resin layer by pressing a mold member against the surface of the photosensitive resin layer; and exposing a region of the molded convex portion; and developing the exposed photosensitive resin layer to produce the solution guide member provided on the head substrate.Type: ApplicationFiled: April 23, 2004Publication date: October 28, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Isao Tsuruma
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Patent number: 6795234Abstract: A wavelength converting element having improved wavelength converting efficiency and having a beam shape which facilitates coupling to a fiber or the like, is manufactured at low cost. After a waveguide is formed by carrying out proton exchange at a lower substrate in which inverted domains are formed, an upper substrate is laminated to the lower substrate so as to oppose the waveguide. Thereafter, a heat treatment is carried out and protons diffuse into the upper substrate and the lower substrate such that the waveguide is made to be a waveguide whose refractive index distribution is symmetrical, and simultaneously, the upper substrate and the lower substrate are joined by the heat treatment.Type: GrantFiled: November 1, 2001Date of Patent: September 21, 2004Assignee: Fuji Photo Film Co., Ltd.Inventor: Isao Tsuruma
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Publication number: 20030103195Abstract: A mask for exposure 1 having an aperture in a prescribed pattern formed on one surface and subjected to proximity field exposure in a state kept in contact with the surface of a wafer 2. The mask 1 is made of a transparent material such as glass or quartz glass. The mask 1 forms a circular shape with a thickness of 1 mm or less, preferably 0.1-0.5 mm.Type: ApplicationFiled: November 18, 2002Publication date: June 5, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Isao Tsuruma, Masayuki Naya, Atsushi Mukai
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Publication number: 20020054425Abstract: A wavelength converting element is provided in which a fundamental wave with respect to an optical crystal substrate and a peak of a vertical transverse mode of a second harmonic are made to coincide, the converting efficiency is good, and a beam shape which enables good joining to a lens or an optical fiber is obtained. Given that an angle formed by a surface of the optical crystal substrate and a C axis of the optical crystal substrate is &thgr;, a period at which inverted domains are formed is p, and a distance from a distal end of a comb-shaped electrode for forming the inverted domain to a central position of a waveguide is G, in the ion implantation, a concentration peak of the ion implantation is formed at a distance of substantially (G·tan &thgr;+p/4) from the surface of the optical crystal substrate.Type: ApplicationFiled: October 23, 2001Publication date: May 9, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Isao Tsuruma
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Publication number: 20020051282Abstract: A wavelength converting element having improved wavelength converting efficiency and having a beam shape which facilitates coupling to a fiber or the like, is manufactured at low cost. After a waveguide is formed by carrying out proton exchange at a lower substrate in which inverted domains are formed, an upper substrate is laminated to the lower substrate so as to oppose the waveguide. Thereafter, a heat treatment is carried out and protons diffuse into the upper substrate and the lower substrate such that the waveguide is made to be a waveguide whose refractive index distribution is symmetrical, and simultaneously, the upper substrate and the lower substrate are joined by the heat treatment.Type: ApplicationFiled: November 1, 2001Publication date: May 2, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Isao Tsuruma