Patents by Inventor J. Scott Steckenrider

J. Scott Steckenrider has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9207190
    Abstract: A method of non-destructive detection of solid inclusions with varying sensitivities but highly congruent positional identification by both short-wavelength and long-wavelength methods. The short-wavelength method consists of lateral scatter (LS) and the long-wavelength method consists of THz imaging. The LS method was able to detect all agglomerated inclusions, transparency variations, voids, and localized phase differences. The THz imaging was able to routinely detect solid inclusions and index inhomogeneity. In combination, the LS and THz imaging methods were able to detect all relevant types of material variation, so that the combination of the two non-destructive testing methods provides a solution capable of detecting the full array of critical material variations in transparent polycrystalline ceramic materials.
    Type: Grant
    Filed: April 5, 2014
    Date of Patent: December 8, 2015
    Assignee: TECHNOLOGY ASSESSMENT & TRANSFER, INC.
    Inventor: J. Scott Steckenrider
  • Publication number: 20140306114
    Abstract: A method of non-destructive detection of solid inclusions with varying sensitivities but highly congruent positional identification by both short-wavelength and long-wavelength methods. The short-wavelength method consists of lateral scatter (LS) and the long-wavelength method consists of THz imaging. The LS method was able to detect all agglomerated inclusions, transparency variations, voids, and localized phase differences. The THz imaging was able to routinely detect solid inclusions and index inhomogeneity. In combination, the LS and THz imaging methods were able to detect all relevant types of material variation, so that the combination of the two non-destructive testing methods provides a synergistic solution capable of detecting the full array of critical material variations in transparent polycrystalline ceramic materials.
    Type: Application
    Filed: April 5, 2014
    Publication date: October 16, 2014
    Applicant: TECHNOLOGY ASSESSMENT & TRANSFER, INC.
    Inventor: J. Scott Steckenrider
  • Patent number: 7617733
    Abstract: An automated scanning system and method, utilizing specialized dual phased array ultrasonic transducers for producing and detecting Rayleigh waves in ceramic bearing balls are provided for nondestructive, non-contact inspection of ceramic bearing balls. The phased array ultrasonic transducer utilizes a complex curvature configuration that enables the dual phased array ultrasonic transducers to focus ultrasonic energy onto the ball to optimally generate and receive Rayleigh wave signals in the spherical objects.
    Type: Grant
    Filed: July 18, 2007
    Date of Patent: November 17, 2009
    Assignee: UChicago Argonne, LLC
    Inventors: Christopher M. Deemer, William A. Ellingson, J. Scott Steckenrider
  • Publication number: 20090019937
    Abstract: An automated scanning system and method, utilizing specialized dual phased array ultrasonic transducers for producing and detecting Rayleigh waves in ceramic bearing balls are provided for nondestructive, non-contact inspection of ceramic bearing balls. The phased array ultrasonic transducer utilizes a complex curvature configuration that enables the dual phased array ultrasonic transducers to focus ultrasonic energy onto the ball to optimally generate and receive Rayleigh wave signals in the spherical objects.
    Type: Application
    Filed: July 18, 2007
    Publication date: January 22, 2009
    Inventors: Christopher M. Deemer, William A. Ellingson, J. Scott Steckenrider
  • Patent number: 7198549
    Abstract: A chemical-mechanical polishing pad, and method of polishing a substrate using a polishing pad, comprising (a) a resilient subpad, and (b) a polymeric polishing film substantially coextensive with the resilient subpad, wherein the polymeric polishing film comprises (i) a polishing surface that is substantially free of bound abrasive particles, and (ii) a back surface releasably associated with the resilient subpad.
    Type: Grant
    Filed: June 16, 2004
    Date of Patent: April 3, 2007
    Assignee: Cabot Microelectronics Corporation
    Inventors: J. Scott Steckenrider, Gary W. Snider
  • Patent number: 7091604
    Abstract: A three-dimensional integrated circuit that provides reduced interconnect signal delay over known 2-dimensional systems. The three-dimensional integrated circuit also allows improved circuit cooling. The three-dimensional integrated circuit includes two or more electrically connected integrated circuits, separated by a cooling channel.
    Type: Grant
    Filed: June 4, 2004
    Date of Patent: August 15, 2006
    Assignee: Cabot Microelectronics Corporation
    Inventors: Ian W. Wylie, Heinz H. Busta, David J. Schroeder, J. Scott Steckenrider, Yuchun Wang
  • Patent number: 6929983
    Abstract: A current-controlling device comprising a first conductor, a second conductor, and a tunneling barrier comprising a first insulating layer between the first conductor and the second conductor. The tunneling barrier electrically isolates the first conductor from the second conductor. At least one mobile charge is positionable within the tunneling barrier. The device also includes a gate, wherein a voltage applied to the gate with respect to the substrate (or with respect to a second gate formed on or in the substrate) modulates or moves the mobile charge to a position between the first conductor and the second conductor within the tunneling barrier, thus deforming the shape of the energy barrier between the first conductor and the second conductor. The deformation can cause a current to flow between the conductors when a voltage is present between them due to quantum mechanical tunneling.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: August 16, 2005
    Assignee: Cabot Microelectronics Corporation
    Inventors: Heinz H. Busta, J. Scott Steckenrider
  • Publication number: 20040007690
    Abstract: Methods for controllably polishing fiber optic connectors that include a ferrule enclosing single or multiple optical fibers by manipulating the ingredients of the polishing composition to control the relative polishing rates of the ferrule material and the optical fiber material to obtain the desired connector end face surface finish and geometry.
    Type: Application
    Filed: July 12, 2002
    Publication date: January 15, 2004
    Applicant: Cabot Microelectronics Corp.
    Inventors: Gary W. Snider, J. Scott Steckenrider, Steven K. Grumbine
  • Publication number: 20030143848
    Abstract: An aqueous chemical mechanical polishing slurry useful for polishing the polysilicon layer of a semiconductor wafer comprising an aqueous solution of at least one abrasive, and at least one alcoholamine. The slurry preferably has a pH of from about 9.0 to about 10.5 and it includes an optional buffering agent.
    Type: Application
    Filed: January 23, 2003
    Publication date: July 31, 2003
    Applicant: Cabot Microelectronics Corporation
    Inventors: J. Scott Steckenrider, Brian L. Mueller
  • Patent number: 6533832
    Abstract: An aqueous chemical mechanical polishing slurry useful for polishing the polysilicon layer of a semiconductor wafer comprising an aqueous solution of at least one abrasive, and at least one alcoholamine. The slurry preferably has a pH of from about 9.0 to about 10.5 and it includes an optional buffering agent.
    Type: Grant
    Filed: June 26, 1998
    Date of Patent: March 18, 2003
    Assignee: Cabot Microelectronics Corporation
    Inventors: J. Scott Steckenrider, Brian L. Mueller
  • Publication number: 20020032987
    Abstract: An aqueous chemical mechanical polishing slurry useful for polishing the polysilicon layer of a semiconductor wafer comprising an aqueous solution of at least one abrasive, and at least one alcoholamine. The slurry preferably has a pH of from about 9.0 to about 10.5 and it includes an optional buffering agent.
    Type: Application
    Filed: June 26, 1998
    Publication date: March 21, 2002
    Inventors: J. SCOTT STECKENRIDER, BRIAN L. MUELLER