Patents by Inventor Izabela STRUZYNSKA-PIRON

Izabela STRUZYNSKA-PIRON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Solvent resistant polymeric membranes
    Patent number: 10626276
    Abstract: A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: April 21, 2020
    Assignees: AGFA-GEVAERT, KATHOLIEKE UNIVERSITEIT LEUVEN
    Inventors: Izabela Struzynska-Piron, Ivo Vankelecom, Luc Vanmaele, Johan Loccufier
  • SOLVENT RESISTANT POLYMERIC MEMBRANES
    Publication number: 20170121529
    Abstract: A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.
    Type: Application
    Filed: January 11, 2017
    Publication date: May 4, 2017
    Inventors: Izabela STRUZYNSKA-PIRON, Ivo VANKELECOM, Luc VANMAELE, Johan LOCCUFIER
  • SOLVENT RESISTANT POLYMERIC MEMBRANES
    Publication number: 20150291843
    Abstract: A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.
    Type: Application
    Filed: March 19, 2013
    Publication date: October 15, 2015
    Applicants: KATHOLIEKE UNIVERSITEIT LEUVEN, AGFA-GEVAERT
    Inventors: Izabela STRUZYNSKA-PIRON, Ivo VANKELECOM, Luc VANMAELE, Johan LOCCUFIER