Abstract: An illumination system for a microlithography projection illumination equipment, in which a secondary light source is imaged on a reticle . The distortion of the image can be set by at least one variable optical path between optical elements, and the uniformity of the illumination is changed because of the changed distortion, in particular, in that the uniformity is increased toward the edge.

Abstract: The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system.

Abstract: There is disclosed an endotracheal tube which is collapsed transverse to the longitudinal dimension of the tube for insertion into the trachea of a patient. After the tube is in place, it is expanded to open an unobstructed passageway therethrough. An expandable cuff is provided on the exterior of the tube to afford a seal between the trachea and the tube. The same techniques are applicable to urethral catheters.