Patents by Inventor Jaap J. Mattheijer

Jaap J. Mattheijer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7815279
    Abstract: A method for adjusting a first and a second array relative to each other in a printing device has a carrying structure for mounting the first and second arrays. The first array has nozzles arranged in a first row substantially parallel to a first direction for forming first marks on a recording substrate. The second array has nozzles arranged in a second row substantially parallel to the first direction for forming second marks on the recording substrate. In an attainable relative position, the first and second arrays at least partially flank each other. The method includes forming a test pattern and detecting the locations of first and second test marks; determining a plurality of deviation factors for a plurality of attainable relative positions; and selecting an attainable relative position among the plurality of attainable relative positions that satisfies a selection criterion applied to the plurality of deviation factors.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: October 19, 2010
    Assignee: OCE-Technologies B.V.
    Inventors: Hylke Veenstra, Jaap J. Mattheijer, Matheus Wijnstekers, Joseph L. M. Nelissen
  • Publication number: 20080143768
    Abstract: A method for adjusting a first and a second array relative to each other in a printing device has a carrying structure for mounting the first and second arrays. The first array has nozzles arranged in a first row substantially parallel to a first direction for forming first marks on a recording substrate. The second array has nozzles arranged in a second row substantially parallel to the first direction for forming second marks on the recording substrate. In an attainable relative position, the first and second arrays at least partially flank each other. The method includes forming a test pattern and detecting the locations of first and second test marks; determining a plurality of deviation factors for a plurality of attainable relative positions; and selecting an attainable relative position among the plurality of attainable relative positions that satisfies a selection criterion applied to the plurality of deviation factors.
    Type: Application
    Filed: December 17, 2007
    Publication date: June 19, 2008
    Inventors: Hylke Veenstra, Jaap J. Mattheijer, Matheus Wijnstekers, Joseph L.M. Nelissen