Patents by Inventor Ivan Nikitn

Ivan Nikitn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for processing a semiconductor wafer or die, and particle deposition device
    Patent number: 8338317
    Abstract: According to various embodiments, a method for processing a semiconductor wafer or die is provided including supplying particles to a plasma such that the particles are activated by the plasma and spraying the activated particles on the semiconductor wafer or die to generate a particle layer on the semiconductor wafer or die.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: December 25, 2012
    Assignee: Infineon Technologies AG
    Inventors: Manfred Engelhardt, Hans-Joerg Timme, Ivan Nikitn, Manfred Frank, Thomas Kunstmann, Werner Robl, Guenther Ruhl
  • METHOD FOR PROCESSING A SEMICONDUCTOR WAFER OR DIE, AND PARTICLE DEPOSITION DEVICE
    Publication number: 20120256323
    Abstract: According to various embodiments, a method for processing a semiconductor wafer or die is provided including supplying particles to a plasma such that the particles are activated by the plasma and spraying the activated particles on the semiconductor wafer or die to generate a particle layer on the semiconductor wafer or die.
    Type: Application
    Filed: April 6, 2011
    Publication date: October 11, 2012
    Applicant: INFINEON TECHNOLOGIES AG
    Inventors: Manfred Engelhardt, Hans-Joerg Timme, Ivan Nikitn, Manfred Frank, Thomas Kunstmann, Werner Robl, Guenther Ruhl