Patents by Inventor Ivan Huang

Ivan Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220415698
    Abstract: An apparatus for transferring light-emitting diodes (LEDs) includes a backing board for supporting a backplane, a sealing member formed on the backing board around a periphery of the backplane, a transparent panel formed on the sealing member such that a space is formed between the backing board and the transparent panel, and a vacuum source for drawing a vacuum on the space.
    Type: Application
    Filed: June 21, 2022
    Publication date: December 29, 2022
    Inventors: Ivan HUANG, Massimo MARTINELLI, Eric STRASILLA
  • Publication number: 20220223769
    Abstract: A light-emitting device includes a backplane, light-emitting diodes (LEDs) located over a front side of the backplane, and microlenses respectively disposed over the LEDs. Each microlens includes a back surface having a first surface area and configured to receive light emitted from a corresponding LED, an opposing front surface having a second surface area and configured to emit the received light, and at least one sidewall extending from the front surface to the back surface. The second surface area is greater than the first surface area.
    Type: Application
    Filed: December 15, 2021
    Publication date: July 14, 2022
    Inventors: Brian KIM, Ivan HUANG, Saket CHADDA
  • Patent number: 10325808
    Abstract: A method of forming a 3D crack-stop structure in, through, and wrapped around the edges of a substrate to prevent through-substrate cracks from propagating and breaking the substrate and the resulting device are provided. Embodiments include providing a substrate including one or more dies; forming a continuous first trench near an outer edge of the substrate; forming a continuous second trench parallel to and on an opposite side of the first trench from the outer edge; forming a continuous row of vias parallel to and on an opposite side of the second trench from the first trench, forming a continuous third trench parallel to and near an outer edge of each of the dies; forming a protective layer wrapping around the outer edge of the substrate and over and filling the trenches and vias; and patterning active areas of the substrate between the vias and the third trench.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: June 18, 2019
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Ivan Huang, Elavarasan Pannerselvam, Vijay Sukumaran
  • Publication number: 20180182671
    Abstract: A method of forming a 3D crack-stop structure in, through, and wrapped around the edges of a substrate to prevent through-substrate cracks from propagating and breaking the substrate and the resulting device are provided. Embodiments include providing a substrate including one or more dies; forming a continuous first trench near an outer edge of the substrate; forming a continuous second trench parallel to and on an opposite side of the first trench from the outer edge; forming a continuous row of vias parallel to and on an opposite side of the second trench from the first trench, forming a continuous third trench parallel to and near an outer edge of each of the dies; forming a protective layer wrapping around the outer edge of the substrate and over and filling the trenches and vias; and patterning active areas of the substrate between the vias and the third trench.
    Type: Application
    Filed: December 29, 2017
    Publication date: June 28, 2018
    Inventors: Ivan HUANG, Elavarasan PANNERSELVAM, Vijay SUKUMARAN
  • Patent number: 9892971
    Abstract: A method of forming a 3D crack-stop structure in, through, and wrapped around the edges of a substrate to prevent through-substrate cracks from propagating and breaking the substrate and the resulting device are provided. Embodiments include providing a substrate including one or more dies; forming a continuous first trench near an outer edge of the substrate; forming a continuous second trench parallel to and on an opposite side of the first trench from the outer edge; forming a continuous row of vias parallel to and on an opposite side of the second trench from the first trench, forming a continuous third trench parallel to and near an outer edge of each of the dies; forming a protective layer wrapping around the outer edge of the substrate and over and filling the trenches and vias; and patterning active areas of the substrate between the vias and the third trench.
    Type: Grant
    Filed: December 28, 2016
    Date of Patent: February 13, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Ivan Huang, Elavarasan Pannerselvam, Vijay Sukumaran
  • Publication number: 20130256681
    Abstract: A group III nitride-based high electron mobility transistor (HEMT) is disclosed. The group III nitride-based high electron mobility transistor (HEMT) comprises sequentially a substrate, a GaN buffer layer, a GaN channel layer, a AlN spacer layer, a barrier layer, a GaN cap layer, and a delta doped layer inserted between the AlN spacer layer and the barrier layer. The HEMT structure of the present invention can improve the electron mobility and concentration of the two-dimensional electron gas, while keeping a low contact resistance.
    Type: Application
    Filed: April 2, 2012
    Publication date: October 3, 2013
    Applicant: WIN Semiconductors Corp.
    Inventors: Winston WANG, Willie Huang, Ivan Huang