Abstract: An ionic nanocomposite comprising a nanomaterial comprising charged groups disposed on at least a portion of a surface of the nanomaterial and a polymer material comprising charged pendant group and/or end functionalized charged groups, where the charged groups of the nanomaterial and the charged pendant groups of the polymer material have opposite charges and the nanomaterial and polymer material are connected by one or more ionic bonds. A nanomaterial can be nanoparticles comprising sulfate groups disposed on at least a portion of the surface of the nanoparticles. The polymer material can be a polymer with pendant imidazolium groups. An ionic nanocomposite can be present as a film (e.g., a thin film). An ionic nanocomposite can be used in devices. A nanocomposite can be used in various coating application.

Abstract: An ionic nanocomposite comprising a nanomaterial comprising charged groups disposed on at least a portion of a surface of the nanomaterial and a polymer material comprising charged pendant group and/or end functionalized charged groups, where the charged groups of the nanomaterial and the charged pendant groups of the polymer material have opposite charges and the nanomaterial and polymer material are connected by one or more ionic bonds. A nanomaterial can be nanoparticles comprising sulfate groups disposed on at least a portion of the surface of the nanoparticles. The polymer material can be a polymer with pendant imidazolium groups. An ionic nanocomposite can be present as a film (e.g., a thin film). An ionic nanocomposite can be used in devices. A nanocomposite can be used in various coating application.

Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.

Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.