Patents by Inventor Ivan A. Ocanada

Ivan A. Ocanada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for distribution of slurry in a chemical mechanical polishing system
    Patent number: 6051499
    Abstract: Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible members, sweeps the slurry evenly and thinly across the polishing pad. A control system coordinates the distribution of slurry to the polishing pad with the motion of the carrier head.
    Type: Grant
    Filed: December 2, 1997
    Date of Patent: April 18, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Robert D. Tolles, William L. Guthrie, Jeffrey Marks, Tsungnan Cheng, Semyon Spektor, Ivan A. Ocanada, Norm Shendon
  • Apparatus and method for distribution of slurry in a chemical mechanical polishing system
    Patent number: 5709593
    Abstract: Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible members, sweeps the slurry evenly and thinly across the polishing pad. A control system coordinates the distribution of slurry to the polishing pad with the motion of the carrier head.
    Type: Grant
    Filed: October 27, 1995
    Date of Patent: January 20, 1998
    Assignee: Applied Materials, Inc.
    Inventors: William L. Guthrie, Semyon Spektor, Ivan A. Ocanada, Norm Shendon