Abstract: A device having a microelectronic component housed in a hermetically sealed housing having a vacuum inner space, and including a getter that substantially traps only hydrogen, is inert to oxygen and/or to nitrogen, and is housed in said inner space. Each of the constituent parts of the device being likely to degas into the inner space is a mineral material.

Abstract: A device having a microelectronic component housed in a hermetically sealed housing having a vacuum inner space, and including a getter that substantially traps only hydrogen, is inert to oxygen and/or to nitrogen, and is housed in said inner space. Each of the constituent parts of the device being likely to degas into the inner space is a mineral material.

Abstract: A method of manufacturing a device having a microelectronic component housed in a hermetically sealed vacuum housing, including forming a getter in said housing, pumping out and heating the device to degas elements housed in said housing, after said pumping, hermetically sealing the housing in fluxless fashion. Further, each material forming the device likely to degas into the inner space is a mineral material, the getter is capable of substantially trapping hydrogen only and is inert to oxygen and/or to nitrogen and the heating and the sealing are performed at a temperature lower than 300° C.

Abstract: A method of manufacturing a detector capable of detecting a wavelength range [?8; ?14] centered on a wavelength ?10, including: forming said device on a substrate by depositing a sacrificial layer totally embedding said device; forming, on the sacrificial layer, a cap including first, second, and third optical structures transparent in said range [?8; ?14], the second and third optical structures having equivalent refraction indexes at wavelength ?10 respectively greater than or equal to 3.4 and smaller than or equal to 2.3; forming a vent of access to the sacrificial layer through a portion of the cap, and then applying, through the vent, an etching to totally remove the sacrificial layer.

Abstract: A method of manufacturing a detector capable of detecting a wavelength range [?8; ?14] centered on a wavelength ?10, including: forming said device on a substrate by depositing a sacrificial layer totally embedding said device; forming, on the sacrificial layer, a cap including first, second, and third optical structures transparent in said range [?8; ?14], the second and third optical structures having equivalent refraction indexes at wavelength ?10 respectively greater than or equal to 3.4 and smaller than or equal to 2.3; forming a vent of access to the sacrificial layer through a portion of the cap, and then applying, through the vent, an etching to totally remove the sacrificial layer.

Abstract: A method of manufacturing a device having a microelectronic component housed in a hermetically sealed vacuum housing, including forming a getter in said housing, pumping out and heating the device to degas elements housed in said housing, after said pumping, hermetically sealing the housing in fluxless fashion. Further, each material forming the device likely to degas into the inner space is a mineral material, the getter is capable of substantially trapping hydrogen only and is inert to oxygen and/or to nitrogen and the heating and the sealing are performed at a temperature lower than 300° C.

Abstract: The infrared detector includes a sensitive retina capable of detecting a radiation in the wavelength range between 8 and 14 micrometers; and a package containing the sensitive retina and including a window located opposite to the retina, said window comprising a substrate at least partially transparent in the wavelength range between 2 and 14 micrometers; and a set of optical filters formed on the window to attenuate an incident radiation on the retina in a wavelength range between 2 and 8 micrometers, and respectively an optical filter formed on a first surface of the window and attenuating the incident radiation in a first interval of the wavelength range between 2 and 8 micrometers, and a periodic diffraction grating formed on a second surface of the window and attenuating the incident radiation in a second interval of the wavelength range between 2 and 8 micrometers, different from the first interval.