Patents by Inventor Iwao Sumiyoshi

Iwao Sumiyoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5863679
    Abstract: The present invention provides a method for forming a thin film pattern having an excellent accuracy of the pattern. The method comprises the steps of:(a) exposing a polysilane layer formed from a polysilane having a structure of the formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 indicate a group which is independently selected from the group consisting of a substituted or non-substituted aliphatic hydrocarbon residue, an alicyclic hydrocarbon residue and an aromatic hydrocarbon residue and m and n indicate an integer, provided on a substrate, to ultraviolet light selectively to form a latent image of the thin film pattern; and(b) dipping the polysilane layer in which the latent image of the thin film pattern is formed in a metal oxide sol and then drying.
    Type: Grant
    Filed: July 5, 1996
    Date of Patent: January 26, 1999
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Hiroshi Tsushima, Iwao Sumiyoshi, Masaaki Yokoyama
  • Patent number: 5858614
    Abstract: A photosensitive composition for volume hologram recording used for recording an interference fringe produced by the interference of laser beams or lights having excellent coherence as a fringe having a different refractive index, the composition comprising:(a) a radical polymerizable compound having a 9,9-diarylfluorene skeleton, which is liquid at a normal temperature;(b) a compound having compatibility with the component (a), which is selected from the group consisting of a cationic polymerizable compound, a radical polymerizable compound having no 9,9-diarylfluorene skeleton and a plasticizer; and(c) a radical photopolymerization initiator which is sensitive to laser beam having a specific wavelength or light having a specific wavelength and excellent coherence to polymerize the component (a);wherein an average refractive index of the component (a) is larger than that of the component (b).
    Type: Grant
    Filed: October 9, 1996
    Date of Patent: January 12, 1999
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Akihiko Sato, Masami Kawabata, Iwao Sumiyoshi
  • Patent number: 5776764
    Abstract: The present invention provides a photosensitive resin composition wherein a sensitiveness of polysilane to photodegradation is improved and a time required for photodegradation is short. The photosensitive resin composition comprises:(a) a polysilane having a structure of the formula: ##STR1## ?wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4, the same or different, are selected from the group consisting of a substituted or non-substituted aliphatic hydrocarbon group, an alicyclic hydrocarbon group and an aromatic hydrocarbon group, and m and n indicate an integer!,(b) a photoradical generator, and(c) an oxidizing agent. A method for forming a pattern using the photosensitive resin composition is also disclosed.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: July 7, 1998
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Emi Ueta, Hiroshi Tsushima, Iwao Sumiyoshi
  • Patent number: 5702846
    Abstract: The present invention provides a photosensitive composition for volume hologram recording, comprising the following components:(A) a cationic polymerizable compound and a radical polymerizable compound,(B) a cationic polymerization initiating material, and(C) a radical polymerization initiating material, as an essential component, wherein at least one of the cationic polymerizable compound and radical polymerizable compound of the component contains a siloxane group, and a difference in refractive index between the cationic polymerizable compound and radical polymerizable compound is not less than 0.01.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: December 30, 1997
    Assignee: Nippon Paint Co. Ltd.
    Inventors: Akihiko Sato, Kenzo Mizutani, Masami Kawabata, Iwao Sumiyoshi
  • Patent number: 5665494
    Abstract: Disclosed is a photosensitive composition for volume hologram recording which is used for recording an interference fringe produced by a laser beam or a light having excellent coherence, as fringes having different refractive index. The composition comprising:(a) a cationic polymerizable compound which is liquid at ambient temperature;(b) a radical polymerizable compound;(c) a radical photopolymerization initiator composition sensitized by a laser beam or a light having excellent coherence which has a specific wavelength to polymerize the ingredient (b); and(d) a cationic photopolymerization initiator composition which shows low photosensitivity to the light having a specific wavelength and is sensitized by a light having the other wavelength to polymerize the ingredient (a), wherein an average refractive index of the ingredient (a) is smaller than that of the ingredient (b). A process for producing the photosensitive composition is also disclosed.
    Type: Grant
    Filed: October 24, 1994
    Date of Patent: September 9, 1997
    Assignee: Nippon Paint Company, Ltd.
    Inventors: Masami Kawabata, Akihiko Sato, Iwao Sumiyoshi
  • Patent number: 5496903
    Abstract: The present invention provides the near infrared polymerizable composition which has high sensitivity sufficient to provide excellent curability to the coating composition containing the same, even if the coating composition contains the pigment as well. The present invention provides a near infrared polymerizable composition comprising a cyanine dye, a S-triazine compound, an organoboron salt and an ethylenically unsaturated compound.
    Type: Grant
    Filed: April 25, 1995
    Date of Patent: March 5, 1996
    Assignee: Nippon Paint Company, Ltd.
    Inventors: Emi Watanabe, Masami Kawabata, Iwao Sumiyoshi
  • Patent number: 5453340
    Abstract: Disclosed is a photosensitive composition for volume hologram recording which is used for recording an interference fringe produced by a laser beam or a light having excellent coherence, as fringes having different refractive index. The composition comprising:(a) a cationic polymerizable compound which is liquid at ambient temperature;(b) a radical polymerizable compound;(c) a radical photopolymerization initiator composition sensitized by a laser beam or a light having excellent coherence which has a specific wavelength to polymerize the ingredient (b); and(d) a cationic photopolymerization initiator composition which shows low photosensitivity to the light having a specific wavelength and is sensitized by a light having the other wavelength to polymerize the ingredient (a), wherein an average refractive index of the ingredient (a) is smaller than that of the ingredient (b). A process for producing the photosensitive composition is also disclosed.
    Type: Grant
    Filed: November 15, 1993
    Date of Patent: September 26, 1995
    Assignee: Nippon Paint Company, Ltd.
    Inventors: Masami Kawabata, Akihiko Sato, Iwao Sumiyoshi
  • Patent number: 5391442
    Abstract: The present invention provides the color pattern forming method wherein the process is simple and therefore the product can be manufactured at a low cost and it is possible to obtain an RGB color filter with superior pattern precision.
    Type: Grant
    Filed: January 14, 1993
    Date of Patent: February 21, 1995
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Hiroshi Tsushima, Iwao Sumiyoshi, Masaaki Yokoyama
  • Patent number: 5368990
    Abstract: A photopolymerizable composition comprising an addition polymerizable compound having an ethylenically unsaturated double bond and a photopolymerization initiating composition, said photopolymerizable initiating composition comprising (a) a dye of the formula: ##STR1## [wherein R.sub.1 is H, an alkyl group having 1 to 3 carbon atoms, a phenyl group or a halogen atom; R.sub.2 is a methyl group, an ethyl group or (CH.sub.2).sub.p -Q (wherein Q is a carboxyl group, a sulfonyl group or salt thereof and p is an integer of 1 to 4); X.sub.1 and X.sub.2 are independently --O--, --S--, --CH.dbd.CH-- or >N--R.sub.2 ; Y.sub.1 and Y.sub.2 are independently H, an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a phenyl group or a halogen atom; Z is --COO or --SO.sub.3 ; m is 0 or 1; and n is an integer of 1 to 4] and (b) diaryliodonium salt as a polymerization initiator.
    Type: Grant
    Filed: November 5, 1992
    Date of Patent: November 29, 1994
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masami Kawabata, Akihiko Sato, Iwao Sumiyoshi
  • Patent number: 5279864
    Abstract: A radiation curable primer coating composition is provided comprising (a) a reaction product of an epoxide compound and an ethylenically unsaturated monocarboxylic acid, (b) a compound of the formula: ##STR1## wherein R is hydrogen atom or methyl, A is a C.sub.2 -C.sub.4 alkylene group, and n is 0, 1 or 2; and (c) a compound having at least one epoxy group per molecule.The composition may be applied onto a steel substrate and cured by the irradiation of an actinic radiation for improving properties of subsequently applied polyolefin coatings thereon.
    Type: Grant
    Filed: August 21, 1991
    Date of Patent: January 18, 1994
    Assignees: Sumitomo Metal Industries, Ltd., Nippon Paint Co., Ltd.
    Inventors: Masakazu Ohkita, Tetsuzo Arai, Manasori Yoshiiwa, Koichi Yamada, Iwao Sumiyoshi, Ryoii Ishihara
  • Patent number: 4210713
    Abstract: A photo-curable coating composition having a high hiding power which comprises (1) a photo-curable, urethane-modified polymer having at least one unsaturation originated in the acrylate or methacrylate moiety and a molecular weight of which the proportion to the number of said unsaturation is 200-10,000, (2) an .alpha.,.beta.-ethylenically unsaturated compound copolymerizable with said acrylate or methacrylate moiety, (3) a photo-sensitizer, and (4) a coloring agent.
    Type: Grant
    Filed: May 4, 1978
    Date of Patent: July 1, 1980
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Iwao Sumiyoshi, Tamio Iimure, Akio Tomotsugu