Abstract: The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.

Abstract: The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.

Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

Abstract: The X-ray analysis apparatus of the present invention comprises a sample stage for supporting a sample, a goniometer having an axis of rotation, and an X-ray detector arranged to be rotatable about the axis of rotation of the goniometer, wherein the X-ray detector is arranged to receive X-rays from the sample directed along an X-ray beam path. The X-ray analysis apparatus further comprises a first collimator, a second collimator and a third collimator each having a first configuration and a second configuration. In its first configuration, the collimator is arranged in the X-ray beam path. In its second configuration the collimator is arranged outside of the X-ray beam path. A first actuator arrangement is configured to move the first collimator and the second collimator between the first configuration and the second configuration by moving the first collimator and the second collimator in a lateral direction that intersects the X-ray beam path.

Abstract: The X-ray analysis apparatus of the present invention comprises a sample stage for supporting a sample, a goniometer having an axis of rotation, and an X-ray detector arranged to be rotatable about the axis of rotation of the goniometer, wherein the X-ray detector is arranged to receive X-rays from the sample directed along an X-ray beam path. The X-ray analysis apparatus further comprises a first collimator, a second collimator and a third collimator each having a first configuration and a second configuration. In its first configuration, the collimator is arranged in the X-ray beam path. In its second configuration the collimator is arranged outside of the X-ray beam path. A first actuator arrangement is configured to move the first collimator and the second collimator between the first configuration and the second configuration by moving the first collimator and the second collimator in a lateral direction that intersects the X-ray beam path.

Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

Abstract: A shutter arrangement for an X-ray housing includes a shutter 10 for example of solid tantalum. In embodiments, the shutter has a through hole 22 and slides between a closed and an open position on the inner face of the X-ray housing, in the open position the through hole 22 aligns with an opening 8 in the housing.

Abstract: A shutter arrangement for an X-ray housing includes a shutter 10 for example of solid tantalum. In embodiments, the shutter has a through hole 22 and slides between a closed and an open position on the inner face of the X-ray housing, in the open position the through hole 22 aligns with an opening 8 in the housing.

Abstract: In an object holder comprising an X-Y translation mechanism, both movements are determined by transporters which are separately moved across a supporting face of a supporting plate under a pressure in a sliding fashion. The pressing force is preferably realized by means of permanent magnets which are mounted on the transporters and which bear on the supporting face of the supporting plate by way of preferably ductile spacers. A device for rotation and/or tilting can be simply added by rotating and/or tilting the entire supporting plate with the X-Y translation mechanism.