Patents by Inventor Iwao Mihara

Iwao Mihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing pad and production method thereof
    Patent number: 7922783
    Abstract: There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as ?-cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4?-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: April 12, 2011
    Assignee: JSR Corporation
    Inventors: Fujio Sakurai, Iwao Mihara, Yoshinori Igarashi, Kou Hasegawa
  • POLISHING PAD AND PRODUCTION METHOD THEREOF
    Publication number: 20080313967
    Abstract: There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as ?-cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4?-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix.
    Type: Application
    Filed: August 25, 2008
    Publication date: December 25, 2008
    Applicant: JSR CORPORATION
    Inventors: Fujio SAKURAI, Iwao Mihara, Yoshinori Igarashi, Kou Hasegawa
  • Polishing pad and production method thereof
    Publication number: 20040224622
    Abstract: There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as &bgr;-cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4′-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix.
    Type: Application
    Filed: April 13, 2004
    Publication date: November 11, 2004
    Applicant: JSR CORPORATION
    Inventors: Fujio Sakurai, Iwao Mihara, Yoshinori Igarashi, Kou Hasegawa