Patents by Inventor Ja Pil KOO

Ja Pil KOO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10895667
    Abstract: The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu—K-alpha rays.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: January 19, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Jin Seok Byun, Ja Pil Koo, Boo Kyung Kim, Seok Hoon Jang, Yeong Rae Chang
  • Publication number: 20190025467
    Abstract: The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu—K-alpha rays.
    Type: Application
    Filed: March 9, 2017
    Publication date: January 24, 2019
    Applicant: LG CHEM, LTD.
    Inventors: Jin Seok BYUN, Ja Pil KOO, Boo Kyung KIM, Seok Hoon JANG, Yeong Rae CHANG