Patents by Inventor J. S. Liu

J. S. Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for etching silicon surface
    Patent number: 5902452
    Abstract: The present invention discloses a method for etching a silicon surface or forming alignment marks in a silicon substrate by first coating the substrate with an oxide layer, then depositing and patterning a photoresist layer on top of the oxide layer and forming the alignment marks by a dry etching process utilizing fluorine/oxygen etchant chemistry for the simultaneous etching of the two layers in a single process wherein the oxide layer prevents the contamination of the silicon wafer by any silicon particles formed.
    Type: Grant
    Filed: March 13, 1997
    Date of Patent: May 11, 1999
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: M. C. Cheng, J. S. Liu, C. C. Chang