Abstract: A soldering station with indicator lights to display system status is provided. The soldering station comprising a power supply and a control board coupled to the power supply. The control board is operable to adjust output of the power supply. The soldering station further comprises a card reader coupled to the control board. The card reader receives a control card from a user. The control card allows the user to change the settings of the soldering station. The soldering station also includes a plurality of indicator lights. The plurality if indicator lights illuminate in patterns that are indicative of the status of the soldering station.

Abstract: A soldering station with indicator lights to display system status is provided. The soldering station comprising a power supply and a control board coupled to the power supply. The control board is operable to adjust output of the power supply. The soldering station further comprises a card reader coupled to the control board. The card reader receives a control card from a user. The control card allows the user to change the settings of the soldering station. The soldering station also includes a plurality of indicator lights. The plurality if indicator lights illuminate in patterns that are indicative of the status of the soldering station.

Abstract: A resist composition comprising (A) an organic solvent; (B) at least two polymers with weight average molecular weights of 1,000-500,000, which have at least one type of acid labile group and are crosslinked within a molecule and/or between molecules with crosslinking groups having C--O--C linkages; and (C) a photoacid generator is sensitive to high-energy radiation, has excellent sensitivity, resolution, and plasma etching resistance, and provides resist patterns of outstanding thermal stability and reproducibility. Patterns obtained with this resist composition are less prone to overhanging and have excellent dimensional controllability. The resist composition is suitable as a micropatterning material for VLSI fabrication because it has a low absorption at the exposure wavelength of a KrF excimer laser, thus enabling the easy formation of a finely defined pattern having sidewalls perpendicular to the substrate.