Patents by Inventor Ittamar Levy

Ittamar Levy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Detection of an electric arc hazard related to a wafer
    Patent number: 11293993
    Abstract: A method, a non-transitory computer readable medium and a detection system for detecting an electric arc hazard related to a wafer. The detection system may include a measurement unit, an electrode and a processing unit. The measurement unit may be configured to provide a measurement result by measuring an electrical parameter of the electrode during a test period, while the wafer may be moved in relation to the electrode, and while a certain electrical field may be formed between the electrode and the wafer; wherein the certain electrical field induces detached ends of partially detached conductive elements of the wafer to move away from the wafer. The processing unit may be configured to determine an existence of the electric arc hazard based on the measurement result.
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: April 5, 2022
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Yosef Basson, Samuel Ives Nackash, Ittamar Levy
  • DETECTION OF AN ELECTRIC ARC HAZARD RELATED TO A WAFER
    Publication number: 20210063461
    Abstract: A method, a non-transitory computer readable medium and a detection system for detecting an electric arc hazard related to a wafer. The detection system may include a measurement unit, an electrode and a processing unit. The measurement unit may be configured to provide a measurement result by measuring an electrical parameter of the electrode during a test period, while the wafer may be moved in relation to the electrode, and while a certain electrical field may be formed between the electrode and the wafer; wherein the certain electrical field induces detached ends of partially detached conductive elements of the wafer to move away from the wafer. The processing unit may be configured to determine an existence of the electric arc hazard based on the measurement result.
    Type: Application
    Filed: September 4, 2019
    Publication date: March 4, 2021
    Applicant: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Yosef Basson, Samuel Ives Nackash, Ittamar Levy