Abstract: Provided is a hot isostatic pressing (HIP) device that improves the heat uniformity of a hot zone during a pressurization process of an object being processed. This HIP device (100) is provided with: an outer casing (4) having an open outer opening part (4H); an inner casing (5) having an open inn opening part (5H); a heat-insulating body (R) disposed between the outer casing (4) and the inner casing (5); a gas flow generation part (30); and a plurality of first gas conduits (12), A hot zone (P) in which a pressurization process is performed is formed inside the inner casing (5).

Abstract: Provided is a hot isostatic pressing (HIP) device that improves the heat uniformity of a hot zone during a pressurization process of an object being processed. This HIP device (100) is provided with: an outer casing (4) having an open outer opening part (4H); an inner casing (5) having an open inn opening part (5H); a heat-insulating body (R) disposed between the outer casing (4) and the inner casing (5); a gas flow generation part (30); and a plurality of first gas conduits (12), A hot zone (P) in which a pressurization process is performed is formed inside the inner casing (5).

Abstract: A hot isotropic pressure device including: a casing disposed inside a high-pressure container; a heating unit provided inside the casing and forms a hot zone around the treatment material, in which an isotropic pressure treatment is performed on the treatment material using a pressure medium gas. A cooling unit is provided to cool the hot zone by guiding the pressure medium gas, cooled while guided from the upper side toward the lower side at the outside of the casing, into the hot zone. The cooling unit includes a gas introducing unit which guides the pressure medium gas cooled at the outside of the casing from the lower portion of the high-pressure container to the upper portion of the hot zone without any intersection with the pressure medium gas inside the hot zone and introduces the pressure medium gas into the hot zone.

Abstract: A hot isotropic pressure device including: a casing disposed inside a high-pressure container; a heating unit provided inside the casing and forms a hot zone around the treatment material, in which an isotropic pressure treatment is performed on the treatment material using a pressure medium gas. A cooling unit is provided to cool the hot zone by guiding the pressure medium gas, cooled while guided from the upper side toward the lower side at the outside of the casing, into the hot zone. The cooling unit includes a gas introducing unit which guides the pressure medium gas cooled at the outside of the casing from the lower portion of the high-pressure container to the upper portion of the hot zone without any intersection with the pressure medium gas inside the hot zone and introduces the pressure medium gas into the hot zone.

Abstract: The present invention provides a method for processing a substrate in which crystal defects occurring according to ion implantation can be prevented from being integrated to form defects such as dislocation or large vacancies in the manufacture of a SIMOX substrate by implanting oxygen atom to a Si base by ion implantation and reacting it with Si to form a buried oxide film. The annealing after ion implantation is performed under a gas atmosphere pressurized to, for example, about 100 MPa. In the pressurized state, a structure having a smaller volume is thermodynamically more stable, and a behavior as increases crystal distortion is arrested in the annealing. Thus, crystal defects can be laid in uniformly dispersed state, vacancies can be also extinguished, and a Si base of good quality suitable for manufacture of ULSI in which defects such as dislocation are reduced can be provided.

Abstract: It is intended to provide a piston type gas compressor capable of replacing a seal ring of a piston with a new one while preventing incorporation of metallic particles into a processing gas. A gas suction port 9 and a gas discharge port 10 are formed in a flange 2 of a cylinder 3 in communication with a gas compressing space H. With a plug 7 removed from an internally threaded hole 6A, a free piston 5, together with a seal ring 4, can be inserted into and removed from the cylinder 3 through the internally threaded hole 6A.

Abstract: A heating pressure processing apparatus in which gas sealing property and safety can be ensured, and economic property can be improved in heating pressure processing of workpieces such as Si wafers sheet by sheet. A processing vessel 1 formed of vessel components 2, 3 is divided into at least two parts or more in the axial direction thereof and has a seal ring 9 provided in the divided parts of the vessel components 2, parts 3 in such a manner as to be replaceable. The vessel components 2, 3 have shaped parts forming a processing space 5 for a workpiece 4 when the divided parts are sealed through the seal ring 9, the vessel components 2, 3 also having cooling means 10 for the seal ring 9. A ram is provided 18 for pressing the vessel components 2, 3 in the axial direction of the vessel in order to ensure the sealing in the divided parts; and a gas introducing device 20 is provided for introducing a pressurized gas to the processing space 5 in order to process the workpiece.