Patents by Inventor J. Christian Swindal

J. Christian Swindal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9506743
    Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: November 29, 2016
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Arie Jeffrey Den Boef, Justin Lloyd Kreuzer, Simon Gijsbert Josephus Mathijssen, Gerrit Johannes Nijmeijer, J. Christian Swindal, Patricius Aloysius Jacobus Tinnemans, Richard Johannes Franciscus Van Haren
  • Publication number: 20150219438
    Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.
    Type: Application
    Filed: September 20, 2013
    Publication date: August 6, 2015
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Arie Jeffrey Den Boef, Justin Lloyd Kreuzer, Simon Gijsbert Josephus Mathijssen, Gerrit Johannes Nijmeijer, J. Christian Swindal, Patricius Aloysius Jacobus Tinnemans, Richard Johannes Franciscus Van Haren
  • Patent number: 7573580
    Abstract: An optical position measuring system (e.g., an interferometer) includes a superluminescent device (SLD) (e.g., a laser diode having at least one anti-reflective coated surface) and a detector. The SLD generates a light beam having a short coherence length (e.g., about 0.1 mm to about 0.5 mm, less than the optical path length of an optical element, and/or less than a spacing between optical elements). Through use of the short coherence length light beam, interference effects from spurious or ghost reflections that exist in conventional position measuring systems are substantially reduced or eliminated.
    Type: Grant
    Filed: November 17, 2003
    Date of Patent: August 11, 2009
    Assignee: ASML Holding N.V.
    Inventor: J. Christian Swindal
  • Patent number: RE44434
    Abstract: An optical position measuring system (e.g., an interferometer) includes a superluminescent device (SLD) (e.g., a laser diode having at least one anti-reflective coated surface) and a detector. The SLD generates a light beam having a short coherence length (e.g., about 0.1 mm to about 0.5 mm, less than the optical path length of an optical element, and/or less than a spacing between optical elements). Through use of the short coherence length light beam, interference effects from spurious or ghost reflections that exist in conventional position measuring systems are substantially reduced or eliminated.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: August 13, 2013
    Assignee: ASML Holding N.V.
    Inventor: J. Christian Swindal