Patents by Inventor J. ALEX NIEMIEC

J. ALEX NIEMIEC has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250110399
    Abstract: The present invention relates to photosensitive compositions containing PFAS-free polynorbornene (PNB) terpolymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PFAS-free PNBs and certain multifunctional crosslinking agents, and two or more phenolic compounds which are resistant to thermo-oxidative chain degradation and exhibit improved mechanical properties.
    Type: Application
    Filed: September 27, 2024
    Publication date: April 3, 2025
    Applicants: PROMERUS, LLC, SUMITOMO BAKELITE CO., LTD
    Inventors: TAKANOBU MASUDA, KENTO NISHIDA, AKIHIKO OTOGURO, TOSHIHARU KUBOYAMA, EIKO TOMIYAMA, HIROMICHI SUGIYAMA, J. ALEX NIEMIEC, DOUG SKILSKYJ
  • Publication number: 20250110403
    Abstract: The present invention relates to photosensitive compositions containing PFAS-free polynorbornene (PNB) copolymers and terpolymers in combination with certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PFAS-free PNBs and certain multifunctional crosslinking agents, and two or more phenolic compounds which are resistant to thermo-oxidative chain degradation and exhibit improved mechanical properties.
    Type: Application
    Filed: September 27, 2024
    Publication date: April 3, 2025
    Applicants: PROMERUS, LLC, SUMITOMO BAKELITE CO., LTD
    Inventors: TAKANOBU MASUDA, KENTO NISHIDA, AKIHIKO OTOGURO, TOSHIHARU KUBOYAMA, EIKO TOMIYAMA, HIROMICHI SUGIYAMA, J. ALEX NIEMIEC, DOUG SKILSKYJ
  • Publication number: 20240309025
    Abstract: A process for the preparation of high purity norbornene alkyl silyl ether is disclosed and claimed. Specifically, a process for the preparation of industrial scale high purity norbornene methyl silyl ether is disclosed and claimed. The high purity monomers prepared in accordance with the process of this invention are useful in a variety of applications including but not limited to the preparation of high quality and high purity polynorbornenes having utility in a variety of electronic applications, among various other applications.
    Type: Application
    Filed: March 15, 2024
    Publication date: September 19, 2024
    Applicant: PROMERUS, LLC
    Inventors: HUGH BURGOON, J. ALEX NIEMIEC, DOUG SKILSKYJ, LARRY F. RHODES
  • Publication number: 20230312775
    Abstract: A series of palladium compounds as described herein are found to be superior vinyl addition polymerization catalysts. Specifically the compounds of formulae (I) and (II) as described herein surprisingly exhibit much higher reactivity than the compounds known in the art in the vinyl addition polymerization of a variety of cyclo-olefinic monomers, and thus polymers of very high molecular weight can be formed. Also disclosed are the formation of a variety of solid three dimensional objects, such as for example, solution extrusion of the polymer solutions formed from the vinyl addition polymerization of a variety of cyclic-olefinic monomers utilizing very low levels of palladium compounds of formulae (I) or (II) as described herein. The polymer films formed from the polymerization composition exhibit hitherto unattainable properties, for example superior transparent properties, higher thermal and mechanical properties, among other improved properties.
    Type: Application
    Filed: April 5, 2023
    Publication date: October 5, 2023
    Applicants: PROMERUS, LLC, SUMITOMO BAKELITE CO., LTD.
    Inventors: SHUN HAYAKAWA, HUGH BURGOON, J. ALEX NIEMIEC, DOUG SKILSKYJ, LARRY F RHODES