Patents by Inventor J. W. De Klerk

J. W. De Klerk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7491478
    Abstract: Control of exposures is based at least in part on the relative contrast loss for a source spectrum and an pattern to be projected or an average absolute detuning of the source.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: February 17, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Petrus Buurman, Jozef Maria Finders, Alexander Straaijer, J. W. De Klerk
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060017906
    Abstract: Control of exposures is based at least in part on the relative contrast loss for a source spectrum and an pattern to be projected or an average absolute detuning of the source.
    Type: Application
    Filed: July 23, 2004
    Publication date: January 26, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Buurman, Jozef Finders, Alexander Straaijer, J.W. De Klerk