Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrata includes a housing having an elongated chamber, at least one inlet opening, and a slit shaped outlet opening opposite the inlet opening. A tube element extends through the chamber and is at least partially transparent to UV radiation. A flow space symmetric with respect to a longitudinal center plane of the chamber is formed between the tube element and a wall of the chamber. The longitudinal center plane dissects the outlet opening in its middle such that the tube element extends into the slit shaped outlet opening to form two longitudinally extending outlet slits between the tube element and the housing. At least one UV-radiation source in the tube element is arranged to emit UV-radiation in the direction of the flow space and through the outlet slits.

Abstract: An apparatus for applying a liquid medium irradiated with UV radiation onto a substrata is disclosed, the apparatus comprising: a housing having an elongated chamber, at least one inlet opening, which opens into the chamber and at least one slit shaped outlet opening opposite the inlet opening, which extends over the length of the chamber, a tube element, which extends in a longitudinal direction through the chamber, the tube element being at least partially transparent to UV radiation, wherein the tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber, the flow space being symmetric with respect to a longitudinal center plane of the chamber, the longitudinal center plane dissecting the outlet opening in its middle, and such that the tube element extends into the slit shaped outlet opening in the housing and thereby forms two longitudinally extending outlet slits between the tube element and the housing, and at least one UV-radiation sourc