Patents by Inventor J. Martin Algots
J. Martin Algots has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160150626Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.Type: ApplicationFiled: February 2, 2016Publication date: May 26, 2016Inventors: Peter M. BAUMGART, J. Martin ALGOTS, Abhiram GOVINDARAJU, Chirag RAJYAGURU
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Patent number: 9279445Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.Type: GrantFiled: December 16, 2011Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Peter M. Baumgart, J. Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
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Patent number: 8855166Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.Type: GrantFiled: January 17, 2012Date of Patent: October 7, 2014Assignee: Cymer, LLCInventors: Richard C. Ujazdowski, Richard M. Ness, J. Martin Algots, Vladimir B. Fleurov, Frederick A. Palenschat, Walter D. Gillespie, Bryan G. Moosman, Thomas D. Steiger, Brett D. Smith, Thomas E. McKelvey
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Publication number: 20130153792Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.Type: ApplicationFiled: December 16, 2011Publication date: June 20, 2013Applicant: CYMER, INCInventors: Peter M. Baumgart, J. Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
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Publication number: 20120120974Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.Type: ApplicationFiled: January 17, 2012Publication date: May 17, 2012Inventors: Richard C. Ujazdowski, Richard M. Ness, J. Martin Algots, Vladimir B. Fleurov, Frederick A. Palenschat, Walter D. Gillespie, Bryan G. Moosman, Thomas D. Steiger, Brett D. Smith, Thomas E. McKelvey
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Patent number: 8126027Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.Type: GrantFiled: April 14, 2011Date of Patent: February 28, 2012Assignee: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, William N. Partlo, German E. Rylov, Richard L. Sandstrom
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Publication number: 20110194580Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.Type: ApplicationFiled: April 14, 2011Publication date: August 11, 2011Applicant: CYMER, INC.Inventors: J. Martin Algots, Robert A. Bergstedt, William N. Partlo, German E. Rylov, Richard L. Sandstrom
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Patent number: 7838854Abstract: An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.Type: GrantFiled: July 25, 2008Date of Patent: November 23, 2010Assignee: Cymer, Inc.Inventors: J. Martin Algots, Igor V. Fomenkov, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Oscar Hemberg, Alexander N. Bykanov, Dennis W. Cobb
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Publication number: 20100097704Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.Type: ApplicationFiled: December 14, 2009Publication date: April 22, 2010Applicant: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
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Patent number: 7589337Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.Type: GrantFiled: March 12, 2008Date of Patent: September 15, 2009Assignee: Cymer, Inc.Inventors: Alexander N. Bykanov, J. Martin Algots, Oleh V. Khodykin, Oscar Hemberg, Norbert R. Bowering
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Publication number: 20080283776Abstract: An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.Type: ApplicationFiled: July 25, 2008Publication date: November 20, 2008Applicant: CYMER, INC.Inventors: J. Martin Algots, Igor V. Fomenkov, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Oscar Hemberg, Alexander N. Bykanov, Dennis W. Cobb
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Publication number: 20080179549Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.Type: ApplicationFiled: March 12, 2008Publication date: July 31, 2008Applicant: Cymer, Inc.Inventors: Alexander N. Bykanov, J. Martin Algots, Oleh Khodykin, Oscar Hemberg
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Patent number: 7405416Abstract: An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.Type: GrantFiled: February 25, 2005Date of Patent: July 29, 2008Assignee: Cymer, Inc.Inventors: J. Martin Algots, Igor V. Fomenkov, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Oscar Hemberg, Alexander N. Bykanov, Dennis W. Cobb
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Publication number: 20080151944Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.Type: ApplicationFiled: February 28, 2008Publication date: June 26, 2008Applicant: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
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Patent number: 7372056Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.Type: GrantFiled: June 29, 2005Date of Patent: May 13, 2008Assignee: Cymer, Inc.Inventors: Alexander N. Bykanov, J. Martin Algots, Oleh Khodykin, Oscar Hemberg
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Patent number: 7366219Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light puType: GrantFiled: November 30, 2004Date of Patent: April 29, 2008Assignee: Cymer, Inc.Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
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Patent number: 7122816Abstract: An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line.Type: GrantFiled: March 23, 2005Date of Patent: October 17, 2006Assignee: Cymer, Inc.Inventors: J. Martin Algots, Oscar Hemberg, Tae H. Chung
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Publication number: 20060114957Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light puType: ApplicationFiled: November 30, 2004Publication date: June 1, 2006Inventors: J. Martin Algots, Robert Bergstedt, Walter Gillespie, Vladimir Kulgeyko, William Partlo, German Rylov, Richard Sandstrom, Brian Strate, Timothy Dyer
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Publication number: 20060114956Abstract: A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner.Type: ApplicationFiled: November 30, 2004Publication date: June 1, 2006Inventors: Richard Sandstrom, William Partlo, Daniel Brown, J. Martin Algots, Fedor Trintchouk