Abstract: A member for a plasma etching device, comprising a coating film of yttrium oxide or YAG having a coating film thickness of 10 ?m or more, a coating film thickness variance of 15% or less, preferably a surface roughness (Ra) of 1 ?m or less, formed on a surface of a member, comprising quartz glass which contains 1 to 10% by weight of yttrium oxide or YAG. The member for a plasma etching device has high plasma resistance, is not subjected to an abnormal etching on the basis of a partial change of electric properties and, accordingly, can be used for a long period of time. Even when the member is large enough to handle 12-inch Si wafers, the above-described advantageous properties are maintained and the member can be used for a long period of time.

Abstract: A member for a plasma etching device, which comprises a device substrate comprising quartz glass, aluminum, alumite or a combination thereof and, formed on the surface thereof, a coating film of yttrium oxide or YAG having a film thickness of 10 ?m or more and a variation in the thickness of 10% or less, and preferably a surface roughness (Ra) of 1 ?m or less; and a method for manufacturing the member for a plasma etching device, which comprises a step of plasma-spraying yttrium oxide or YAG to the surface of said device substrate or a step of fusing yttrium oxide or YAG with an oxyhydrogen flame, followed by coating the surface with the fused product, or a step of applying a solution containing yttrium, a yttrium compound or YAG on the above surface, followed by heating to fuse the resultant coating, or a combination of the above steps, thereby forming a coating film of yttrium oxide or YAG having a film thickness 10 ?m or more and a variation in the thickness of 10% or less, and preferably a surface roughne

Abstract: To provide a technique with which a quartz glass jig and a doped quartz glass jig are regenerated by completely removing the impurities which are attached to the surface and the impurities which have diffused into the interior from quartz glass jigs which have been used in semiconductor production processes and then carrying out working repair and removing the contamination from the working processes as well. After use, the impurities are removed from the aforementioned quartz glass jigs in the said purification treatment process which includes a purification treatment process in which the quartz glass jigs are subjected to a purification treatment in a gaseous atmosphere which includes a halogen element at a temperature within the region above a prescribed temperature.

Abstract: A member for a plasma etching device, which comprises a device substrate comprising quartz glass, aluminum, alumite or a combination thereof and, formed on the surface thereof, a coating film of yttrium oxide or YAG having a film thickness of 10 ?m or more and a variation in the thickness of 10% or less, and preferably a surface roughness (Ra) of 1 ?m or less; and a method for manufacturing the member for a plasma etching device, which comprises a step of plasma-spraying yttrium oxide or YAG to the surface of said device substrate or a step of fusing yttrium oxide or YAG with an oxyhydrogen flame, followed by coating the surface with the fused product, or a step of applying a solution containing yttrium, a yttrium compound or YAG on the above surface, followed by heating to fuse the resultant coating, or a combination of the above steps, thereby forming a coating film of yttrium oxide or YAG having a film thickness 10 ?m or more and a variation in the thickness of 10% or less, and preferably a surface roughne

Abstract: In a vertical type wafer supporting jig, a ring-like support plate is fixed to support pillars by a simple structure without conventional welding and without risk of the ring-like support plate falling off. The vertical type wafer supporting jig is configured for mounting many wafers onto many support plates stacked in a vertical direction and fixed to support pillars with a predetermined wafer mounting interval between the support plates. Support groove portions into which the support plates are inserted and supported are formed in the support pillars with a predetermined interval in the vertical direction between them. A fixing rod is provided adjoining at least one of the support pillars.

Abstract: An object of the present invention is to provide a fluororesin-coated quartz glass jig free from peeling off of fluororesin coating on using hydrofluoric acid or from generating particles due to the etching of quartz glass, while yet preventing the generation of chipping by relaxing the impact imposed on the quartz glass by silicon wafers. It also is an object of the present invention to provide a production method of the fluororesin-coated quartz glass jig. The object above is achieved by a fluororesin-coated quartz glass jig the surface thereof is wholly covered with a pinhole-free fluororesin coating, and by a method for producing the same.

Abstract: An object of the present invention is to provide a quartz glass tank for use in ultrasonic cleaning that can be used for a long time without causing etching or layer peeling of the quartz glass and a method for producing the same.

Abstract: A vertical type wafer supporting jig is provided in which a ring-like support plate can be fixed to support pillars by a simple structure without conventional welding as a way of fixing and without risk of the ring-like support plate falling off, and in which repair can be rapidly made when needed. The vertical type wafer supporting jig is configured for mounting many wafers onto many support plates stacked and fixed in a vertical direction to plural support pillars with a predetermined wafer mounting interval being provided between them. Support groove parts for inserting and supporting the support plates are respectively formed in the vertical direction of the support pillars with a predetermined interval being provided between them. A fixing rod is provided adjoining at least one of the support pillars.

Abstract: An object of the present invention is to provide a fluororesin-coated quartz glass jig free from peeling off of fluororesin coating on using hydrofluoric acid or from generating particles due to the etching of quartz glass, while yet preventing the generation of chipping by relaxing the impact imposed on the quartz glass by silicon wafers. It also is an object of the present invention to provide a production method of the fluororesin-coated quartz glass jig. The object above is achieved by a fluororesin-coated quartz glass jig the surface thereof is wholly covered with a pinhole-free fluororesin coating, and by a method for producing the same.

Abstract: An article holding apparatus includes a pair of sliding plates selectively movable toward or away from each other while being maintained parallel to each other. A distance between the sliding plates is adjustable. Suction pads are provided on inner surfaces of the sliding plates respectively. The suction pads may include first suction pads for holding a large article and second suction pads for holding a small article. Sensor elements may be mounted on the plates to sense whether a large or a small article is present to be handled thereby.