Abstract: A method for monitoring a process and/or production plant, which includes a plurality of components and which is planned using a plurality of engineering systems, includes a step of providing first result data pertaining to at least one portion of the plurality of components using a first of the plurality of engineering systems, and second result data pertaining to at least one portion of the plurality of components using a second of the plurality of engineering systems. The method also includes a step of extracting topology data, which describe an arrangement of the plurality of components within the process and/or automation plant, and operating data for the plurality of components from the first and second result data. The method further includes creating a model for the process and/or production plant by using the topology data and the operating data. Also disclosed is an apparatus for carrying out the method.

Abstract: A method for monitoring a process and/or production plant, which includes a plurality of components and which is planned using a plurality of engineering systems, includes a step of providing first result data pertaining to at least one portion of the plurality of components using a first of the plurality of engineering systems, and second result data pertaining to at least one portion of the plurality of components using a second of the plurality of engineering systems. The method also includes a step of extracting topology data, which describe an arrangement of the plurality of components within the process and/or automation plant, and operating data for the plurality of components from the first and second result data. The method further includes creating a model for the process and/or production plant by using the topology data and the operating data. Also disclosed is an apparatus for carrying out the method.

Abstract: An installation for processing wafers with a plurality of fabrication units and a plurality of measurement units as well as a transport system for transporting the wafers, is described. A transport control unit, which detects a capacity utilization of the installation and saves a processing sequence of the wafers, is allocated to the transport system. As a function of these parameters, control instructions are generated in the transport control unit, and can be output to the transport system for controlling the wafer transport procedure.

Abstract: A plant for producing semiconductor products is described and has a plurality of production and measuring units in at least one clean room. Provided there is a configuration of processing stations, which has at least one production unit or measuring unit, a production buffer disposed at the latter for the deposition of semiconductor products and a handling device for the automatic delivery and outward transport of the semiconductor products. The processing stations are interconnected via a conveyor system.

Abstract: A plant for processing wafers, having a plurality of fabrication units, a plurality of measuring units, and a transport system for transporting the wafers. The fabrication units and the measuring units are each assigned a registration system. The feeding-in and discharge of the wafers to and from the respective fabrication unit or measuring unit can be registered in order to determine the wafer occupancy in the unit. Depending on this occupancy, a supply request or disposal request can be generated for the respective fabrication unit and measuring unit.