Patents by Inventor J. H. Tsai

J. H. Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050127432
    Abstract: A method of manufacturing a semiconductor device, wherein a gate structure is formed over a substrate, an interconnect layer is formed over the gate structure and the substrate, and a cap layer is formed over the interconnect layer. The interconnect layer and the cap layer are then planarized to form a substantially planar surface. A mask layer, such as an oxide mask layer, is formed over the planarized portions of the interconnect layer, and the planarized cap layer and portions of the interconnect layer are removed by etching around the mask layer.
    Type: Application
    Filed: December 3, 2003
    Publication date: June 16, 2005
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chung-Yi Yu, C.H. Loa, J.H. Tsai
  • Patent number: 6045587
    Abstract: A method of reducing color and polymerization decay of cellulose viscose includes the step of permeating a 1,3-phenylene-bis 2-oxazoline as a polymerization anti-decay additive during dissolving a cellulose in water and a solvent to form a cellulose viscose, so as to reduce the color and the polymerization decay of the cellulose viscose.
    Type: Grant
    Filed: May 9, 1998
    Date of Patent: April 4, 2000
    Assignee: Acelon Chemical and Fiber Corporation
    Inventors: Meng-Song Cheng, Kun Shan Huang, J. H. Tsai
  • Patent number: 6033969
    Abstract: A method is provided for forming a shallow trench isolation that has rounded and protected corners by first forming a bird's beak field oxide layer prior to the trench-forming step such that a rounded and protected top corner and a rounded bottom corner of the trench can be formed. The rounded top and bottom corners of the shallow trench opening have a radius of at least 100 .ANG. and a trench depth of not more than 5000 .ANG.. The top corner of the trench opening is protected by the beak portion of the bird's beak against etching in a subsequent oxide dip process before gate formation.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: March 7, 2000
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chue-San Yoo, R. Y. Lee, J. H. Tsai
  • Patent number: 5977356
    Abstract: A simple and single step process for producing caprolactam comprising reacting 5-formylvaleric acid or an ester thereof in a solvent of water and/or an alcohol with hydrogen and ammonia in the presence of a noble metal catalyst supported by a carrier at 80.degree. to 300.degree. C. under a pressure of 10 to 120 atm, whereby amination, acidification, dehydration and cyclization occur to obtain caprolactam.
    Type: Grant
    Filed: July 2, 1997
    Date of Patent: November 2, 1999
    Assignees: Industrial Technology Research Institute, Acelon Chemicals & Fiber Corporation
    Inventors: Shiao-Jung Chu, Hsi-Yen Hsu, Ching-Tang Lin, Kwang-Chic Lai, J. H. Tsai
  • Patent number: 5917000
    Abstract: A manufacturing process of continuously producing a polyether-ester amide elastomer, which is adapted for mass production and reducing manufacturing cost, includes the steps of melting a poly (tetra methylene ether) glycol reactant, a .epsilon.-caprolactam reactant and an adipic acid reactant, pre-polymerizing the melted reactants by esterification and ring-opening reaction to form a pre-polymer and highly polymerizing the pre-polymer to form the polyether-ester amide elastomer. The polyether-ester amide elastomer is specifically used as a raw ingredient for producing a polyether-ester amide elastic fiber by drying the polyether-ester amide elastomer in a drying device, extruding the dried polyether-ester amide elastomer by an extruder, and molten spinning the extruded polyether-ester amide elastomer to form the polyether-ester amide elastic fiber.
    Type: Grant
    Filed: April 29, 1998
    Date of Patent: June 29, 1999
    Inventors: J. H. Tsai, J. S. Chiou, Y. K Twu