Patents by Inventor J. Peter Levin

J. Peter Levin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6190836
    Abstract: A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: February 20, 2001
    Assignee: International Business Machines Corporation
    Inventors: Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, Michael S. Hibbs, J. Peter Levin, Timothy E. Neary, Raymond E. Rochefort, Dennis A. Schmidt, Jacek G. Smolinski, Alfred Wagner
  • Patent number: 6165649
    Abstract: A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain.
    Type: Grant
    Filed: January 21, 1997
    Date of Patent: December 26, 2000
    Assignee: International Business Machines Corporation
    Inventors: Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, Michael S. Hibbs, J. Peter Levin, Timothy E. Neary, Raymond E. Rochefort, Dennis A. Schmidt, Jacek G. Smolinski, Alfred Wagner
  • Patent number: 6156461
    Abstract: A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain.
    Type: Grant
    Filed: February 14, 2000
    Date of Patent: December 5, 2000
    Assignee: International Business Machines Corporation
    Inventors: Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, Michael S. Hibbs, J. Peter Levin, Timothy E. Neary, Raymond E. Rochefort, Dennis A. Schmidt, Jacek G. Smolinski, Alfred Wagner
  • Patent number: 6090507
    Abstract: A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain.
    Type: Grant
    Filed: March 3, 1999
    Date of Patent: July 18, 2000
    Assignee: International Business Machines Corporation
    Inventors: Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, Michael S. Hibbs, J. Peter Levin, Timothy E. Neary, Raymond E. Rochefort, Dennis A. Schmidt, Jacek G. Smolinski, Alfred Wagner