Patents by Inventor J. Joseph Armstrong
J. Joseph Armstrong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7639419Abstract: A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems including illumination, imaging, autofocus, positioning, sensor, data acquisition, and data analysis. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and elements of the objective are less than 100 mm in diameter. The objective comprises a focusing lens group and at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement. The design imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90 to a specimen for imaging purposes, and the design may be employed in various environments.Type: GrantFiled: July 7, 2003Date of Patent: December 29, 2009Assignee: KLA-Tencor Technologies, Inc.Inventors: Yung-Ho Chuang, J. Joseph Armstrong, David R. Shafer
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Patent number: 7633675Abstract: A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.Type: GrantFiled: December 5, 2007Date of Patent: December 15, 2009Assignee: KLA-Tencor Technologies CorporationInventors: J. Joseph Armstrong, Yung-Ho Chuang, David R. Shafer
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Patent number: 7627007Abstract: A laser illuminator and illumination method for use in an inspection system, such as a semiconductor wafer inspection system or photomask inspection system is provided. The design comprises generating fundamental frequency laser energy at different fundamental wavelengths, such as 998 nm, converting a portion of the fundamental frequency laser energy to 2nd harmonic frequency laser energy, further converting the 2nd harmonic frequency laser energy to 4th harmonic frequency laser energy, and mixing the 4th harmonic frequency laser energy with a portion of the fundamental frequency laser energy to produce laser energy at a sum frequency. Mixing is accomplished by non-critical phase matching in a crystal of Cesium Lithium Borate (CLBO).Type: GrantFiled: March 10, 2006Date of Patent: December 1, 2009Assignee: KLA-Tencor Technologies CorporationInventors: J. Joseph Armstrong, Yung-Ho Chuang
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Patent number: 7609373Abstract: A system and method for inspecting a multi-layer sample, such as a silicon wafer, is disclosed. The design reduces variations in total reflected energy due to thin film interference. The design includes illuminating the sample at two incident angle ranges, where the two incident angle ranges are such that variation in total reflected energy at a first incident angle range may be employed to balance variation in total reflected energy at a second incident angle range. Defects are detected using die-to-die subtraction of the sample illuminated at the two incident angle ranges.Type: GrantFiled: September 9, 2005Date of Patent: October 27, 2009Assignee: KLA-Tencor Technologies CorporationInventors: Yung-Ho Chuang, J. Joseph Armstrong
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Publication number: 20090180176Abstract: A system for inspecting a specimen is provided. The system includes an illumination subsystem configured to produce a plurality of channels of light energy, each channel of light energy produced having differing characteristics (type, wavelength, etc.) from at least one other channel of light energy. Optics are configured to receive the plurality of channels of light energy and combine them into a spatially separated combined light energy beam and direct it toward the specimen. A data acquisition subsystem comprising at least one detector is provided, configured to separate reflected light energy into a plurality of received channels corresponding to the plurality of channels of light energy and detect the received channels.Type: ApplicationFiled: July 29, 2008Publication date: July 16, 2009Applicant: KLA-Tencor CorporationInventors: J. Joseph Armstrong, Yung-Ho Chuang
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Patent number: 7518789Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.Type: GrantFiled: October 4, 2004Date of Patent: April 14, 2009Assignee: KLA-Tencor CorporationInventors: David R. Shafer, Yung-Ho Chuang, J. Joseph Armstrong
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Patent number: 7474461Abstract: A system and method for inspection is disclosed. The design generally employs as many as four design principles, including employing at least one lens from a relatively low dispersion glass, at least one additional lens from an additional material different from the relatively low dispersion glass, generally matching the relatively low dispersion properties of the relatively low dispersion glass. The design also may include at least one further lens from a further material different from and exhibiting a significantly different dispersion power from the relatively low dispersion glass and the additional material. Finally, the design may include lenses positioned to insert a significant amount of color within the objective, a gap, and additional lenses, the gap and additional lenses serving to cancel the color inserted.Type: GrantFiled: July 5, 2007Date of Patent: January 6, 2009Assignee: KLA - Tencor Technologies CorporationInventors: Yung-Ho Chuang, David R. Shafer, J. Joseph Armstrong
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Patent number: 7465913Abstract: A variable modulated transfer function (MTF) design employing a variable gate voltage source for use in inspecting specimens is disclosed. The design applies a variable gate voltage to each pixel of a sensor, wherein applying the variable gate voltage to each pixel adjusts the MTF of the pixel. MTF adjustment improves adverse effects encountered during inspection, such as aliasing and maintaining contrast.Type: GrantFiled: August 4, 2006Date of Patent: December 16, 2008Assignee: KLA-Tencor CorporationInventors: Yung-Ho Chuang, J. Joseph Armstrong, David Lee Brown, Bin-Ming B. Tsai
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Patent number: 7457034Abstract: A system for multiple mode imaging is disclosed. The catadioptric system has an NA greater than 0.65, and preferably greater than 0.9, highly corrected for low and high order monochromatic aberrations. The system employs unique illumination entrances and optics to collect reflected, diffracted, and scattered light over a range of angles. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric elements at any angle from 0 to 85 degrees from vertical. The system may employ a relayed pupil plane, used to select different imaging modes, provide simultaneous operation of different imaging modes, Fourier filtering, and other pupil shaping operations.Type: GrantFiled: April 14, 2006Date of Patent: November 25, 2008Assignee: KLA-Tencor CorporationInventors: Yung-Ho Chuang, David Shafer, Bin-Ming B. Tsai, J. Joseph Armstrong
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Patent number: 7449673Abstract: A system and method for reducing peak power of a laser pulse and reducing speckle contrast of a single pulse comprises a plurality of elements oriented to split and delay a pulse or pulses transmitted from a light emitting device. The design provides the ability to divide the pulse into multiple pulses by delaying the components relative to one another. Reduction of speckle contrast entails using the same or similar components to the power reduction design, reoriented to orient received energy wherein angles between the optical paths are altered such that the split or divided light energy components strike the target at different angles or different positions. An alternate embodiment for reducing speckle contrast is disclosed wherein a single pulse is passed in an angular orientation through a grating to create a delayed portion of the pulse relative to the leading edge of the pulse.Type: GrantFiled: February 27, 2007Date of Patent: November 11, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Yung-Ho Chuang, J. Joseph Armstrong
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Publication number: 20080247035Abstract: A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.Type: ApplicationFiled: December 5, 2007Publication date: October 9, 2008Applicant: KLA-Tencor Technologies CorporationInventors: J. Joseph Armstrong, Yung-Ho Chuang, David R. Shafer
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Publication number: 20080247036Abstract: An objective for imaging specimens is disclosed. The objective receives light energy from a light energy source configured to provide light energy in a wavelength range of approximately 480 to 660 nanometers, employs a Mangin mirror arrangement in conjunction with an immersion liquid to provide a numerical aperture in excess of 1.0 and a field size in excess of 0.05 millimeters, where every element in the objective has a diameter of less than approximately 40 millimeters.Type: ApplicationFiled: June 14, 2007Publication date: October 9, 2008Inventor: J. Joseph Armstrong
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Publication number: 20080225282Abstract: A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially normal angle toward the specimen, and an optical device, such as a prism or reflective surface, positioned within the central obscuration resulting from the catadioptric objective for receiving further illumination from a secondary illumination source and diverting the further illumination to the specimen. The method comprises illuminating a surface of the specimen at a variety of angles using a primary illumination source, illuminating the surface using a secondary illumination source, the illuminating by the secondary illumination source occurring at a substantially normal angle of incidence; and imaging all reflected, scattered, and diffracted light energy received from the surface onto a detector.Type: ApplicationFiled: March 3, 2008Publication date: September 18, 2008Applicant: KLA-Tencor Technologies CorporationInventors: Yung-Ho Chuang, J. Joseph Armstrong
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Patent number: 7345825Abstract: A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially normal angle toward the specimen, and an optical device, such as a prism or reflective surface, positioned within the central obscuration resulting from the catadioptric objective for receiving further illumination from a secondary illumination source and diverting the further illumination to the specimen. The method comprises illuminating a surface of the specimen at a variety of angles using a primary illumination source, illuminating the surface using a secondary illumination source, the illuminating by the secondary illumination source occurring at a substantially normal angle of incidence; and imaging all reflected, scattered, and diffracted light energy received from the surface onto a detector.Type: GrantFiled: June 30, 2005Date of Patent: March 18, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Yung-Ho Chuang, J. Joseph Armstrong
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Patent number: 7307783Abstract: A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.Type: GrantFiled: March 29, 2004Date of Patent: December 11, 2007Assignee: KLA-Tencor Technologies CorporationInventors: J. Joseph Armstrong, Yung-Ho Chuang, David R. Shafer
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Patent number: 7245438Abstract: A system and method for inspection is disclosed. The design generally employs as many as four design principles, including employing at least one lens from a relatively low dispersion glass, at least one additional lens from an additional material different from the relatively low dispersion glass, generally matching the relatively low dispersion properties of the relatively low dispersion glass. The design also may include at least one further lens from a further material different from and exhibiting a significantly different dispersion power from the relatively low dispersion glass and the additional material. Finally, the design may include lenses positioned to insert a significant amount of color within the objective, a gap, and additional lenses, the gap and additional lenses serving to cancel the color inserted.Type: GrantFiled: October 5, 2005Date of Patent: July 17, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Yung-Ho Chuang, David R. Shafer, J. Joseph Armstrong
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Patent number: 7187500Abstract: A system and method for reducing peak power of a laser pulse and reducing speckle contrast of a single pulse comprises a plurality of elements oriented to split and delay a pulse or pulses transmitted from a light emitting device. The design provides the ability to divide the pulse into multiple pulses by delaying the components relative to one another. Reduction of speckle contrast entails using the same or similar components to the power reduction design, reoriented to orient received energy wherein angles between the optical paths are altered such that the split or divided light energy components strike the target at different angles or different positions. An alternate embodiment for reducing speckle contrast is disclosed wherein a single pulse is passed in an angular orientation through a grating to create a delayed portion of the pulse relative to the leading edge of the pulse.Type: GrantFiled: February 10, 2004Date of Patent: March 6, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Yung-Ho Chuang, J. Joseph Armstrong
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Patent number: 7180658Abstract: A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 mm in diameter. The objective comprises a focusing lens group configured to receive the light energy and comprising at least one focusing lens. The objective further comprises at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy for transmission to a specimen. The Mangin mirror arrangement imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90, and the design may be employed in various environments.Type: GrantFiled: May 7, 2003Date of Patent: February 20, 2007Assignee: KLA-Tencor Technologies CorporationInventors: David R. Shafer, Yung-Ho Chuang, J. Joseph Armstrong
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Publication number: 20070002465Abstract: A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially normal angle toward the specimen, and an optical device, such as a prism or reflective surface, positioned within the central obscuration resulting from the catadioptric objective for receiving further illumination from a secondary illumination source and diverting the further illumination to the specimen. The method comprises illuminating a surface of the specimen at a variety of angles using a primary illumination source, illuminating the surface using a secondary illumination source, the illuminating by the secondary illumination source occurring at a substantially normal angle of incidence; and imaging all reflected, scattered, and diffracted light energy received from the surface onto a detector.Type: ApplicationFiled: June 30, 2005Publication date: January 4, 2007Inventors: Yung-Ho Chuang, J. Joseph Armstrong
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Patent number: 7136159Abstract: A system and method for inspecting a specimen, such as a semiconductor wafer, including illuminating at least a portion of the specimen using an excimer source using at least one relatively intense wavelength from the source, detecting radiation received from the illuminated portion of the specimen, analyzing the detected radiation for potential defects present in the specimen portion.Type: GrantFiled: March 12, 2002Date of Patent: November 14, 2006Assignee: KLA-Tencor Technologies CorporationInventors: Bin-Ming Benjamin Tsai, Yung-Ho Chuang, J. Joseph Armstrong, David Lee Brown