Abstract: The present invention relates to a method for predicting the shape of a three-dimensional object which has been subjected to a diffusion process for a predetermined duration. The prediction method uses a law of vertical morphing and a law of lateral morphing. The law of lateral morphing applies to a description of the contours of different slices of a sample at standardised heights. The description of the contour of a slice is obtained by a curvilinear Fourier transform of the contour or by a two-dimensional spatial Fourier transform of a contour line approximating said contour. The present invention also relates to the manufacture of a three-dimensional object of a given material and a given nominal shape.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, the method including producing an experimental image representative of the structure of the sample and derived from a scanning electron microscope, from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model obtained by algebraic summation of a corrective term, the corrective term being the convolution product between a given convolution kernel and the first theoretical model, the second theoretical model comprising a set of parameters to determine, and determining the set of parameters present in the second theoretical model by means of an adjustment between the second theoretical model and the experimental image.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, includes producing an experimental image; from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model U(Pi,ti) describing the signal measured at the position Pi at the instant ti, the second model U(Pi,ti) being obtained by algebraic summation of a corrective term S(Pi,ti); determining the set of parameters present in the second theoretical model; wherein the corrective term S(Pi,ti) is calculated by summing the signal coming from the electric charges deposited by the primary electron beam at a plurality of instants t less than or equal to ti.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, includes producing an experimental image; from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model U(Pi,ti) describing the signal measured at the position Pi at the instant ti, the second model U(Pi,ti) being obtained by algebraic summation of a corrective term S(Pi,ti); determining the set of parameters present in the second theoretical model; wherein the corrective term S(Pi,ti) is calculated by summing the signal coming from the electric charges deposited by the primary electron beam at a plurality of instants t less than or equal to ti.

Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, the method including producing an experimental image representative of the structure of the sample and derived from a scanning electron microscope, from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model obtained by algebraic summation of a corrective term, the corrective term being the convolution product between a given convolution kernel and the first theoretical model, the second theoretical model comprising a set of parameters to determine, and determining the set of parameters present in the second theoretical model by means of an adjustment between the second theoretical model and the experimental image.

Abstract: A calibration method for a CD-SEM technique, includes determining a match function converting at least one parameter obtained by modelling a measurement supplied by the CD-SEM technique into a function of at least one parameter representative of a measurement supplied by a characterisation technique different from the CD-SEM technique, the match function being characterised by a plurality of coefficients; performing measurements on a plurality of patterns chosen to cover the desired validity range for the calibration, the measurements being done using both the CD-SEM technique to be calibrated and the reference technique; determining, from the measurements, a set of coefficients of the match function minimising the distance between the functions of the parameters measured using the reference technique and applying the match function to the parameters obtained by modelling measurements supplied by the CD-SEM; using the set of coefficients during the implementation of the calibrated CD-SEM technique.

Abstract: An array bolometric detector for detecting an electromagnetic radiation in a predetermined infrared or terahertz wavelength range, including a substrate, and an array of bolometric microplates for the detection of the radiation, suspended above the substrate by support elements. The detector includes a membrane arranged above each microplate, and having patterns having a refractive index smaller than that of the membrane formed therein. The patterns are placed periodically along at least one axis of the membrane, according to a period shorter than or equal to ? n , where ? is a wavelength to be detected and n is the average refractive index of the medium separating the microplate from the membrane. The width of the patterns along the axis increases from a central location of the membrane towards the periphery thereof.

Abstract: A calibration method for a CD-SEM technique, includes determining a match function converting at least one parameter obtained by modelling a measurement supplied by the CD-SEM technique into a function of at least one parameter representative of a measurement supplied by a characterisation technique different from the CD-SEM technique, the match function being characterised by a plurality of coefficients; performing measurements on a plurality of patterns chosen to cover the desired validity range for the calibration, the measurements being done using both the CD-SEM technique to be calibrated and the reference technique; determining, from the measurements, a set of coefficients of the match function minimising the distance between the functions of the parameters measured using the reference technique and applying the match function to the parameters obtained by modelling measurements supplied by the CD-SEM; using the set of coefficients during the implementation of the calibrated CD-SEM technique.

Abstract: An array bolometric detector for detecting an electromagnetic radiation in a predetermined infrared or terahertz wavelength range, including a substrate, and an array of bolometric microplates for the detection of the radiation, suspended above the substrate by support elements. The detector includes a membrane arranged above each microplate, and having patterns having a refractive index smaller than that of the membrane formed therein. The patterns are placed periodically along at least one axis of the membrane, according to a period shorter than or equal to ? n , where ? is a wavelength to be detected and n is the average refractive index of the medium separating the microplate from the membrane. The width of the patterns along the axis increases from a central location of the membrane towards the periphery thereof.

Abstract: A process for producing an electromagnetic radiation filter includes at least two color filters, each formed from a stack on a stiff substrate of at least one dielectric layer and of metal layers in alternation, in order to transmit at least two colors. The process comprises depositing on said substrate a first metal layer, depositing on said first metal layer a first mechanically deformable dielectric layer having a set thickness e0, depositing on said first dielectric layer a second metal layer, imprinting the stack obtained with a mold applied to the entire surface of the stack and allowing material to be simultaneously moved in at least two zones of the stack, wherein in said at least two zones, two different thicknesses e1, e2 of said first dielectric layer are obtained, these two thicknesses being different from the set thickness e0 in the second depositing step, and removing the mold.

Abstract: The general field of the invention is that of devices for focusing light to subwavelength dimensions including at least one focusing structure having a metal film provided with a first aperture that penetrates the film, the aperture having dimensions an order of magnitude smaller than the working wavelength of the focusing device. In the devices according to the invention, the focusing structure has at least one optical cavity placed around the aperture so that, when the structure is illuminated with a radiant flux at the working wavelength of the device, a large part of this flux is concentrated on the aperture by said cavity. Several embodiments are described using various cavities that may comprise plasmon reflectors.

Abstract: The general field of the invention is that of devices for focusing light to subwavelength dimensions including at least one focusing structure having a metal film provided with a first aperture that penetrates the film, the aperture having dimensions an order of magnitude smaller than the working wavelength of the focusing device. In the devices according to the invention, the focusing structure has at least one optical cavity placed around the aperture so that, when the structure is illuminated with a radiant flux at the working wavelength of the device, a large part of this flux is concentrated on the aperture by said cavity. Several embodiments are described using various cavities that may comprise plasmon reflectors.