Abstract: The present disclosure relates to anti-fog coatings, coated substrate comprising an anti-fog coating and a process for preparing such coatings. Said process comprising exposing a surface to be coated in a plasma, said plasma produced by exposing a carrier gas comprising an oxidant (e.g. N2/O2, N2/N2O, or air) and a alkylcyclosiloxane (e.g. tetramethylcyclotetrasiloxane) under dielectric barrier discharge (DBD) in Townsend's mode at atmospheric pressure.