Patents by Inventor Isao Umemoto

Isao Umemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11978786
    Abstract: A bipolar transistor includes a collector layer, a base layer, and an emitter layer that are formed in this order on a compound semiconductor substrate. The emitter layer is disposed inside an edge of the base layer in plan view. A base electrode is disposed on partial regions of the emitter layer and the base layer so as to extend from an inside of the emitter layer to an outside of the base layer in plan view. An insulating film is disposed between the base electrode and a portion of the base layer, with the portion not overlapping the emitter layer. An alloy layer extends from the base electrode through the emitter layer in a thickness direction and reaches the base layer. The alloy layer contains at least one element constituting the base electrode and elements constituting the emitter layer and the base layer.
    Type: Grant
    Filed: October 6, 2021
    Date of Patent: May 7, 2024
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Isao Obu, Yasunari Umemoto, Masahiro Shibata, Shigeki Koya, Masao Kondo, Takayuki Tsutsui
  • Patent number: 11949003
    Abstract: A collector layer, a base layer, and an emitter layer that are disposed on a substrate form a bipolar transistor. An emitter electrode is in ohmic contact with the emitter layer. The emitter layer has a shape that is long in one direction in plan view. A difference in dimension with respect to a longitudinal direction of the emitter layer between the emitter layer and an ohmic contact interface at which the emitter layer and the emitter electrode are in ohmic contact with each other is larger than a difference in dimension with respect to a width direction of the emitter layer between the emitter layer and the ohmic contact interface.
    Type: Grant
    Filed: April 6, 2022
    Date of Patent: April 2, 2024
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Yasunari Umemoto, Isao Obu, Kaoru Ideno, Shigeki Koya
  • Patent number: 5980924
    Abstract: The invention relates to a skin cleansing sheet obtained by impregnating (c) a sheet with an aqueous composition containing (a) 1-50 wt. % of a nonionic surfactant having an HLB of 10-16 and (b) 1-30 wt. % of a polyhydric alcohol or glycol ether. The cleansing sheet has high detergency and detergent speed to smears of makeup and sebum, and low irritativeness to the skin, gives users a pleasant feeling upon use, and moreover has good handling property and stability.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: November 9, 1999
    Assignee: Kao Corporation
    Inventors: Ritsuko Yamazaki, Reiko Fukuda, Isao Umemoto, Manabu Kaneda, Yasuhiro Komori
  • Patent number: 5767059
    Abstract: The present invention provides a cleanser composition which is free from any thickener, contains surfactant(s) at such a concentration as not to irritate the skin or mucosa, can impart an appropriate consistency to the cleanser, exhibits excellent foaming, can be easily taken out from a container in use and gives a good feel in use.The cleanser composition comprises the following components (A), (B) and (C):(A) an alkali metal salt of a secondary amide-type N-acylamino acid represented by formula (1):R.sup.1 CONH(CH.sub.2).sub.n COOH (1)wherein R.sup.1 CO represents a linear acyl group having 10 to 16 carbon atoms; and n is a number of 1 or 2;(B) an alkali metal salt of a higher fatty acid; and(C) an amphoteric surfactant; and the mixing ratio by weight of (A+B)/C ranges from 2.5/1 to 1/2.
    Type: Grant
    Filed: August 27, 1996
    Date of Patent: June 16, 1998
    Assignee: Kao Corporation
    Inventors: Isao Umemoto, Yasushi Kajihara
  • Patent number: 4885109
    Abstract: A quick-drying pack-type face-cleansing composition comprises sebum-absorbing powder, water-repellant powder, a non-ionic surfactant having an HLB of 12-18, and water. The sebum-absorbing powder may preferably be powder of bentonite, kaolin, talc, organobentonite, sericite, mica, silica, silicates, zeolite, diatomaceous earth, barium sulfate, calcium carbonate, polyvinyl chloride, polypropylene, polymethyl methacrylate, a polymer of an acrylic acid derivative, nylon, or polystyrene.
    Type: Grant
    Filed: March 7, 1988
    Date of Patent: December 5, 1989
    Assignee: Kao Corporation
    Inventors: Isao Umemoto, Fumiyo Shimada, Yuichiro Mitsuno