Patents by Inventor J.P. Jeyadevan

J.P. Jeyadevan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • UV decomposable molecules and a photopatternable monomolecular film formed therefrom
    Patent number: 7479362
    Abstract: Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C).
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: January 20, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Hitoshi Fukushima, Hiroshi Takiguchi, Tatsuya Shimoda, Takashi Masuda, Richard James Bushby, Stephan Evans, J.P. Jeyadevan, Kevin Critchley
  • UV decomposable molecules and a photopatternable monomolecular film formed therefrom
    Publication number: 20050245739
    Abstract: Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C).
    Type: Application
    Filed: April 28, 2005
    Publication date: November 3, 2005
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hitoshi Fukushima, Hiroshi Takiguchi, Tatsuya Shimoda, Takashi Masuda, Richard Bushby, Stephan Evans, J.P. Jeyadevan, Kevin Critchley