Abstract: A semiconductor material basically consists of titanium oxide, with the special feature of being like nanostructures, which gives special physicochemical properties, with ability to disperse and stabilize metal particles with high activity and selectivity in catalytic processes mainly. The process of producing the semiconductor material includes adding a titanium alkoxide to an alcoholic solution, adding an acid to the alcoholic solution, controlling the pH from 1 to 5; subjecting the acidic solution to agitation and reflux conditions at 70 to 80° C.; stabilizing the medium and adding bidistilled water in a water/alkoxide molar ratio of 1-2/0.100-0.150, continuing with reflux until gelation; aging the gel for 1 to 24 hours for complete formation of the titania; drying the titania nanostructured at of 50 to 80° C. for about 1 to 24 hours, and subjecting the dried titania to a calcination step at 200 to 600° C. for 1 to 12 hours.

Abstract: A semiconductor material basically consists of titanium oxide, with the special feature of being like nanostructures, which gives special physicochemical properties, with ability to disperse and stabilize metal particles with high activity and selectivity in catalytic processes mainly. The process of producing the semiconductor material includes adding a titanium alkoxide to an alcoholic solution, adding an acid to the alcoholic solution, controlling the pH from 1 to 5; subjecting the acidic solution to agitation and reflux conditions at 70 to 80° C.; stabilizing the medium and adding bidistilled water in a water/alkoxide molar ratio of 1-2/0.100-0.150, continuing with reflux until gelation; aging the gel for 1 to 24 hours for complete formation of the titania; drying the titania nanostructured at of 50 to 80° C. for about 1 to 24 hours, and subjecting the dried titania to a calcination step at 200 to 600° C. for 1 to 12 hours.

Abstract: A nanostructured titania semiconductor material termed TSG-IMP having a predetermined crystal size is produced by a sol-gel method by adding a titanium alkoxide to an alcoholic solution, adding an acid to the alcoholic solution, subjecting the acidic solution to agitation under reflux conditions; stabilizing the medium and adding bidistilled water under reflux until gelation; subjecting the gel to aging until complete formation of the titania which is dried and calcined.

Abstract: The present invention is related to a selective adsorption process aimed at reducing the content of nitrogen organic compounds (NOC's) that is present in hydrotreating loads (HDT) for the production of ultra-low-sulfur diesel (ULSD below 15 ppm), which is carried out at ambient temperature, atmospheric pressure, without hydrogen, using adsorbing materials with organic metal structure MIL-101-Cr-MX+ (MOF MIL-101-Cr-MX+), where MX+ can be any metal cation such as Mg2+, Al3+ or Ti4+. Likewise, the present invention considers the preparation of extrudates and the regeneration of the employed MOF adsorbent materials. In this sense, it is worth noting that the diesel HDT loads to which the present invention is referred to are hydrocarbon currents with distillation temperatures ranging from 150 to 400° C.

Abstract: A nanostructured titania semiconductor material termed TSG-IMP having a predetermined crystal size is produced by a sol-gel method by adding a titanium alkoxide to an alcoholic solution, adding an acid to the alcoholic solution, subjecting the acidic solution to agitation under reflux conditions: stabilizing the medium and adding bidistilled water under reflux until gelation; subjecting the gel to aging until complete formation of the titania which is dried and calcined.