Patents by Inventor J. David Eick

J. David Eick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7232852
    Abstract: A visible light cationically photopolymerizable composition is provided. This composition includes an expanding monomer and a dioxirane. More specifically, the expanding monomer used in this composition is one or more dioxiranyl tetraoxaspiro[5.5]undecanes. The composition of the present invention may be used as a matrix resin for dental restorative materials. Another embodiment of the present invention is various novel dioxiranyl tetraoxaspiro[5.5]undecanes.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: June 19, 2007
    Assignee: Curators of the University of Missouri
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Andrew J. Holder, Shin-Shi Chen, Li Jeang
  • Publication number: 20070072954
    Abstract: This invention relates to compositions of matter that include a polymerization stress reducing monomer, which may be one of the novel tetraoxaspiroalkanes disclosed herein, and an organosilicon monomer, such as a silorane. These matrix resin compositions may also include a photoinitiator, a photosensitizer, a reaction promoter, and other additives. The photopolymerizable compositions of this invention are useful for a variety of applications including use as dental matrix resin systems, such as restorative composites.
    Type: Application
    Filed: September 29, 2006
    Publication date: March 29, 2007
    Inventors: Cecil Chappelow, Charles Pinzino, Shin-Shi Chen, J. David Eick
  • Patent number: 6825364
    Abstract: A visible light cationically photopolymerizable composition is provided. This composition includes an expanding monomer and a dioxirane. More specifically, the expanding monomer used in this composition is one or more dioxiranyl tetraoxaspiro[5.5]undecanes. The composition of the present invention may be used as a matrix resin for dental restorative materials. Another embodiment of the present invention is various novel dioxiranyl tetraoxaspiro[5.5]undecanes.
    Type: Grant
    Filed: March 5, 2002
    Date of Patent: November 30, 2004
    Assignee: Curators of the University of Missouri
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Andrew J. Holder, Shin-Shi Chen, Li Jeang
  • Publication number: 20040167245
    Abstract: A visible light cationically photopolymerizable composition is provided. This composition includes an expanding monomer and a dioxirane. More specifically, the expanding monomer used in this composition is one or more dioxiranyl tetraoxaspiro[5.5]undecanes. The composition of the present invention may be used as a matrix resin for dental restorative materials. Another embodiment of the present invention is various novel dioxiranyl tetraoxaspiro[5.5]undecanes.
    Type: Application
    Filed: February 20, 2004
    Publication date: August 26, 2004
    Applicant: Curators of the University of Missouri
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Andrew J. Holder, Shin-Shi Chen, Li Jeang
  • Patent number: 6653486
    Abstract: Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may also include epoxides, polyols, spiroorthocarbonates. One embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, a spiroorthocarbonate, and a photoinitiator system. Another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, and a photoinitiator system. Still another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, a spiroorthocarbonate, and a photoinitiator system. Still further, another embodiment of the present invention is certain novel spiroorthocarbonate compounds. Each of these novel spiroorthocarbonate compounds include at least one epoxy group as a substituent.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: November 25, 2003
    Assignee: Curators of the University of Missouri
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick
  • Publication number: 20030187093
    Abstract: A visible light cationically photopolymerizable composition is provided. This composition includes an expanding monomer and a dioxirane. More specifically, the expanding monomer used in this composition is one or more dioxiranyl tetraoxaspiro[5.5]undecanes. The composition of the present invention may be used as a matrix resin for dental restorative materials. Another embodiment of the present invention is various novel dioxiranyl tetraoxaspiro [5.5]undecanes.
    Type: Application
    Filed: March 5, 2002
    Publication date: October 2, 2003
    Applicant: Curators of the University
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Andrew J. Holder, Shin-Shi Chen, Li Jeang
  • Patent number: 6610759
    Abstract: An adhesive composition that includes a mixture of a cationically polymerizable component, an acidic component, and an initiator is provided. Preferably, the initiator comprises an iodonium salt, a visible light sensitizer, and an electron donor compound, wherein the initiator has a photoinduced potential greater than or equal to that of N,N-dimethylaniline in a standard solution of 2.9×10−5 moles/g diphenyl iodonium hexafluoroantimonate and 1.5×10−5 moles/g camphorquinone in 2-butanone. This adhesive composition is cationically polymerizable and is able to bond to hard tissue and cationic restorative materials upon curing.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: August 26, 2003
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, James Code, Joel D. Oxman, Sharon M. Rozzi
  • Publication number: 20030119931
    Abstract: Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may also include epoxides, polyols, spiroorthocarbonates. One embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, a spiroorthocarbonate, and a photoinitiator system. Another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, and a photoinitiator system. Still another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, a spiroorthocarbonate, and a photoinitiator system.
    Type: Application
    Filed: September 4, 2002
    Publication date: June 26, 2003
    Applicant: The Curators of the University of Missouri
    Inventors: Joel D. Oxman, Cecil C. Chappelow, Charles S. Pinzino, J. David Eick
  • Patent number: 6458865
    Abstract: Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may also include epoxides, polyols, spiroorthocarbonates. One embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, a spiroorthocarbonate, and a photoinitiator system. Another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, and a photoinitiator system. Still another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, a spiroorthocarbonate, and a photoinitiator system. Still further, another embodiment of the present invention is certain novel spiroorthocarbonate compounds. Each of these novel spiroorthocarbonate compounds include at least one epoxy group as a substituent.
    Type: Grant
    Filed: January 15, 1999
    Date of Patent: October 1, 2002
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Joel D. Oxman
  • Publication number: 20020013380
    Abstract: Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may also include epoxides, polyols, spiroorthocarbonates. One embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, a spiroorthocarbonate, and a photoinitiator system. Another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, and a photoinitiator system. Still another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, a spiroorthocarbonate, and a photoinitiator system.
    Type: Application
    Filed: January 15, 1999
    Publication date: January 31, 2002
    Inventors: CECIL C. CHAPPELOW, CHARLES S. PINZINO, J. DAVID EICK, JOEL D. OXMAN
  • Patent number: 6022940
    Abstract: Copolymer compositions are provided, including those which undergo less than .+-.1.0% bulk polymerization shrinkage and are useful as strain-free composites, high-strength adhesives, and precision castings. The copolymer compositions are formed from the cationic initiated polymerization of alicyclic spiroorthocarbonate monomers and epoxy resin monomers or comonomers. A preferred spiroorthocarbonate monomer is 2,3,8,9-di(tetramethylene)-1,5,7,11-tetraoxaspiro-[5,5]undecane. A preferred epoxy resin is a three component epoxy comonomer mixture of (i) diglycidyl ether of bisphenol A, (ii) 3,4-epoxycyclohexanemethyl-3,4-epoxycyclohexane carboxylate, and (iii) vinyl cyclohexene dioxide, preferably in a ratio of 5:4:1 by weight.
    Type: Grant
    Filed: September 16, 1996
    Date of Patent: February 8, 2000
    Assignee: The Curators of the University of Missouri
    Inventors: Thomas J. Byerley, Cecil C. Chappelow, J. David Eick
  • Patent number: 5808108
    Abstract: Polymeric compositions are provided which are the reaction product of spiroorthocarbonates and epoxy resins and undergo reduced bulk polymerization shrinkage. The spiroorthocarbonates are of the general formula: ##STR1## wherein X=O or S;R.sub.1, and R.sub.2 are independently selected from the group consisting of H, alkyl, aryl, substituted alkyl, and substituted aryl;R.sub.3 and R.sub.4 =--(CH.sub.2).sub.n --O--R.sub.5 ;n=1 or 2;R.sub.5 =alkyl, aryl, substituted aryl, substituted alkyl, ##STR2## R.sub.6 =H, alkyl, aryl, substituted alkyl, or substituted aryl; and R.sub.7 =alkyl, aryl, substituted alkyl, or substituted aryl.
    Type: Grant
    Filed: January 15, 1997
    Date of Patent: September 15, 1998
    Inventors: Cecil C. Chappelow, J. David Eick, Charles S. Pinzino
  • Patent number: 5556896
    Abstract: Copolymer compositions are provided, including those which undergo less than .+-.1.0% bulk polymerization shrinkage and are useful as strain-free composites, high-strength adhesives, and precision castings. The copolymer compositions are formed from the cationic initiated polymerization of alicyclic spiroorthocarbonate monomers and epoxy resin monomers or comonomers. A preferred spiroorthocarbonate monomer is 2,3,8,9-di(tetramethylene)-1,5,7,11-tetraoxaspiro-[5,5]undecane. A preferred epoxy resin is a three component epoxy comonomer mixture of (i) diglycidyl ether of bisphenol A, (ii) 3,4-epoxycyclohexanemethyl-3,4-epoxycyclohexane carboxylate, and (iii) vinyl cyclohexene dioxide, preferably in a ratio of 5:4:1 by weight.
    Type: Grant
    Filed: July 1, 1993
    Date of Patent: September 17, 1996
    Assignee: The Curators of the University of Missouri
    Inventors: Thomas J. Byerley, J. David Eick, Cecil C. Chappelow
  • Patent number: 5453530
    Abstract: Compounds are described which are S-(.omega.-hydroxyalkyl) esters of thioacrylic and thiomethacrylic acids. The compounds have the formula: ##STR1## wherein: R is hydrogen or methyl; andn is 1, 2 or 3.These compounds can be used as conditioners to enhance the wettability of dentinal surfaces, can be employed as chemical tracers to characterize the wetting of dentinal surfaces, and can be copolymerized in situ to form potential dentinal bonding systems. The compounds can also be homopolymerized and copolymerized to form other useful products.
    Type: Grant
    Filed: March 11, 1994
    Date of Patent: September 26, 1995
    Assignees: The Curators of the University of Missouri, Midwest Research Institute
    Inventors: Thomas J. Byerley, Cecil C. Chappelow, J. David Eick
  • Patent number: 5401819
    Abstract: Novel trans-beta-isocyanatoacrylate esters, their preparation and use in forming novel polymeric compositions, including polymers useful as adhesives, are disclosed. The trans-beta-isocyanatoacrylate esters have the formula: ##STR1## wherein R is C.sub.1 -C.sub.18 linear or branched alkyls; C.sub.5 -C.sub.6 cycloalkyl; aryl; alkaryl; aralkyl; C.sub.1 -C.sub.18 halogenated alkyl; halogenated aryl; C.sub.1 -C.sub.8 alkoxyalkyl; or alkoxyaryl.
    Type: Grant
    Filed: August 11, 1994
    Date of Patent: March 28, 1995
    Assignee: Curators of the University of Missouri
    Inventors: Thomas J. Byerley, Cecil C. Chappelow, J. David Eick
  • Patent number: 5347044
    Abstract: Novel trans-beta-isocyanatoacrylate esters, their preparation and use in forming novel polymeric compositions, including polymers useful as adhesives, are disclosed. The trans-beta-isocyanatoacrylate esters have the formula: ##STR1## wherein R is C.sub.1 -C.sub.18 linear or branched alkyls; C.sub.5 -C.sub.6 cycloalkyl; aryl; alkaryl; aralkyl; C.sub.1 -C.sub.18 halogenated alkyl; halogenated aryl; C.sub.1 -C.sub.8 alkoxyalkyl; or alkoxyaryl.
    Type: Grant
    Filed: April 6, 1992
    Date of Patent: September 13, 1994
    Assignee: Curators of the University of Missouri
    Inventors: Thomas J. Byerley, Cecil C. Chappelow, J. David Eick